SG10202002976XA - Inspecting apparatus and processing apparatus including the same - Google Patents
Inspecting apparatus and processing apparatus including the sameInfo
- Publication number
- SG10202002976XA SG10202002976XA SG10202002976XA SG10202002976XA SG10202002976XA SG 10202002976X A SG10202002976X A SG 10202002976XA SG 10202002976X A SG10202002976X A SG 10202002976XA SG 10202002976X A SG10202002976X A SG 10202002976XA SG 10202002976X A SG10202002976X A SG 10202002976XA
- Authority
- SG
- Singapore
- Prior art keywords
- same
- processing apparatus
- inspecting
- apparatus including
- inspecting apparatus
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N2021/8411—Application to online plant, process monitoring
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Quality & Reliability (AREA)
- Theoretical Computer Science (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Signal Processing (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Or Analysing Biological Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019077853A JP7282461B2 (en) | 2019-04-16 | 2019-04-16 | Inspection equipment and processing equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10202002976XA true SG10202002976XA (en) | 2020-11-27 |
Family
ID=72660088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202002976XA SG10202002976XA (en) | 2019-04-16 | 2020-03-30 | Inspecting apparatus and processing apparatus including the same |
Country Status (8)
Country | Link |
---|---|
US (1) | US11105752B2 (en) |
JP (1) | JP7282461B2 (en) |
KR (1) | KR20200121727A (en) |
CN (1) | CN111834243A (en) |
DE (1) | DE102020204746A1 (en) |
MY (1) | MY195430A (en) |
SG (1) | SG10202002976XA (en) |
TW (1) | TW202040715A (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7254416B2 (en) | 2019-01-11 | 2023-04-10 | 株式会社ディスコ | Workpiece cutting method |
JP7370265B2 (en) * | 2020-01-30 | 2023-10-27 | 株式会社ディスコ | Processing method and processing equipment |
CN112875216B (en) * | 2021-01-18 | 2022-09-30 | 惠州市德赛自动化技术有限公司 | Appearance detection equipment |
WO2023003507A2 (en) * | 2021-07-19 | 2023-01-26 | Agency For Science, Technology And Research | Data collection apparatus and computer-implemented data collection method using same |
JP2024000700A (en) * | 2022-06-21 | 2024-01-09 | 株式会社ディスコ | Alignment method and updating method for reference position |
CN115157153B (en) * | 2022-08-22 | 2023-10-17 | 深圳市赛马精密科技有限公司 | Laser detection positioning structure |
CN116106320B (en) * | 2023-02-20 | 2023-09-19 | 苏州天准科技股份有限公司 | Detection device and detection method for notebook computer shell surface |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6393130A (en) * | 1986-10-08 | 1988-04-23 | Hitachi Ltd | Jig for sticking wafer |
US6342434B1 (en) * | 1995-12-04 | 2002-01-29 | Hitachi, Ltd. | Methods of processing semiconductor wafer, and producing IC card, and carrier |
JP4462717B2 (en) | 2000-05-22 | 2010-05-12 | 株式会社ディスコ | Rotating blade position detection device |
WO2005047874A1 (en) | 2003-11-13 | 2005-05-26 | Mitsuboshi Diamond Industrial Co., Ltd. | Substrate inspection device, substrate inspection method, and program |
JP2008053624A (en) | 2006-08-28 | 2008-03-06 | Matsushita Electric Ind Co Ltd | Alignment apparatus |
JP5160993B2 (en) * | 2008-07-25 | 2013-03-13 | 株式会社荏原製作所 | Substrate processing equipment |
JP5274966B2 (en) | 2008-09-30 | 2013-08-28 | 株式会社ディスコ | Processing equipment |
JP2012256749A (en) | 2011-06-09 | 2012-12-27 | Disco Abrasive Syst Ltd | Cutting device |
JP5975767B2 (en) | 2012-07-18 | 2016-08-23 | 株式会社ディスコ | Processing equipment |
KR101540885B1 (en) | 2014-07-29 | 2015-07-30 | 주식회사 엘지실트론 | Measuring device of wafer defects |
KR20160003608A (en) | 2015-12-21 | 2016-01-11 | 주식회사 브이원텍 | Chip on glass bonding inspection apparatus |
JP6779576B2 (en) | 2016-12-27 | 2020-11-04 | 株式会社ディスコ | Adhesive tape, processing method of work piece, and adhesive tape attachment device |
JP6847729B2 (en) | 2017-03-28 | 2021-03-24 | 株式会社ディスコ | Cutting equipment |
JP6979296B2 (en) | 2017-07-28 | 2021-12-08 | 株式会社ディスコ | Cutting method |
-
2019
- 2019-04-16 JP JP2019077853A patent/JP7282461B2/en active Active
-
2020
- 2020-03-25 KR KR1020200036083A patent/KR20200121727A/en active Search and Examination
- 2020-03-30 SG SG10202002976XA patent/SG10202002976XA/en unknown
- 2020-04-01 US US16/837,067 patent/US11105752B2/en active Active
- 2020-04-03 MY MYPI2020001736A patent/MY195430A/en unknown
- 2020-04-10 CN CN202010278411.2A patent/CN111834243A/en active Pending
- 2020-04-14 TW TW109112458A patent/TW202040715A/en unknown
- 2020-04-15 DE DE102020204746.4A patent/DE102020204746A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
DE102020204746A1 (en) | 2020-10-22 |
JP7282461B2 (en) | 2023-05-29 |
TW202040715A (en) | 2020-11-01 |
US20200333261A1 (en) | 2020-10-22 |
KR20200121727A (en) | 2020-10-26 |
JP2020177975A (en) | 2020-10-29 |
CN111834243A (en) | 2020-10-27 |
US11105752B2 (en) | 2021-08-31 |
MY195430A (en) | 2023-01-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG11202004839XA (en) | Blockchain-based transaction processing method and apparatus | |
SG10202002976XA (en) | Inspecting apparatus and processing apparatus including the same | |
SG11202006345UA (en) | Image processing methods and apparatuses | |
EP3800589A4 (en) | Task processing method and apparatus | |
GB201802533D0 (en) | Image processing apparatus and methods | |
SG11202101646RA (en) | Portable diagnostic apparatus and the method thereof | |
GB2596726B (en) | Surface type detection and surface treatment apparatus using the same | |
EP3940373A4 (en) | Inspection device and method | |
SG10201913764UA (en) | Processing apparatus | |
EP3960365A4 (en) | Processing system and inspection system | |
EP3845889A4 (en) | Inspection device and inspection method | |
EP3779419A4 (en) | Nondestructive inspection method and apparatus | |
SG10202009275VA (en) | Processing apparatus | |
GB2586659B (en) | Inspection related systems and methods | |
EP3968249A4 (en) | Inspection device and inspection program | |
EP3951843A4 (en) | Inspection device and inspection method | |
GB2572781B (en) | Inspection Method And Associated Apparatus | |
SG10202011113WA (en) | Processing apparatus | |
SG11202107380WA (en) | Processing method and device | |
SG10201911815YA (en) | Baffle unit and substrate processing apparatus including the same | |
SG10202007416QA (en) | Processing apparatus | |
GB2580546B (en) | Bearing elements and apparatus including same | |
GB201912253D0 (en) | Inspection apparatus and method | |
SG11202112722UA (en) | Substrate processing methods and apparatus | |
EP4038573A4 (en) | Inspection method and apparatus |