CN103733137B - Corrosion inhibitor stripper - Google Patents
Corrosion inhibitor stripper Download PDFInfo
- Publication number
- CN103733137B CN103733137B CN201280038198.1A CN201280038198A CN103733137B CN 103733137 B CN103733137 B CN 103733137B CN 201280038198 A CN201280038198 A CN 201280038198A CN 103733137 B CN103733137 B CN 103733137B
- Authority
- CN
- China
- Prior art keywords
- corrosion inhibitor
- inhibitor stripper
- mass
- resist
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The present invention provides a kind of corrosion inhibitor stripper, and while having the excellent resist stripping performance as corrosion inhibitor stripper, in pure water rinsing, resist overburden will not be precipitated on substrate or adhere to again.The corrosion inhibitor stripper that a kind of pair of metal line is also provided, particularly does not have corrosivity to thin copper film and can recycle.Above-mentioned corrosion inhibitor stripper is characterized in that, is contained: (A) is selected from 50~99 mass % of compound of one or more of ethylene carbonate, propylene carbonate, gamma-butyrolacton and cyclopentanone;And 1~50 mass % of (B) carbonic acid glyceride.
Description
Technical field
The present invention relates to a kind of to form on silicon substrate or glass substrate in the photo-mask process of metal wiring pattern, for shelling
Corrosion inhibitor stripper from the resist cover film after etching operation.
Background technique
In the past, the remover as the resist cover film being made of novolac resin, always using the against corrosion of amine system
Release agent.As the corrosion inhibitor stripper of the amine system, for example, it is known in monoethanolamine, N- methyl amino ethanol, N- methyl -2-
Multicomponent corrosion inhibitor stripper (example of the water-miscible organic solvents such as dimethyl sulfoxide and water is added in the amines such as pyrrolidones
As referring to patent document 1).
The corrosion inhibitor stripper of above-mentioned amine system can while cutting off the crosslinking points of novolac resin and emulsion,
With emulsion or resin forming salt.As a result, resist cover film becomes solvable and removes from substrate.
But in the ingredient of above-mentioned multicomponent amine system corrosion inhibitor stripper, low boiling point component is more, and respectively at
The vapour pressure divided is different.Therefore, because the evaporation capacity of each ingredient is different in use, so composition can become in use
It is dynamic, there are problems that stripping performance decline.In addition, if Reusability, resist overburden in corrosion inhibitor stripper
Meltage increases, so there are problems that declining stripping performance because of the influence of the resist overburden.In turn, amine system is anti-
It is larger to the corrosivity of thin copper film to lose release agent, in the case where wiring pattern is more miniaturize, it is also possible to become broken string
Deng reason.
As the corrosion inhibitor stripper other than the corrosion inhibitor stripper of amine system, for example, it is known sub- with ethylene carbonate and carbonic acid
Propyl ester is the corrosion inhibitor stripper of principal component or using ethylene carbonate and gamma-butyrolacton as the corrosion inhibitor stripper of principal component.Have
Close these corrosion inhibitor strippers, it is also known that in the solution dissolved with resist overburden after resist removing, by being blown into
Gas containing ozone and only make resist overburden decompose, then by corrosion inhibitor stripper recycle (referring for example to patent
Document 2, patent document 3).
In addition, it is also known that be mixed with the corrosion inhibitor stripper of cyclohexanone and butyl acetate (referring for example to patent document 4).
For corrosion inhibitor stripper, it is desirable that it is with excellent stripping performance, to metal line, particularly right
Thin copper film does not have corrosivity, it is contemplated that the operation under heating also requires its flash-point height, safety height etc..
In addition, after connecing resist stripping process after the etching, carrying out rinsing process in photo-mask process.It is rinsing
In process, the corrosion inhibitor stripper adhered on substrate is washed into removing with pure water.For this rinsing process carried out with pure water,
There are the resist overburden dissolved in corrosion inhibitor stripper precipitation disperse in substrate surface or corrosion inhibitor stripper it is against corrosion
The particle of agent overburden is attached to the problems such as substrate surface again.
In order to prevent such resist overburden substrate surface precipitation or again adhere to, following grade sides can be taken
Method: sprayed by the pure water of high pressure etc., the method for carrying out long-time rinsing while applying the power of physical property to substrate;Or
Person is before the rinsing process using pure water, the method that is rinsed with water-soluble organic solvent.But no matter which kind of method
The problem of all there is damage productivity or workability.Especially later approach, in addition to the processing of pure water used in rinsing
In addition, the processing of water-miscible organic solvent used in rinsing can also be led to the problem of.
Existing technical literature
Patent document
Patent document 1: No. 2911792 specifications of Japanese Patent No.
Patent document 2: No. 3914842 specifications of Japanese Patent No.
Patent document 3: No. 4883975 specifications of Japanese Patent No.
Patent document 4: No. 4475664 specifications of Japanese Patent No.
Summary of the invention
The problem to be solved in the present invention
The present invention was completed to solve the above problem, and it is an object of the present invention to provide a kind of remove with excellent resist
While performance, in pure water rinsing the resist overburden corrosion inhibitor stripper that will not be precipitated on substrate or adhere to again.
It is another object of the present invention to provide one kind in the corrosion inhibitor stripper, to metal line, particularly right
Thin copper film does not have corrosive corrosion inhibitor stripper.Purpose, which also resides in, provides a kind of corrosion inhibitor stripper that can be recycled.
The means solved the problems, such as
Present inventor et al. has made intensive studies, ties to solve the above problem in previous corrosion inhibitor stripper
Fruit discovery, by the past as corrosion inhibitor stripper use be selected from ethylene carbonate, propylene carbonate, gamma-butyrolacton and
Add carbonic acid glyceride (glycerol carbonate) in one or more of cyclopentanone, then when pure water rinses, resist stripping
It will not be precipitated on substrate from object or adhere to again.
The present invention is completed on the basis of the understanding, provide it is a kind of selected from ethylene carbonate, propylene carbonate,
The corrosion inhibitor stripper for adding carbonic acid glyceride in one or more of gamma-butyrolacton and cyclopentanone and being formed is rinsed in pure water
When, resist overburden will not be precipitated on substrate or adhere to again.
1st embodiment of corrosion inhibitor stripper of the invention is characterized in that, is contained: (A) be selected from ethylene carbonate,
50~99 mass % of compound of one or more of propylene carbonate, gamma-butyrolacton and cyclopentanone;And (B) carbonic acid glyceride 1
~50 mass %.
In addition, in the present specification, it sometimes will be in ethylene carbonate, propylene carbonate, gamma-butyrolacton and cyclopentanone
1 kind or more of compound be referred to as " (A) ingredient ", carbonic acid glyceride is referred to as " (B) ingredient ".
2nd embodiment of corrosion inhibitor stripper of the invention is characterized in that, in the 1st embodiment, (A) ingredient is
Selected from one or more of ethylene carbonate and propylene carbonate.
3rd embodiment of corrosion inhibitor stripper of the invention is characterized in that, in the 1st embodiment, is contained: carbonic acid
20~80 mass % of ethyl, 5~30 mass % of propylene carbonate;And 5~50 mass % of (B) carbonic acid glyceride.
4th embodiment of corrosion inhibitor stripper of the invention is characterized in that, in the 1st embodiment, is contained: carbonic acid
55~75 mass % of ethyl, 5~25 mass % of propylene carbonate;And 10~30 mass % of (B) carbonic acid glyceride.
5th~the 8th embodiment of corrosion inhibitor stripper of the invention is characterized in that, relative to times in the 1st~the 4th
100 mass parts of one embodiment, the water containing 30 below the mass.
9th and the 10th embodiment of corrosion inhibitor stripper of the invention is characterized in that, in the 1st~the 8th embodiment
In, viscosity at 60 DEG C is 10cP or less.
11st embodiment of corrosion inhibitor stripper of the invention is characterized in that, in the 1st~the 10th embodiment, is dodged
Point is 100 DEG C or more.
The effect of invention
Corrosion inhibitor stripper of the invention has excellent stripping performance.Even if in addition, directly with pure after resist removing
Water rinsing, resist overburden will not be precipitated in substrate surface, adhere to again.
In turn, no corrosiveness is routed to thin copper film or aluminium.In addition, due to being free of low boiling point component, so in use
It will not change at being grouped as, thus even if in the case where the removing to corrosion inhibitor stripper heating to carry out resist cover film
It is also safety.
Detailed description of the invention
Fig. 1 is the light for indicating the state of precipitation or attachment without resist overburden on the substrate of the embodiment of the present invention
Learn microscope photo.
Fig. 2 is the optical microscopy for indicating to have on the substrate of comparative example the state of precipitation or attachment of resist overburden
Photo.
Fig. 3 A is the plan view for showing schematically sample used in the embodiment of the present invention.
Fig. 3 B is the side view for showing schematically sample shown in Fig. 3 A.
Fig. 4 A is the plan view for showing schematically sample used in the embodiment of the present invention.
Fig. 4 B is the side view for showing schematically sample shown in Fig. 4 A.
Specific embodiment
(the 1st embodiment)
1st embodiment of the invention be containing: (A) be selected from ethylene carbonate, propylene carbonate, gamma-butyrolacton and ring
50~99 mass % of compound of one or more of pentanone;And 1~50 mass % of (B) carbonic acid glyceride.
Compound used in the embodiment is those of in table 1 below.
In addition, the common operating environment temperature in the dust proof workshop (clean room) of such as factory is 22~27 DEG C,
So " room temperature " in the following description refers to the temperature range.
(A) ingredient, (B) ingredient of the corrosion inhibitor stripper of present embodiment are to have five-membered ring knot in molecular structure
Structure.The common molecular structure that a pentacyclic carbon atom constitutes carbonyl is constituted moreover, having.Therefore, compatibility is good, energy
It is enough easily to mix.In addition, to resist cover film, particularly to the molten of the resist cover film being made of novolac resin
Xie Xinggao, resist stripping performance are excellent.
(A) ingredient is those of known respectively as corrosion inhibitor stripper.But it is right if (A) ingredient only is used only
After the resist covering film stripping of substrate, when directly being rinsed with pure water, the resist overburden dissolved is possible in substrate
Surface is precipitated or adheres to again.(B) ingredient plays the role of preventing the precipitation of the resist overburden or adheres to again.
(A) mixing ratio of ingredient and (B) ingredient are as follows: 50~99 mass % of (A) ingredient, (B) ingredient 1~50 mass %, it is excellent
It is selected as: 50~95 mass % of (A) ingredient, 5~50 mass % of (B) ingredient, more preferably: 70~90 mass % of (A) ingredient, (B) ingredient
10~30 mass %.
As shown in table 1, (B) ingredient viscosity compared with (A) ingredient is high.Therefore, it needs in operation using the against corrosion of low viscosity
When release agent, preferably properly the ratio of (A) ingredient is improved.
In the 1st embodiment, (A) makees the removing of resist cover film if the ratio of ingredient is lower than 50 mass %
With decline, the ratio of (B) ingredient becomes excessive simultaneously, and viscosity is got higher.As a result, in terms for the treatment of temperature such as gets higher at the workability
Cause problems.In addition, the ratio of (A) ingredient if it exceeds 99 mass %, then the ratio of (B) ingredient becomes too small, removes substrate
Resist cover film after when directly being rinsed with pure water, resist overburden is possible to be precipitated in substrate surface or attached again
?.
The precipitation of the particle of the resist overburden in rinsing process is able to suppress by the addition of carbonic acid glyceride or is resisted
Lose agent overburden may not also be clear the reasons why attachment again.It but can speculate as follows: be added to (B) ingredient in (A) ingredient
Corrosion inhibitor stripper compared with the corrosion inhibitor stripper of independent (A) ingredient, become smaller with the contact angle of substrate, so to resist
Compatibility get higher.It is considered that this is that resist overburden becomes to be not easy the reason of being precipitated when being rinsed with pure water.
(the 2nd embodiment)
The corrosion inhibitor stripper of 2nd embodiment uses ethylene carbonate as (A) ingredient.The embodiment is only by the
(A) ingredient of 1 embodiment is set as ethylene carbonate, and the preferred proportion of (A) ingredient and (B) ingredient, preferred ratio are all
It is identical as the 1st embodiment.
In addition, when ethylene carbonate is 80 mass % or more, ethylene carbonate cannot be complete under room temperature in the embodiment
It dissolves and is precipitated.Therefore, need to be heated at this time ethylene carbonate dissolution temperature come using.
(the 3rd and the 4th embodiment)
3rd and the 4th embodiment is to use ethylene carbonate and carbonic acid according to the ratio of regulation in the 1st embodiment
Sub- propyl ester is used as (A) ingredient.
The content ratio of the ethylene carbonate of the corrosion inhibitor stripper of the embodiment is 20~80 mass %, more preferably
55~75 mass %, the content ratio of propylene carbonate are 5~30 mass %, more preferably 5~25 mass %.As (A) ingredient
The total amount of ethylene carbonate and propylene carbonate is identical as the ratio of (B) ingredient and the 1st embodiment.
The content ratio of ethylene carbonate is if it is 75 mass % hereinafter, then fusing point becomes 15 DEG C hereinafter, being at room temperature liquid
Body the workability such as becomes easy so as to improve metering.
(A) preferred proportion and its reason of ingredient and (B) ingredient are identical as the explanation carried out to the 1st embodiment.
(the 5th~the 8th embodiment)
Corrosion inhibitor stripper in the 5th~the 8th embodiment, relative to any one embodiment in the 1st~the 4th
100 mass parts, the water of addition 30 below the mass.
The corrosion inhibitor stripper of 1st~the 4th embodiment is due to being free of low boiling point component, so in room temperature or being heated to comparing
In the operation process of lower temperature, do not need particularly to worry fire.But the overburden operation in the case where carrying out higher temperature
When, need to consider the generation of steam.
In the 5th~the 8th embodiment, by further being added in the corrosion inhibitor stripper of the 1st~the 4th embodiment
Flash-point can be improved in water, and safety when further increasing heating operation.
The additive amount of the water of the corrosion inhibitor stripper of the embodiment is relative to whole 100 mass parts of corrosion inhibitor stripper
Below the mass for 30, more preferably 10~25 mass parts.
The additive amount of water is if it exceeds 30 mass parts, it is likely that sufficient resist stripping performance can not be obtained, if
Less than 10 mass parts, then the rising degree of flash-point is smaller.
(the 9th and the 10th embodiment)
9th and the 10th embodiment is characterized in, viscosity at 60 DEG C of corrosion inhibitor stripper is 10cP hereinafter, preferably
5cP。
(B) ingredient of the invention is since viscosity is higher, so viscosity is got higher when the use level of (B) ingredient is more, it is possible to
Obstacle is brought to operation.In this case, it preferably heats and reduces the viscosity to above range to carry out overburden operation.
Additionally, this invention is not limited to above embodiments.Within the scope of the effect of the invention, can also add
Add other additives, such as a small amount of water-soluble organic solvent.
In addition, each ingredient of the invention is due to pentacyclic basic structure, so the patience to ozone oxidation is strong.Cause
This, is blown into the gas containing ozone in the used remover dissolved with resist, removing impurity can also be decomposed, net
It is recycled on the basis of change.
In addition, the compound of corrosion inhibitor stripper of the invention due to not using amine system, so being routed to thin copper film or aluminium
There is no corrosivity.
In addition, in the 2nd~the 4th embodiment, to use ethylene carbonate and/or propylene carbonate as (A) ingredient
Example be illustrated, but the present invention is not limited to these embodiments.Use gamma-butyrolacton or cyclopentanone as (A)
Also same effect can be obtained in the case where ingredient.
Embodiment
The embodiment of the present invention is illustrated below.
In addition, mark below indicates following substances.
EC: ethylene carbonate
PC: propylene carbonate
GC: carbonic acid glyceride
GBL: gamma-butyrolacton
CP: cyclopentanone
MEA: monoethanolamine
DMSO: dimethyl sulfoxide
PFA: tetrafluoroethylene-perfluoro alkoxy vinyl copolymer
(evaluation 1 of corrosion inhibitor stripper)
The evaluation of simulated experiment 1(resist acceptable concentration)
For the sample (corrosion inhibitor stripper) of the mixed proportion modulation according to table 2, modulation removing is against corrosion as described below
Remover (hereinafter referred to as " resist lysate ") is dissolved in agent, then carries out the evaluation of resist acceptable concentration.Hold in resist
Perhaps in the evaluation of concentration, precipitation will not be generated like that by measuring the optical microscope photograph as shown in Figure 1 of the substrate surface after rinsing
The concentration is set as resist acceptable concentration by the maximum concentration of object or attachment.Produce light when precipitate or attachment
It is shown in Figure 2 to learn microscope photo.
[modulation of resist lysate]
1mL novolaks are added dropwise in the shallow chassis of glass (trade name/Off ラ ッ ト シ ャ ー レ (AS ONE Co. Ltd. system))
Resin system positive-workingresist (trade name/ZPP-1800-15(Japan Zeon Co. Ltd. system)), by manufactured film at 110 DEG C
Lower prebake conditions 5 minutes, rear baking 5 minutes, make its solidification at 130 DEG C.
The novolac resin system positive-workingresist after solidifying is set to be dissolved in the sample (corrosion inhibitor stripper) of evaluation object
In, modulate the resist lysate of various concentration.
[evaluation of resist acceptable concentration]
In the resist lysate 100mL of the various concentration for the evaluation object for being heated to 60 DEG C with thermal agitation device, by glass
Glass substrate (CORNING corporation, trade name: イ ー グ Le 2000,10mm × 50mm, thickness 0.7mm) impregnates 60 seconds, then exists
Dipping rinses after 60 seconds in the pure water (hydrostatic) of room temperature, is made it dry after rinsing with nitrogen.With 10 times of optical microscopy
(Olympus corporation, trade name: industrial inspection microscope MX51) observes substrate surface, confirms the precipitate of substrate surface
Or the presence or absence of attachment.
For sample (corrosion inhibitor stripper) 1~33, resist acceptable concentration is evaluated as described below.
[evaluation]
Resist acceptable concentration:
In addition, industrially, the corrosion inhibitor stripper for being 0.1 mass % or so or more if it is resist acceptable concentration, then
Residue will not occur in pure water rinsing, be practical.
In addition, evaluating viscosity as described below for sample (corrosion inhibitor stripper) 1~33.
[evaluation of viscosity]
The sample (corrosion inhibitor stripper) of evaluation object is heated to 60 DEG C, using rotary viscosimeter (CBC corporation,
Trade name: Viscomate Model VM-10A [body diameter 3.5mm]) measurement viscosity.
Viscosity:
Lower than 5cP A
5cP or more but be lower than 10cP B
10cP or more C
Above result is shown in Table 2 together with the composition of sample (corrosion inhibitor stripper).
In addition, sample 2~29 is embodiment, sample 1 and sample 30~33 are comparative examples.
Table 2
(evaluation 2 of corrosion inhibitor stripper)
Water is added according to ratio shown in table 3 in 100 mass parts of mixture of EC:PC:GC=65:15:20, to adjust
Sample (corrosion inhibitor stripper) 34~38 processed, evaluates resist acceptable concentration, viscosity, as described below in the same manner as above-mentioned sample
Evaluate inflammability in ground.
[flammable evaluation]
For the sample (corrosion inhibitor stripper) of evaluation object, using a gram sharp Forlan obtain (Cleveland) it is open, according to
Fire service law danger validation test handbook carries out flashing test and flammable evaluation.
Without inflammability A
Flash-point is 100 DEG C or more B
As a result it is shown in Table 3.
In addition, sample 34~38 is embodiment.
Table 3
By table 2,3 it is found that the resist acceptable concentration of the corrosion inhibitor stripper of embodiment is high.Therefore, embodiment
The generation of residue when corrosion inhibitor stripper greatly can inhibit pure water to rinse.As shown in Table 3, it is added to the embodiment party of water
The flash-point of the corrosion inhibitor stripper of formula is high, and especially the sample 37 containing water more than regulated proportion and sample 38 are without inflammability.
Therefore, the corrosion inhibitor stripper for being added to the embodiment of water can have more excellent safety.
In addition, the corrosion inhibitor stripper of embodiment is due to containing EC, PC and GC with ratio of the invention, so at 60 DEG C
Viscosity it is also low, workability is excellent.
(evaluation 3 of corrosion inhibitor stripper)
The evaluation of simulated experiment 2(resist stripping performance)
[production of sample]
Fig. 3 A is the plan view of sample used in simulation test 2.Fig. 3 B is its side view.
In figure 3 a, public in 30mm × 50mm × 0.7mm glass substrate 1(trade name/イ ー グ Le 2000(CORNING
Department's system)) on, according to 2 μm of film thickness slot coated novolac resin system positive-workingresist (trade name/ZPP-1800-15(days
This Zeon Co. Ltd. system)), prebake conditions (at 110 DEG C 5 minutes), rear baking (at 130 DEG C 5 minutes) are carried out, keep it solid
Change.
Then, width 19.0mm, thickness are pasted along its length in the substantial middle of the resist coating part 2 of the glass substrate 1
The Kapton Tape 3(trade name of 0.06mm/API-114(チ ュ ー コ ー フ ロ ー corporation)), sample is made.
At the side of the close width direction of the Kapton Tape 3 of stickup, alongst to reach glass base
The depth on 1 surface of plate draws upper trace, the adhesive tape of exterior portion is removed, as shown in Fig. 3 A, Fig. 3 B, by the striping of adhesive tape
(boundary line of symbol 3 and 2) is set as immersing the start line of distance.
Sample 300mL is added in 1.5L quartz beaker, is stirred on one side with the revolving speed of 200rpm using thermal agitation device, on one side
Liquid temperature is held in 50 DEG C.3 evaluation samples are set on the fixture made of PFA, 1 point is impregnated in the sample of evaluation object
Clock.Then dry with nitrogen by the pure water of the evaluation sample 18M Ω cm after dipping.
Fig. 4 A is the plan view of the evaluation sample after dipping, and Fig. 4 B is its side view.
After drying process, the Kapton Tape 3 that sample is evaluated shown in Fig. 4 A, Fig. 4 B is removed, optical microscopy is used
The surface that Kapton Tape is observed under 10 times of multiplying power, measures the immersion distance S of corrosion inhibitor stripper, as stripping performance
Index.Immersing distance S is every 1 evaluation sample measurement 5 positions, totally 15 positions, by its average value be set as immersion away from
From.
The result of experiment is shown in Table 4.
In addition, sample 39,40 is embodiment, sample 41~43 is comparative example.
Table 4
Sample | Ingredient (quality %) | Stripping performance relative value * |
39 | EC:PC:GC=65:15:20 | 1.09 |
40 | EC:PC:GC: water=50:15:15:20 | 0.95 |
41 | Only EC | 1 |
42 | Only GC | 0.13 |
43 | Amine (MEA:DMSO=70:30) | 1.04 |
Relative value when sample 41 being * set as 1.00
As shown in Table 4, the sample containing GC (sample 39 and sample 40) has and only EC(sample 41) and amine (sample
43) same resist stripping performance.
In addition, in table 4, the composition of sample 39 is identical as sample 34, the composition of sample 2 is identical as sample 38.
(evaluation 4 of corrosion inhibitor stripper)
[to the erosion analysis of metal line]
The simulation metal line sample for having sputtered Cu and Al on the glass substrate is being heated to 60~80 DEG C of evaluation pair
It impregnates 100 minutes in sample (corrosion inhibitor stripper) 200g of elephant and under stiring.After dipping, with ICP-MS(inductive coupling etc.
Gas ions mass spectrometer) the middle amount of metal dissolved out of measurement sample (corrosion inhibitor stripper), the every of Cu, Al is found out by its result
1 minute corrosion rate.
As a result it is shown in Table 5.
In addition, sample 44,45 is embodiment, sample 46 is comparative example.
Table 5
As shown in Table 5, the sample (corrosion inhibitor stripper) 44 of EC:PC:GC contained with the ratio of 65:15:20 and with 50:
The ratio of 15:15:20 contains EC:PC:GC: the sample (corrosion inhibitor stripper) 45 of water is right compared with general amine system remover
The corrosivity of Cu, Al are all low.
Symbol description
1: glass substrate, 2: resist coating part, 3: Kapton Tape, 4: resist coating part, S: immersing distance.
Claims (11)
1. a kind of corrosion inhibitor stripper, which is characterized in that it contains:
(A) 50~99 matter of compound selected from one or more of ethylene carbonate, propylene carbonate, gamma-butyrolacton and cyclopentanone
Measure %;And
(B) 1~50 mass % of carbonic acid glyceride.
2. corrosion inhibitor stripper according to claim 1, which is characterized in that (A) is selected from ethylene carbonate and carbon
One or more of sour Asia propyl ester.
3. corrosion inhibitor stripper according to claim 1, which is characterized in that it contains: 20~80 matter of (A) ethylene carbonate
Measure %, 5~30 mass % of propylene carbonate;And 5~50 mass % of (B) carbonic acid glyceride.
4. corrosion inhibitor stripper according to claim 1, which is characterized in that it is only by (A) ethylene carbonate 55~75 matter
Measure %, 5~25 mass % of propylene carbonate;And 10~30 mass % of (B) carbonic acid glyceride is constituted.
5. corrosion inhibitor stripper according to claim 1, which is characterized in that it further contains water, the ratio phase of the water
It is 30 below the mass for 100 mass parts of the corrosion inhibitor stripper before the addition of the water.
6. corrosion inhibitor stripper according to claim 2, which is characterized in that it further contains water, the ratio phase of the water
It is 30 below the mass for 100 mass parts of the corrosion inhibitor stripper before the addition of the water.
7. corrosion inhibitor stripper according to claim 3, which is characterized in that it further contains water, the ratio phase of the water
It is 30 below the mass for 100 mass parts of the corrosion inhibitor stripper before the addition of the water.
8. a kind of corrosion inhibitor stripper, which is characterized in that relative to whole 100 matter of corrosion inhibitor stripper as claimed in claim 4
Measure part, the water containing 30 below the mass.
9. corrosion inhibitor stripper described according to claim 1~any one of 8, which is characterized in that viscosity at 60 DEG C is
10cP or less.
10. corrosion inhibitor stripper described according to claim 1~any one of 8, which is characterized in that flash-point be 100 DEG C with
On.
11. corrosion inhibitor stripper according to claim 9, which is characterized in that flash-point is 100 DEG C or more.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012-143500 | 2012-06-26 | ||
JP2012143500 | 2012-06-26 | ||
PCT/JP2012/006286 WO2014002151A1 (en) | 2012-06-26 | 2012-10-02 | Resist stripping agent |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103733137A CN103733137A (en) | 2014-04-16 |
CN103733137B true CN103733137B (en) | 2019-06-25 |
Family
ID=49782388
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201280038198.1A Active CN103733137B (en) | 2012-06-26 | 2012-10-02 | Corrosion inhibitor stripper |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5437541B1 (en) |
KR (1) | KR102021158B1 (en) |
CN (1) | CN103733137B (en) |
TW (1) | TWI572999B (en) |
WO (1) | WO2014002151A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7061962B2 (en) * | 2016-07-28 | 2022-05-02 | 野村マイクロ・サイエンス株式会社 | Resist stripping solution composition |
US11460778B2 (en) * | 2018-04-12 | 2022-10-04 | Versum Materials Us, Llc | Photoresist stripper |
CN113777895A (en) * | 2021-09-17 | 2021-12-10 | 宏伟建设工程股份有限公司 | Resist stripping liquid composition |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1808286A (en) * | 2004-10-19 | 2006-07-26 | 皮瑞克斯股份有限公司 | Process, treatment fluid and apparatus for removing sticky material from basal body surface |
KR20100027511A (en) * | 2008-09-02 | 2010-03-11 | 동우 화인켐 주식회사 | Thinner composition for removing photosensitive resin and anti-reflective coating |
CN102186815A (en) * | 2008-10-20 | 2011-09-14 | 巴斯夫欧洲公司 | Sulfonium derivatives and the use therof as latent acids |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4883975A (en) | 1972-02-14 | 1973-11-08 | ||
JPS63168651A (en) * | 1987-01-06 | 1988-07-12 | Asahi Chem Ind Co Ltd | Stripping agent composition for photoresist |
JP2911792B2 (en) | 1995-09-29 | 1999-06-23 | 東京応化工業株式会社 | Stripper composition for resist |
JP3914842B2 (en) | 2001-10-23 | 2007-05-16 | 有限会社ユーエムエス | Method and apparatus for removing organic coating |
JP4463054B2 (en) * | 2004-09-17 | 2010-05-12 | 東京応化工業株式会社 | Photoresist stripping solution and substrate processing method using the same |
JP4698515B2 (en) * | 2005-07-19 | 2011-06-08 | 昭和電工株式会社 | Photosensitive composition remover |
JP4475664B2 (en) | 2005-12-27 | 2010-06-09 | 東京応化工業株式会社 | Cleaning liquid for photolithography and method for circulating the same |
US20100183853A1 (en) * | 2007-06-12 | 2010-07-22 | Takashi Ihara | Stripping agent for resist film on/above conductive polymer, method for stripping resist film, and substrate having patterned conductive polymer |
JP2009014938A (en) * | 2007-07-03 | 2009-01-22 | Toagosei Co Ltd | Resist release agent composition |
TWI490191B (en) * | 2007-10-29 | 2015-07-01 | Ekc Technology Inc | Semiconductor processing composition containing amidoxime compounds |
TWI467349B (en) * | 2008-11-19 | 2015-01-01 | Toagosei Co Ltd | Manufacturing method of substrates having patterned film object of conductive polymer and substrates having patterned film object of conductive polymer |
KR101807198B1 (en) * | 2010-11-09 | 2017-12-11 | 주식회사 동진쎄미켐 | Composition for forming a photoresist top coat layer in extreme ultraviolet lithography and patterning method using the same |
-
2012
- 2012-10-02 JP JP2013546474A patent/JP5437541B1/en active Active
- 2012-10-02 KR KR1020147000973A patent/KR102021158B1/en active IP Right Grant
- 2012-10-02 WO PCT/JP2012/006286 patent/WO2014002151A1/en active Application Filing
- 2012-10-02 CN CN201280038198.1A patent/CN103733137B/en active Active
- 2012-10-16 TW TW101138083A patent/TWI572999B/en not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1808286A (en) * | 2004-10-19 | 2006-07-26 | 皮瑞克斯股份有限公司 | Process, treatment fluid and apparatus for removing sticky material from basal body surface |
KR20100027511A (en) * | 2008-09-02 | 2010-03-11 | 동우 화인켐 주식회사 | Thinner composition for removing photosensitive resin and anti-reflective coating |
CN102186815A (en) * | 2008-10-20 | 2011-09-14 | 巴斯夫欧洲公司 | Sulfonium derivatives and the use therof as latent acids |
Also Published As
Publication number | Publication date |
---|---|
TWI572999B (en) | 2017-03-01 |
KR20150037719A (en) | 2015-04-08 |
CN103733137A (en) | 2014-04-16 |
TW201400996A (en) | 2014-01-01 |
JP5437541B1 (en) | 2014-03-12 |
WO2014002151A1 (en) | 2014-01-03 |
JPWO2014002151A1 (en) | 2016-05-26 |
KR102021158B1 (en) | 2019-09-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6277511B2 (en) | Resist stripper | |
CN105723284B (en) | Anticorrosive additive stripping liquid controlling | |
CN103733137B (en) | Corrosion inhibitor stripper | |
CN101878452A (en) | Remover liquid composition and method for removing resin layer by using the same | |
TW201432395A (en) | Composition for photoresist stripping solution and stripping method of photoresist using the same | |
TW200921302A (en) | Resist stripping composition | |
TWI514094B (en) | Stripper composition for thick negative photoresist | |
CN102163011A (en) | Stripping liquid composition of photoresist | |
TWI497237B (en) | Photoresist stripping liquid composition | |
JP2000039727A (en) | Stripper composition for photoresist | |
JP2012246474A (en) | Detergent composition for plate display device | |
CN107346095A (en) | A kind of manufacture of semiconductor positive photoresist goes glue and application | |
CN111448520B (en) | Photoresist stripper composition | |
CN102301282A (en) | Anticorrosive photoresist stripping agent composition | |
TW201931029A (en) | Stripping composition for removing dry film resist and stripping method using the same | |
CN107995960B (en) | Anticorrosive additive stripping liquid controlling | |
CN107820584B (en) | Anticorrosive additive stripping liquid controlling | |
CN102880017B (en) | Stripping liquid composition for photoresist and preparation and applications of stripping liquid composition | |
CN109164686A (en) | A kind of positive photoresist removes photoresist cleaning combination and its application | |
CN104049476A (en) | Photoresist remover | |
JP5894779B2 (en) | Liquid crystal alignment film remover | |
KR20030082767A (en) | Composition of Resist Stripper Use High Equivalent Conductivity of Electrolytes in Aqueous Solutions at 18℃ | |
TWI431112B (en) | Hydroxylamine - containing cleaning solution and its application | |
CN104932210B (en) | Photoresist stripping composition and stripping means, plate, flat-panel monitor and its preparation method | |
CN104049477A (en) | Resist remover |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |