SG10201903002XA - Photoresist stripper - Google Patents
Photoresist stripperInfo
- Publication number
- SG10201903002XA SG10201903002XA SG10201903002XA SG10201903002XA SG 10201903002X A SG10201903002X A SG 10201903002XA SG 10201903002X A SG10201903002X A SG 10201903002XA SG 10201903002X A SG10201903002X A SG 10201903002XA
- Authority
- SG
- Singapore
- Prior art keywords
- stripper
- solutions
- formulations containing
- potassium hydroxide
- photoresist stripper
- Prior art date
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 abstract 6
- 238000009472 formulation Methods 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- 150000001412 amines Chemical class 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical group OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 abstract 1
- 238000000465 moulding Methods 0.000 abstract 1
- 229910000027 potassium carbonate Inorganic materials 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/06—Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3218—Alkanolamines or alkanolimines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3227—Ethers thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5022—Organic solvents containing oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- C11D2111/22—
Abstract
OF THE DISCLOSURE PHOTORESIST STRIPPER Improved stripper solutions for removing photoresists from substrates are provided that exhibit improved compatibility with copper, leadfree solder, and epoxy- based molding compounds. The stripper solutions comprise a primary solvent, a secondary glycol ether solvent, potassium hydroxide, and an amine. The solutions also exhibit reduced potassium carbonate crystal formation compared to conventional formulations containing potassium hydroxide, and extended bath life compared to 10 formulations containing tetramethylammonium hydroxide. [no figure] -34-
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862656843P | 2018-04-12 | 2018-04-12 | |
US16/365,506 US11460778B2 (en) | 2018-04-12 | 2019-03-26 | Photoresist stripper |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201903002XA true SG10201903002XA (en) | 2019-11-28 |
Family
ID=66105228
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201903002X SG10201903002XA (en) | 2018-04-12 | 2019-04-03 | Photoresist stripper |
Country Status (8)
Country | Link |
---|---|
US (1) | US11460778B2 (en) |
EP (1) | EP3553811B1 (en) |
JP (1) | JP6878490B2 (en) |
KR (1) | KR102285001B1 (en) |
CN (1) | CN110376854B (en) |
IL (1) | IL265811B2 (en) |
SG (1) | SG10201903002XA (en) |
TW (1) | TWI726300B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3752887B1 (en) * | 2018-02-14 | 2022-04-13 | Merck Patent GmbH | Photoresist remover compositions |
US11460778B2 (en) * | 2018-04-12 | 2022-10-04 | Versum Materials Us, Llc | Photoresist stripper |
JP2022549372A (en) * | 2019-09-30 | 2022-11-24 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | photoresist remover |
CN111334115A (en) * | 2020-03-04 | 2020-06-26 | 博罗县东明化工有限公司 | Paint remover, preparation method thereof and paint removing method |
EP4314951A1 (en) * | 2021-04-30 | 2024-02-07 | Versum Materials US, LLC | Compositions for removing a photoresist from a substrate and uses thereof |
KR20220150134A (en) * | 2021-05-03 | 2022-11-10 | 삼성전자주식회사 | Composition for removing photoresist and methods of manufacturing semiconductor device and semiconductor package |
CN113861747B (en) * | 2021-08-31 | 2023-04-07 | 广东东明新材科技有限公司 | Paint remover and preparation method thereof |
TWI814652B (en) * | 2022-11-28 | 2023-09-01 | 南亞塑膠工業股份有限公司 | Defilming liquid |
CN117872693A (en) * | 2024-03-13 | 2024-04-12 | 深圳市松柏科工股份有限公司 | Positive photoresist stripping solution, preparation method and application thereof |
Family Cites Families (33)
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US592197A (en) * | 1897-10-19 | Fluid-pressure regulator | ||
US3269861A (en) * | 1963-06-21 | 1966-08-30 | Day Company | Method for electroless copper plating |
US3356694A (en) * | 1964-08-20 | 1967-12-05 | Syntex Corp | 3-keto-4-methylene derivatives of the androstane and pregnane series and process therefor |
US3856694A (en) * | 1973-06-18 | 1974-12-24 | Oxy Metal Finishing Corp | Process for stripping nickel from articles and composition utilized therein |
US5415811A (en) * | 1991-04-09 | 1995-05-16 | E And R Investments | Cleaning composition and method for utilizing same |
US5962197A (en) * | 1998-03-27 | 1999-10-05 | Analyze Inc. | Alkaline organic photoresist stripper |
US6471728B2 (en) * | 1998-05-15 | 2002-10-29 | Ecolab Incorporated | Removal of blood stains |
PT1105778E (en) * | 1998-05-18 | 2009-09-23 | Mallinckrodt Baker Inc | Silicate-containing alkaline compositions for cleaning microelectronic substrates |
KR100544889B1 (en) | 2003-05-15 | 2006-01-24 | 주식회사 엘지화학 | Photoresist stripper composition |
TWI315030B (en) | 2003-06-26 | 2009-09-21 | Dongwoo Fine Chem Co Ltd | Photoresist stripper composition, and exfoliation method of a photoresist using it |
US8163633B2 (en) * | 2004-10-07 | 2012-04-24 | Merck Patent Gmbh | Light-emitting nanoparticles and method of making same |
US20060094613A1 (en) * | 2004-10-29 | 2006-05-04 | Lee Wai M | Compositions and processes for photoresist stripping and residue removal in wafer level packaging |
KR100842853B1 (en) | 2006-09-27 | 2008-07-02 | 주식회사 대원에프엔씨 | Aqueous resist stripper formulation |
US7655608B2 (en) * | 2007-08-03 | 2010-02-02 | Dynaloy, Llc | Reduced metal etch rates using stripper solutions containing a copper salt |
KR101392629B1 (en) * | 2007-10-11 | 2014-05-07 | 동우 화인켐 주식회사 | Resist stripper composition and a method of stripping resist using the same |
TW200940706A (en) * | 2007-10-29 | 2009-10-01 | Ekc Technology Inc | Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions |
KR101579846B1 (en) * | 2008-12-24 | 2015-12-24 | 주식회사 이엔에프테크놀로지 | Composition for removing a photoresist pattern and method of forming a metal pattern using the composition |
CN102478768A (en) | 2010-11-26 | 2012-05-30 | 安集微电子(上海)有限公司 | Thick-film photoresist cleaning solution |
CN102540774A (en) | 2010-12-21 | 2012-07-04 | 安集微电子(上海)有限公司 | Cleaning agent for thick-film photoresist |
US8987181B2 (en) | 2011-11-08 | 2015-03-24 | Dynaloy, Llc | Photoresist and post etch residue cleaning solution |
CN103389627A (en) | 2012-05-11 | 2013-11-13 | 安集微电子科技(上海)有限公司 | Photoresist cleaning liquid |
CN103733137B (en) * | 2012-06-26 | 2019-06-25 | 野村微科学股份有限公司 | Corrosion inhibitor stripper |
KR101493294B1 (en) * | 2012-10-08 | 2015-02-16 | 에어 프로덕츠 앤드 케미칼스, 인코오포레이티드 | Stripping and cleaning compositions for removal of thick film resist |
US20140100151A1 (en) | 2012-10-08 | 2014-04-10 | Air Products And Chemicals Inc. | Stripping and Cleaning Compositions for Removal of Thick Film Resist |
US9158202B2 (en) * | 2012-11-21 | 2015-10-13 | Dynaloy, Llc | Process and composition for removing substances from substrates |
JP6277511B2 (en) | 2013-10-18 | 2018-02-14 | パナソニックIpマネジメント株式会社 | Resist stripper |
JP6171087B2 (en) * | 2014-04-07 | 2017-07-26 | 旭化成株式会社 | OPTICAL SUBSTRATE, ITS MANUFACTURING METHOD, LAMINATE, RESIST REMOVAL |
US10073351B2 (en) * | 2014-12-23 | 2018-09-11 | Versum Materials Us, Llc | Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation |
US10072237B2 (en) * | 2015-08-05 | 2018-09-11 | Versum Materials Us, Llc | Photoresist cleaning composition used in photolithography and a method for treating substrate therewith |
US11175587B2 (en) * | 2017-09-29 | 2021-11-16 | Versum Materials Us, Llc | Stripper solutions and methods of using stripper solutions |
US11353794B2 (en) * | 2017-12-22 | 2022-06-07 | Versum Materials Us, Llc | Photoresist stripper |
US10948826B2 (en) * | 2018-03-07 | 2021-03-16 | Versum Materials Us, Llc | Photoresist stripper |
US11460778B2 (en) * | 2018-04-12 | 2022-10-04 | Versum Materials Us, Llc | Photoresist stripper |
-
2019
- 2019-03-26 US US16/365,506 patent/US11460778B2/en active Active
- 2019-04-03 SG SG10201903002X patent/SG10201903002XA/en unknown
- 2019-04-03 IL IL265811A patent/IL265811B2/en unknown
- 2019-04-08 TW TW108112182A patent/TWI726300B/en active
- 2019-04-11 JP JP2019075420A patent/JP6878490B2/en active Active
- 2019-04-11 EP EP19168714.4A patent/EP3553811B1/en active Active
- 2019-04-12 KR KR1020190043130A patent/KR102285001B1/en active IP Right Grant
- 2019-04-12 CN CN201910295979.2A patent/CN110376854B/en active Active
Also Published As
Publication number | Publication date |
---|---|
IL265811A (en) | 2019-05-30 |
TWI726300B (en) | 2021-05-01 |
JP2019185046A (en) | 2019-10-24 |
JP6878490B2 (en) | 2021-05-26 |
KR102285001B1 (en) | 2021-08-04 |
IL265811B2 (en) | 2023-02-01 |
US20190317409A1 (en) | 2019-10-17 |
KR20190119544A (en) | 2019-10-22 |
IL265811B (en) | 2022-10-01 |
EP3553811A1 (en) | 2019-10-16 |
EP3553811B1 (en) | 2022-03-09 |
CN110376854A (en) | 2019-10-25 |
CN110376854B (en) | 2023-06-23 |
TW201943850A (en) | 2019-11-16 |
US11460778B2 (en) | 2022-10-04 |
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