SG10202101289RA - Method and system for charged particle microscopy with improved image beam stabilization and interrogation - Google Patents

Method and system for charged particle microscopy with improved image beam stabilization and interrogation

Info

Publication number
SG10202101289RA
SG10202101289RA SG10202101289RA SG10202101289RA SG10202101289RA SG 10202101289R A SG10202101289R A SG 10202101289RA SG 10202101289R A SG10202101289R A SG 10202101289RA SG 10202101289R A SG10202101289R A SG 10202101289RA SG 10202101289R A SG10202101289R A SG 10202101289RA
Authority
SG
Singapore
Prior art keywords
improved image
interrogation
charged particle
image beam
system includes
Prior art date
Application number
SG10202101289RA
Other languages
English (en)
Inventor
Douglas Masnaghetti
Gabor Toth
David Trease
Rohit Bothra
Grace H Chen
Rainer Knippelmeyer
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of SG10202101289RA publication Critical patent/SG10202101289RA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/203—Measuring back scattering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
    • G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0048—Charging arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24475—Scattered electron detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24485—Energy spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2804—Scattered primary beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2806—Secondary charged particle

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
SG10202101289RA 2015-03-24 2016-03-24 Method and system for charged particle microscopy with improved image beam stabilization and interrogation SG10202101289RA (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201562137229P 2015-03-24 2015-03-24
US201562166682P 2015-05-27 2015-05-27
US201562214737P 2015-09-04 2015-09-04
US201662277670P 2016-01-12 2016-01-12
US15/079,046 US10643819B2 (en) 2015-03-24 2016-03-24 Method and system for charged particle microscopy with improved image beam stabilization and interrogation

Publications (1)

Publication Number Publication Date
SG10202101289RA true SG10202101289RA (en) 2021-03-30

Family

ID=56979027

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10202101289RA SG10202101289RA (en) 2015-03-24 2016-03-24 Method and system for charged particle microscopy with improved image beam stabilization and interrogation
SG11201707201SA SG11201707201SA (en) 2015-03-24 2016-03-24 Method and system for charged particle microscopy with improved image beam stabilization and interrogation

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201707201SA SG11201707201SA (en) 2015-03-24 2016-03-24 Method and system for charged particle microscopy with improved image beam stabilization and interrogation

Country Status (7)

Country Link
US (2) US10643819B2 (zh)
JP (2) JP6701228B2 (zh)
KR (1) KR20170131583A (zh)
IL (2) IL254332B (zh)
SG (2) SG10202101289RA (zh)
TW (3) TWI722855B (zh)
WO (1) WO2016154484A1 (zh)

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Also Published As

Publication number Publication date
IL280646B (en) 2022-04-01
TWI693405B (zh) 2020-05-11
WO2016154484A1 (en) 2016-09-29
IL254332A0 (en) 2017-11-30
US10643819B2 (en) 2020-05-05
JP6701228B2 (ja) 2020-05-27
TWI722855B (zh) 2021-03-21
TW202127037A (zh) 2021-07-16
IL280646A (en) 2021-03-25
IL254332B (en) 2021-02-28
KR20170131583A (ko) 2017-11-29
US20160372304A1 (en) 2016-12-22
TWI751911B (zh) 2022-01-01
JP2020115489A (ja) 2020-07-30
US20200227232A1 (en) 2020-07-16
SG11201707201SA (en) 2017-10-30
US11120969B2 (en) 2021-09-14
TW201704753A (zh) 2017-02-01
TW202028750A (zh) 2020-08-01
JP2018509741A (ja) 2018-04-05
JP6934980B2 (ja) 2021-09-15

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