SG105448A1 - Method and apparatus for both mechanically and electrostatically clamping a wafer to a pedestal within a semiconductor wafer processing system - Google Patents

Method and apparatus for both mechanically and electrostatically clamping a wafer to a pedestal within a semiconductor wafer processing system

Info

Publication number
SG105448A1
SG105448A1 SG9704148A SG1997004148A SG105448A1 SG 105448 A1 SG105448 A1 SG 105448A1 SG 9704148 A SG9704148 A SG 9704148A SG 1997004148 A SG1997004148 A SG 1997004148A SG 105448 A1 SG105448 A1 SG 105448A1
Authority
SG
Singapore
Prior art keywords
pedestal
mechanically
processing system
wafer
semiconductor wafer
Prior art date
Application number
SG9704148A
Other languages
English (en)
Inventor
Kogan Igor
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG105448A1 publication Critical patent/SG105448A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
SG9704148A 1996-12-04 1997-11-26 Method and apparatus for both mechanically and electrostatically clamping a wafer to a pedestal within a semiconductor wafer processing system SG105448A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/758,829 US5885428A (en) 1996-12-04 1996-12-04 Method and apparatus for both mechanically and electrostatically clamping a wafer to a pedestal within a semiconductor wafer processing system

Publications (1)

Publication Number Publication Date
SG105448A1 true SG105448A1 (en) 2004-08-27

Family

ID=25053274

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9704148A SG105448A1 (en) 1996-12-04 1997-11-26 Method and apparatus for both mechanically and electrostatically clamping a wafer to a pedestal within a semiconductor wafer processing system

Country Status (6)

Country Link
US (1) US5885428A (zh)
EP (1) EP0847085A3 (zh)
JP (1) JPH10313044A (zh)
KR (1) KR19980063620A (zh)
SG (1) SG105448A1 (zh)
TW (1) TW343370B (zh)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100308209B1 (ko) * 1998-06-20 2001-11-30 윤종용 리플로우공정을 위한 히터 어셈블리의 클램프
US6219219B1 (en) * 1998-09-30 2001-04-17 Applied Materials, Inc. Cathode assembly containing an electrostatic chuck for retaining a wafer in a semiconductor wafer processing system
US6123804A (en) * 1999-02-22 2000-09-26 Applied Materials, Inc. Sectional clamp ring
US6165276A (en) * 1999-09-17 2000-12-26 United Microelectronics Corp. Apparatus for preventing plasma etching of a wafer clamp in semiconductor fabrication processes
JP2002270346A (ja) * 2001-03-09 2002-09-20 Mitsubishi Heavy Ind Ltd 加熱装置及びその製造方法並びに被膜形成装置
KR20030026387A (ko) * 2001-09-12 2003-04-03 주식회사 아이앤에스 반도체 웨이퍼의 화학기상증착공정중에 사용되는받침히터와 그 제조방법
KR100504426B1 (ko) * 2002-05-13 2005-07-28 최성문 이동식 교량 점검 장치
US20040079289A1 (en) * 2002-10-23 2004-04-29 Kellerman Peter L. Electrostatic chuck wafer port and top plate with edge shielding and gas scavenging
US7506593B2 (en) * 2002-10-23 2009-03-24 Kinetics Systems, Inc. Microfabrication tool pedestal and method of use
US7910218B2 (en) 2003-10-22 2011-03-22 Applied Materials, Inc. Cleaning and refurbishing chamber components having metal coatings
US7102871B2 (en) * 2003-10-29 2006-09-05 Taiwan Semiconductor Manufacturing Co,, Ltd. Electrostatic chuck assembly having disassembling device
US20060096857A1 (en) * 2004-11-08 2006-05-11 Ilya Lavitsky Physical vapor deposition chamber having a rotatable substrate pedestal
US20060096851A1 (en) * 2004-11-08 2006-05-11 Ilya Lavitsky Physical vapor deposition chamber having an adjustable target
JP4869610B2 (ja) * 2005-03-17 2012-02-08 東京エレクトロン株式会社 基板保持部材及び基板処理装置
US8617672B2 (en) 2005-07-13 2013-12-31 Applied Materials, Inc. Localized surface annealing of components for substrate processing chambers
US7762114B2 (en) 2005-09-09 2010-07-27 Applied Materials, Inc. Flow-formed chamber component having a textured surface
US20070181420A1 (en) * 2006-02-07 2007-08-09 Ming-Tung Wang Wafer stage having an encapsulated central pedestal plate
US7718045B2 (en) * 2006-06-27 2010-05-18 Applied Materials, Inc. Ground shield with reentrant feature
JP4642789B2 (ja) * 2006-07-14 2011-03-02 セイコーエプソン株式会社 成膜装置及び成膜方法
US7981262B2 (en) 2007-01-29 2011-07-19 Applied Materials, Inc. Process kit for substrate processing chamber
US7942969B2 (en) 2007-05-30 2011-05-17 Applied Materials, Inc. Substrate cleaning chamber and components
US20090084317A1 (en) * 2007-09-28 2009-04-02 Applied Materials, Inc. Atomic layer deposition chamber and components
WO2011155986A1 (en) * 2010-06-08 2011-12-15 Axcelis Technologies Inc. Heated electrostatic chuck including mechanical clamp capability at high temperature
US8941968B2 (en) * 2010-06-08 2015-01-27 Axcelis Technologies, Inc. Heated electrostatic chuck including mechanical clamp capability at high temperature
US20120083129A1 (en) 2010-10-05 2012-04-05 Skyworks Solutions, Inc. Apparatus and methods for focusing plasma
US9478428B2 (en) 2010-10-05 2016-10-25 Skyworks Solutions, Inc. Apparatus and methods for shielding a plasma etcher electrode
US9768052B2 (en) 2013-03-14 2017-09-19 Applied Materials, Inc. Minimal contact edge ring for rapid thermal processing
WO2016137964A1 (en) 2015-02-25 2016-09-01 Corning Incorporated Apparatus and method to electrostatically chuck substrates to a moving carrier
WO2017131927A1 (en) 2016-01-26 2017-08-03 Applied Materials, Inc. Wafer edge ring lifting solution
US10553404B2 (en) 2017-02-01 2020-02-04 Applied Materials, Inc. Adjustable extended electrode for edge uniformity control
US11075105B2 (en) 2017-09-21 2021-07-27 Applied Materials, Inc. In-situ apparatus for semiconductor process module
US11043400B2 (en) * 2017-12-21 2021-06-22 Applied Materials, Inc. Movable and removable process kit
US20190244787A1 (en) * 2018-02-02 2019-08-08 Wei-Chuan Chou Plasma etching reaction chamber
US10790123B2 (en) * 2018-05-28 2020-09-29 Applied Materials, Inc. Process kit with adjustable tuning ring for edge uniformity control
US11935773B2 (en) 2018-06-14 2024-03-19 Applied Materials, Inc. Calibration jig and calibration method
US11289310B2 (en) 2018-11-21 2022-03-29 Applied Materials, Inc. Circuits for edge ring control in shaped DC pulsed plasma process device
WO2020214327A1 (en) 2019-04-19 2020-10-22 Applied Materials, Inc. Ring removal from processing chamber

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4412133A (en) * 1982-01-05 1983-10-25 The Perkin-Elmer Corp. Electrostatic cassette
US4565601A (en) * 1983-09-12 1986-01-21 Hitachi, Ltd. Method and apparatus for controlling sample temperature
US5350479A (en) * 1992-12-02 1994-09-27 Applied Materials, Inc. Electrostatic chuck for high power plasma processing

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4692836A (en) * 1983-10-31 1987-09-08 Toshiba Kikai Kabushiki Kaisha Electrostatic chucks
JPH0730468B2 (ja) * 1988-06-09 1995-04-05 日電アネルバ株式会社 ドライエッチング装置
JP2748127B2 (ja) * 1988-09-02 1998-05-06 キヤノン株式会社 ウエハ保持方法
US5591269A (en) * 1993-06-24 1997-01-07 Tokyo Electron Limited Vacuum processing apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4412133A (en) * 1982-01-05 1983-10-25 The Perkin-Elmer Corp. Electrostatic cassette
US4565601A (en) * 1983-09-12 1986-01-21 Hitachi, Ltd. Method and apparatus for controlling sample temperature
US5350479A (en) * 1992-12-02 1994-09-27 Applied Materials, Inc. Electrostatic chuck for high power plasma processing

Also Published As

Publication number Publication date
EP0847085A2 (en) 1998-06-10
JPH10313044A (ja) 1998-11-24
EP0847085A3 (en) 2000-01-05
KR19980063620A (ko) 1998-10-07
US5885428A (en) 1999-03-23
TW343370B (en) 1998-10-21

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