SG10201913336YA - Device and method for controlling the tightness of a transport enclosure for the conveyance and atmospheric storage of semiconductor substrates - Google Patents

Device and method for controlling the tightness of a transport enclosure for the conveyance and atmospheric storage of semiconductor substrates

Info

Publication number
SG10201913336YA
SG10201913336YA SG10201913336YA SG10201913336YA SG10201913336YA SG 10201913336Y A SG10201913336Y A SG 10201913336YA SG 10201913336Y A SG10201913336Y A SG 10201913336YA SG 10201913336Y A SG10201913336Y A SG 10201913336YA SG 10201913336Y A SG10201913336Y A SG 10201913336YA
Authority
SG
Singapore
Prior art keywords
tightness
conveyance
controlling
semiconductor substrates
atmospheric storage
Prior art date
Application number
SG10201913336YA
Inventor
Bertrand Bellet
Julien Bounouar
Nicolas Chapel
Original Assignee
Pfeiffer Vacuum
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pfeiffer Vacuum filed Critical Pfeiffer Vacuum
Publication of SG10201913336YA publication Critical patent/SG10201913336YA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67389Closed carriers characterised by atmosphere control
    • H01L21/67393Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G47/00Article or material-handling devices associated with conveyors; Methods employing such devices
    • B65G47/74Feeding, transfer, or discharging devices of particular kinds or types
    • B65G47/90Devices for picking-up and depositing articles or materials
    • B65G47/91Devices for picking-up and depositing articles or materials incorporating pneumatic, e.g. suction, grippers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00Investigating fluid-tightness of structures
    • G01M3/02Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/26Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors
    • G01M3/32Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for containers, e.g. radiators
    • G01M3/3236Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for containers, e.g. radiators by monitoring the interior space of the containers
    • G01M3/3272Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for containers, e.g. radiators by monitoring the interior space of the containers for verifying the internal pressure of closed containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67126Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67376Closed carriers characterised by sealing arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67379Closed carriers characterised by coupling elements, kinematic members, handles or elements to be externally gripped
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6732Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67386Closed carriers characterised by the construction of the closed carrier

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)
SG10201913336YA 2016-11-07 2017-11-06 Device and method for controlling the tightness of a transport enclosure for the conveyance and atmospheric storage of semiconductor substrates SG10201913336YA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1660750A FR3058562B1 (en) 2016-11-07 2016-11-07 DEVICE AND METHOD FOR CONTROLLING THE SEALING OF A TRANSPORT ENCLOSURE FOR CONVEYING AND ATMOSPHERIC STORAGE OF SEMICONDUCTOR SUBSTRATES

Publications (1)

Publication Number Publication Date
SG10201913336YA true SG10201913336YA (en) 2020-02-27

Family

ID=57796603

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201913336YA SG10201913336YA (en) 2016-11-07 2017-11-06 Device and method for controlling the tightness of a transport enclosure for the conveyance and atmospheric storage of semiconductor substrates
SG11201903413UA SG11201903413UA (en) 2016-11-07 2017-11-06 Device and method for monitoring the leak-tightness of a transport enclosure for the atmospheric conveyance and storage of semiconductor substrates

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201903413UA SG11201903413UA (en) 2016-11-07 2017-11-06 Device and method for monitoring the leak-tightness of a transport enclosure for the atmospheric conveyance and storage of semiconductor substrates

Country Status (9)

Country Link
US (1) US11430681B2 (en)
EP (1) EP3535780B1 (en)
JP (1) JP7041144B2 (en)
KR (1) KR102436631B1 (en)
CN (1) CN109937473A (en)
FR (1) FR3058562B1 (en)
SG (2) SG10201913336YA (en)
TW (1) TWI753040B (en)
WO (1) WO2018083312A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7422577B2 (en) * 2020-03-23 2024-01-26 平田機工株式会社 Load port and control method
EP4356420A1 (en) * 2021-06-14 2024-04-24 Entegris, Inc. Substrate container with door gasket

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003315197A (en) * 2002-04-26 2003-11-06 Trecenti Technologies Inc Inspection method and inspection device for wafer storage device, and manufacturing method of semiconductor device
FR2874744B1 (en) * 2004-08-30 2006-11-24 Cit Alcatel VACUUM INTERFACE BETWEEN A MINI-ENVIRONMENT BOX AND EQUIPMENT
CN101370616B (en) * 2006-01-11 2011-04-27 应用材料股份有限公司 Substrate carrier, loading port and methods for purging a substrate carrier
JP2007227800A (en) * 2006-02-24 2007-09-06 Hitachi Kokusai Electric Inc Substrate storage and transport container, and purge system of substrate storage and transport container
TW201010916A (en) * 2008-09-12 2010-03-16 Gudeng Prec Industral Co Ltd Wafer container with roller
JP5155848B2 (en) * 2008-12-18 2013-03-06 日本ケンブリッジフィルター株式会社 N2 purge device for FOUP
TWI538084B (en) * 2010-09-17 2016-06-11 昕芙旎雅股份有限公司 Cassette adapter
JP5815959B2 (en) * 2011-02-08 2015-11-17 近藤工業株式会社 Nozzle unit in N2 gas purge device
JP6131534B2 (en) * 2012-06-11 2017-05-24 シンフォニアテクノロジー株式会社 Purge nozzle unit, load port, mounting table, stocker
TWM456581U (en) * 2012-11-20 2013-07-01 Ming-Sheng Chen Inflatable cleanup system of wafer / mask sealed carrier
JP6132036B2 (en) * 2014-02-07 2017-05-24 村田機械株式会社 Purge apparatus and purge method
KR102400424B1 (en) * 2014-09-05 2022-05-19 로제 가부시키가이샤 Loading port and loading port atmoshpere substitution method
JP6459682B2 (en) * 2015-03-20 2019-01-30 Tdk株式会社 Gas purge device, load port device and gas purge method

Also Published As

Publication number Publication date
EP3535780A1 (en) 2019-09-11
CN109937473A (en) 2019-06-25
JP2019533907A (en) 2019-11-21
KR102436631B1 (en) 2022-08-25
US11430681B2 (en) 2022-08-30
EP3535780B1 (en) 2024-03-27
SG11201903413UA (en) 2019-05-30
TWI753040B (en) 2022-01-21
WO2018083312A1 (en) 2018-05-11
FR3058562B1 (en) 2019-05-10
KR20190073567A (en) 2019-06-26
TW201834118A (en) 2018-09-16
JP7041144B2 (en) 2022-03-23
FR3058562A1 (en) 2018-05-11
US20200051844A1 (en) 2020-02-13

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