KR20180084460A - NOVEL COMPOUND having VINYLPHENYLOXY moiety AND PHOTOSENSITIVE PHOTORESIST COMPOSITION INCLUDING THE SAME - Google Patents

NOVEL COMPOUND having VINYLPHENYLOXY moiety AND PHOTOSENSITIVE PHOTORESIST COMPOSITION INCLUDING THE SAME Download PDF

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Publication number
KR20180084460A
KR20180084460A KR1020170008092A KR20170008092A KR20180084460A KR 20180084460 A KR20180084460 A KR 20180084460A KR 1020170008092 A KR1020170008092 A KR 1020170008092A KR 20170008092 A KR20170008092 A KR 20170008092A KR 20180084460 A KR20180084460 A KR 20180084460A
Authority
KR
South Korea
Prior art keywords
photoresist composition
same
vinylphenyloxy
composition including
moiety
Prior art date
Application number
KR1020170008092A
Other languages
Korean (ko)
Other versions
KR101907410B1 (en
Inventor
문봉석
진성민
강지승
하민수
이규성
진상준
박노길
변우근
Original Assignee
주식회사 트리엘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 트리엘 filed Critical 주식회사 트리엘
Priority to KR1020170008092A priority Critical patent/KR101907410B1/en
Publication of KR20180084460A publication Critical patent/KR20180084460A/en
Application granted granted Critical
Publication of KR101907410B1 publication Critical patent/KR101907410B1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
    • C07C43/215—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring having unsaturation outside the six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
    • C07C43/205—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring the aromatic ring being a non-condensed ring
    • C07C43/2055—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring the aromatic ring being a non-condensed ring containing more than one ether bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
    • C07C43/225—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
    • C07D303/02—Compounds containing oxirane rings
    • C07D303/04—Compounds containing oxirane rings containing only hydrogen and carbon atoms in addition to the ring oxygen atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)

Abstract

The present invention relates to a compound having a vinylphenyloxy group which is represented by chemical formula A, B, or C, and a photosensitive photoresist composition including the same. The chemical formula A, B, or C are as described in the detailed description of the invention. An objective of the present invention is to provide a novel photopolymerizable monomer that can be used in a photoresist composition.
KR1020170008092A 2017-01-17 2017-01-17 NOVEL COMPOUND having VINYLPHENYLOXY moiety AND PHOTOSENSITIVE PHOTORESIST COMPOSITION INCLUDING THE SAME KR101907410B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020170008092A KR101907410B1 (en) 2017-01-17 2017-01-17 NOVEL COMPOUND having VINYLPHENYLOXY moiety AND PHOTOSENSITIVE PHOTORESIST COMPOSITION INCLUDING THE SAME

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020170008092A KR101907410B1 (en) 2017-01-17 2017-01-17 NOVEL COMPOUND having VINYLPHENYLOXY moiety AND PHOTOSENSITIVE PHOTORESIST COMPOSITION INCLUDING THE SAME

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020180083109A Division KR20180084716A (en) 2018-07-17 2018-07-17 NOVEL COMPOUND having VINYLPHENYLOXY moiety AND PHOTOSENSITIVE PHOTORESIST COMPOSITION INCLUDING THE SAME

Publications (2)

Publication Number Publication Date
KR20180084460A true KR20180084460A (en) 2018-07-25
KR101907410B1 KR101907410B1 (en) 2018-10-12

Family

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Family Applications (1)

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KR1020170008092A KR101907410B1 (en) 2017-01-17 2017-01-17 NOVEL COMPOUND having VINYLPHENYLOXY moiety AND PHOTOSENSITIVE PHOTORESIST COMPOSITION INCLUDING THE SAME

Country Status (1)

Country Link
KR (1) KR101907410B1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114656341A (en) * 2020-12-23 2022-06-24 信越化学工业株式会社 Alcohol compound, chemically amplified negative resist composition and method for forming resist pattern
WO2022202538A1 (en) * 2021-03-23 2022-09-29 三菱ケミカル株式会社 Compound, method for producing same, polymerizable composition, polymer, holographic recording medium, optical material, and optical component
WO2024063135A1 (en) * 2022-09-22 2024-03-28 三菱ケミカル株式会社 Compound, polymerizable composition, polymer, hologram recording medium, optical material, and optical component

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100731327B1 (en) 2005-12-22 2007-06-25 주식회사 삼양이엠에스 Negative photoresist composition
KR20160057931A (en) 2014-11-14 2016-05-24 주식회사 삼양사 New negative photoresist composition

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100511100B1 (en) * 2002-07-12 2005-08-31 김미화 Perfluorostyrene compounds, Coating solution and Optical waveguide device using the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100731327B1 (en) 2005-12-22 2007-06-25 주식회사 삼양이엠에스 Negative photoresist composition
KR20160057931A (en) 2014-11-14 2016-05-24 주식회사 삼양사 New negative photoresist composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114656341A (en) * 2020-12-23 2022-06-24 信越化学工业株式会社 Alcohol compound, chemically amplified negative resist composition and method for forming resist pattern
CN114656341B (en) * 2020-12-23 2024-05-28 信越化学工业株式会社 Alcohol compound, chemically amplified negative resist composition, and resist pattern forming method
WO2022202538A1 (en) * 2021-03-23 2022-09-29 三菱ケミカル株式会社 Compound, method for producing same, polymerizable composition, polymer, holographic recording medium, optical material, and optical component
WO2024063135A1 (en) * 2022-09-22 2024-03-28 三菱ケミカル株式会社 Compound, polymerizable composition, polymer, hologram recording medium, optical material, and optical component

Also Published As

Publication number Publication date
KR101907410B1 (en) 2018-10-12

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