SG10202011799RA - Resist composition and method of forming resist pattern - Google Patents

Resist composition and method of forming resist pattern

Info

Publication number
SG10202011799RA
SG10202011799RA SG10202011799RA SG10202011799RA SG10202011799RA SG 10202011799R A SG10202011799R A SG 10202011799RA SG 10202011799R A SG10202011799R A SG 10202011799RA SG 10202011799R A SG10202011799R A SG 10202011799RA SG 10202011799R A SG10202011799R A SG 10202011799RA
Authority
SG
Singapore
Prior art keywords
resist
forming
resist pattern
composition
resist composition
Prior art date
Application number
SG10202011799RA
Other languages
English (en)
Inventor
Hirayama Fumitake
Hirano Tomoyuki
Yoshida Yuzo
KOHNO Shinichi
Nakagawa Yusuke
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2020156373A external-priority patent/JP7573399B2/ja
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of SG10202011799RA publication Critical patent/SG10202011799RA/en

Links

SG10202011799RA 2019-11-29 2020-11-26 Resist composition and method of forming resist pattern SG10202011799RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019217161 2019-11-29
JP2020156373A JP7573399B2 (ja) 2019-11-29 2020-09-17 レジスト組成物及びレジストパターン形成方法

Publications (1)

Publication Number Publication Date
SG10202011799RA true SG10202011799RA (en) 2021-06-29

Family

ID=76312897

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202011799RA SG10202011799RA (en) 2019-11-29 2020-11-26 Resist composition and method of forming resist pattern

Country Status (2)

Country Link
KR (1) KR20210067912A (ko)
SG (1) SG10202011799RA (ko)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3895224B2 (ja) 2001-12-03 2007-03-22 東京応化工業株式会社 ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法

Also Published As

Publication number Publication date
KR20210067912A (ko) 2021-06-08
JP2021092759A (ja) 2021-06-17

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