SG10201910703QA - Resist composition and method of forming resist pattern - Google Patents

Resist composition and method of forming resist pattern

Info

Publication number
SG10201910703QA
SG10201910703QA SG10201910703QA SG10201910703QA SG10201910703QA SG 10201910703Q A SG10201910703Q A SG 10201910703QA SG 10201910703Q A SG10201910703Q A SG 10201910703QA SG 10201910703Q A SG10201910703Q A SG 10201910703QA SG 10201910703Q A SG10201910703Q A SG 10201910703QA
Authority
SG
Singapore
Prior art keywords
resist
forming
resist pattern
composition
resist composition
Prior art date
Application number
SG10201910703QA
Inventor
Saito Aya
KOHNO Shinichi
Ohno Yoshiaki
Sunamichi Tomonari
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of SG10201910703QA publication Critical patent/SG10201910703QA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG10201910703QA 2018-11-20 2019-11-15 Resist composition and method of forming resist pattern SG10201910703QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018217631 2018-11-20
JP2019188955A JP7414457B2 (en) 2018-11-20 2019-10-15 Resist composition and resist pattern forming method

Publications (1)

Publication Number Publication Date
SG10201910703QA true SG10201910703QA (en) 2020-06-29

Family

ID=70907989

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201910703QA SG10201910703QA (en) 2018-11-20 2019-11-15 Resist composition and method of forming resist pattern

Country Status (3)

Country Link
JP (1) JP7414457B2 (en)
KR (1) KR20200059157A (en)
SG (1) SG10201910703QA (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11681220B2 (en) * 2020-03-05 2023-06-20 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
US11675267B2 (en) * 2020-03-23 2023-06-13 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
JP2022103802A (en) 2020-12-28 2022-07-08 東京応化工業株式会社 Resist composition and resist pattern formation method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11109631A (en) * 1997-10-06 1999-04-23 Fuji Photo Film Co Ltd Positive photosensitive composition
JP4049237B2 (en) 1999-11-30 2008-02-20 富士フイルム株式会社 Positive electron beam or X-ray resist composition
JP2002139839A (en) 2000-10-31 2002-05-17 Fuji Photo Film Co Ltd Positive type resist composition
JP2002229193A (en) 2001-02-06 2002-08-14 Fuji Photo Film Co Ltd Positive resist composition for electron beam or x-ray
JP2002268209A (en) 2001-03-12 2002-09-18 Fuji Photo Film Co Ltd Positive type radiation sensitive composition
JP4781011B2 (en) 2005-05-26 2011-09-28 東京応化工業株式会社 Resin resin and resist resin monomer
JP4937594B2 (en) 2006-02-02 2012-05-23 東京応化工業株式会社 Positive resist composition for forming thick resist film, thick resist laminate, and resist pattern forming method
JP4849267B2 (en) 2006-10-17 2012-01-11 信越化学工業株式会社 Resist material and pattern forming method using the same

Also Published As

Publication number Publication date
JP7414457B2 (en) 2024-01-16
KR20200059157A (en) 2020-05-28
JP2020086439A (en) 2020-06-04

Similar Documents

Publication Publication Date Title
EP3605228A4 (en) Radiation sensitive composition and resist pattern forming method
SG11201607443XA (en) Resist composition and method for forming resist pattern
GB2570161B (en) Simulation of exclusive instructions
KR20180084922A (en) Method of forming resist pattern and resist material
SG10201910703QA (en) Resist composition and method of forming resist pattern
EP3575872A4 (en) Radiation-sensitive composition and pattern formation method
SG11201809977QA (en) Self-assembly composition for pattern formation and pattern forming method
SG10201604551XA (en) Cleaning Composition for Photolithography and Method of Forming Photoresist Pattern Using the Same
EP3837396C0 (en) Grillage apparatus and method of using and making same
EP3249469A4 (en) Negative photosensitive composition and pattern formation method
GB201804594D0 (en) Bonegraft substituteand method of manufacture
GB201802839D0 (en) Method of manufacture
GB201717885D0 (en) Prothesis and method of manufacture
GB202015988D0 (en) A method of forming a composition and the composition formed therefrom
SG11202101056RA (en) HIGH-Mn STEEL AND METHOD OF PRODUCING SAME
EP3667419A4 (en) Radiation sensitive composition and resist pattern forming method
PL3432315T3 (en) Concrete composition and method for producing same
SG10202012309RA (en) Resist composition and method of forming resist pattern
GB2561004B (en) Electronic structures and their methods of manufacture
IL251648A0 (en) Resist pattern treatment composition and pattern formation method employing the same
SG11202101704VA (en) Method of producing piperylene
SG11202004973UA (en) Photosensitive siloxane composition and pattern forming method using the same
SG10201904750PA (en) Method of evaluating photomask blank-associated substrate
SG11202005914XA (en) Method of forming resist pattern
SG11202005911RA (en) Method of forming resist pattern