MY184875A - Cleaning composition for removing flux - Google Patents
Cleaning composition for removing fluxInfo
- Publication number
- MY184875A MY184875A MYPI2018001063A MYPI2018001063A MY184875A MY 184875 A MY184875 A MY 184875A MY PI2018001063 A MYPI2018001063 A MY PI2018001063A MY PI2018001063 A MYPI2018001063 A MY PI2018001063A MY 184875 A MY184875 A MY 184875A
- Authority
- MY
- Malaysia
- Prior art keywords
- component
- cleaning composition
- removing flux
- following formula
- compound expressed
- Prior art date
Links
- 230000004907 flux Effects 0.000 title abstract 4
- 238000004140 cleaning Methods 0.000 title abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 5
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
- C11D17/08—Liquid soap, e.g. for dispensers; capsuled
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2003—Alcohols; Phenols
- C11D3/2006—Monohydric alcohols
- C11D3/2034—Monohydric alcohols aromatic
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/20—Other heavy metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Emergency Medicine (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Detergent Compositions (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Provided is a cleaning composition for removing flux suitable for removing flux residues. In an embodiment, the present disclosure relates to a cleaning composition for removing flux, including: a compound expressed by the following formula (I) (component A); a compound expressed by the following formula (II) (component B); a compound expressed by the following formula (III) (component C); a compound expressed by the following formula (IV) (component D); an aromatic alcohol (component E): and water (component F). The ratio of a mass of the component E to a total mass of the component C and the component D (component E / component C + compound D)) is 0.18 or more and 0.45 or less. (Formula I) R?-O-(CH?CH?O)n-H (II) R?-O-(CH?CH?O)m-H (III) R?OCH?-CH(OH)-CH?-OH (IV)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015252185A JP6598671B2 (en) | 2015-12-24 | 2015-12-24 | Cleaning composition for flux |
PCT/JP2016/086515 WO2017110493A1 (en) | 2015-12-24 | 2016-12-08 | Flux cleaning agent composition |
Publications (1)
Publication Number | Publication Date |
---|---|
MY184875A true MY184875A (en) | 2021-04-28 |
Family
ID=59090103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2018001063A MY184875A (en) | 2015-12-24 | 2016-12-08 | Cleaning composition for removing flux |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP6598671B2 (en) |
KR (1) | KR20180096659A (en) |
CN (1) | CN108431194B (en) |
MY (1) | MY184875A (en) |
TW (1) | TWI696693B (en) |
WO (1) | WO2017110493A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109365383A (en) * | 2018-10-31 | 2019-02-22 | 无锡日月合金材料有限公司 | A kind of cleaning method of silver-based solder |
WO2020116524A1 (en) * | 2018-12-05 | 2020-06-11 | 花王株式会社 | Detergent composition for removing flux residues |
JP7370339B2 (en) * | 2018-12-05 | 2023-10-27 | 花王株式会社 | Cleaning flux residue |
CN110724605B (en) * | 2019-10-08 | 2021-03-05 | 苏州柯仕达电子材料有限公司 | Environment-friendly water-based cleaning agent and preparation method thereof |
CN117545830A (en) * | 2021-08-10 | 2024-02-09 | 日油株式会社 | Cleaning agent for conductive paste and cleaning method for conductive paste |
WO2024075678A1 (en) * | 2022-10-07 | 2024-04-11 | 株式会社Adeka | Method for producing bio-derived branched alkyl glyceryl ether, and bio-derived branched alkyl glyceryl ether produced by said method |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0434000A (en) | 1990-05-30 | 1992-02-05 | Hitachi Ltd | Flux cleanser and method for cleansing soldered electronic part with the same |
JPH05125395A (en) * | 1991-11-05 | 1993-05-21 | Metsuku Kk | Cleaner composition |
JP3229711B2 (en) | 1993-06-08 | 2001-11-19 | 花王株式会社 | Detergent composition |
JP2949425B2 (en) | 1996-10-11 | 1999-09-13 | 花王株式会社 | Detergent composition |
JP2000008080A (en) * | 1998-06-25 | 2000-01-11 | Dai Ichi Kogyo Seiyaku Co Ltd | Industrial detergent composition and cleaning using the same |
JP4286021B2 (en) * | 2002-04-05 | 2009-06-24 | 花王株式会社 | Detergent composition for precision parts |
CN101037646B (en) * | 2003-08-27 | 2010-12-08 | 化研科技株式会社 | Cleaning agent for removing solder flux and method for cleaning solder flux |
JP5152816B2 (en) * | 2006-02-24 | 2013-02-27 | 化研テック株式会社 | Cleaning method |
JP5466836B2 (en) * | 2008-06-13 | 2014-04-09 | 花王株式会社 | Cleaning composition for flux |
JP5336173B2 (en) * | 2008-12-26 | 2013-11-06 | 花王株式会社 | Cleaning composition for hard surface |
CN104312779B (en) * | 2010-07-09 | 2017-10-20 | 化研科技株式会社 | Detergent composition stoste, detergent composition and washing methods |
KR20140010002A (en) * | 2010-12-16 | 2014-01-23 | 카이젠 코포레이션 | Cleaning agent for removal of soldering flux |
JP6226144B2 (en) * | 2014-02-27 | 2017-11-08 | 荒川化学工業株式会社 | Detergent composition stock solution, detergent composition and cleaning method |
-
2015
- 2015-12-24 JP JP2015252185A patent/JP6598671B2/en active Active
-
2016
- 2016-12-08 WO PCT/JP2016/086515 patent/WO2017110493A1/en active Application Filing
- 2016-12-08 KR KR1020187018720A patent/KR20180096659A/en active IP Right Grant
- 2016-12-08 MY MYPI2018001063A patent/MY184875A/en unknown
- 2016-12-08 CN CN201680075671.1A patent/CN108431194B/en active Active
- 2016-12-21 TW TW105142397A patent/TWI696693B/en active
Also Published As
Publication number | Publication date |
---|---|
JP2017115033A (en) | 2017-06-29 |
KR20180096659A (en) | 2018-08-29 |
CN108431194A (en) | 2018-08-21 |
TWI696693B (en) | 2020-06-21 |
JP6598671B2 (en) | 2019-10-30 |
CN108431194B (en) | 2021-02-02 |
WO2017110493A1 (en) | 2017-06-29 |
TW201732029A (en) | 2017-09-16 |
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