SG10201902673QA - Polishing apparatus - Google Patents
Polishing apparatusInfo
- Publication number
- SG10201902673QA SG10201902673QA SG10201902673QA SG10201902673QA SG 10201902673Q A SG10201902673Q A SG 10201902673QA SG 10201902673Q A SG10201902673Q A SG 10201902673QA SG 10201902673Q A SG10201902673Q A SG 10201902673QA
- Authority
- SG
- Singapore
- Prior art keywords
- slurry
- inlet port
- introducing
- spindle
- supply pipe
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
- B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
- B24B37/107—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
- B08B9/027—Cleaning the internal surfaces; Removal of blockages
- B08B9/032—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/06—Dust extraction equipment on grinding or polishing machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Polarising Elements (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Disintegrating Or Milling (AREA)
Abstract
POLISHING APPARATUS OF THE DISCLOSURE A polishing apparatus includes a polishing unit having a spindle having an axial bore defined therein, a housing by which the spindle is rotatably supported, a polishing pad mounted on an end of the spindle and having an opening defined therein that is held in fluid communication with the axial bore, a slurry supply pipe inserted in the axial bore in the spindle and having a supply port supplying a slurry to the workpiece held on the chuck table and an inlet port remote from the supply port, introducing the slurry into the slurry supply pipe, a slurry introducing unit connected to the inlet port of the slurry supply pipe, introducing the slurry into the inlet port, and a cleaning water introducing unit connected to the inlet port of the slurry supply pipe, introducing cleaning water into the inlet port. [Figure 2]
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018073222A JP7032217B2 (en) | 2018-04-05 | 2018-04-05 | Polishing equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201902673QA true SG10201902673QA (en) | 2019-11-28 |
Family
ID=67991606
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201902673Q SG10201902673QA (en) | 2018-04-05 | 2019-03-26 | Polishing apparatus |
Country Status (7)
Country | Link |
---|---|
US (1) | US11279000B2 (en) |
JP (1) | JP7032217B2 (en) |
KR (1) | KR102678971B1 (en) |
CN (1) | CN110340800B (en) |
DE (1) | DE102019204883B4 (en) |
SG (1) | SG10201902673QA (en) |
TW (1) | TWI783136B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7108450B2 (en) | 2018-04-13 | 2022-07-28 | 株式会社ディスコ | Polishing equipment |
JP2022074517A (en) * | 2020-11-04 | 2022-05-18 | 株式会社ディスコ | Grinding method for workpiece |
CN115229592B (en) * | 2022-08-09 | 2024-04-05 | 武汉宏海科技股份有限公司 | Irregular disc bottom deburring device and method for processing air conditioner chassis |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0899265A (en) | 1994-09-30 | 1996-04-16 | Disco Abrasive Syst Ltd | Polishing device |
US5582540A (en) * | 1996-01-22 | 1996-12-10 | National Science Council Of R.O.C | Hydrostatic and hydrodynamic polishing tool |
JP3271551B2 (en) * | 1997-05-26 | 2002-04-02 | 松下電工株式会社 | Magnetic polishing equipment |
JP2000288927A (en) * | 1999-04-07 | 2000-10-17 | Sony Corp | Flatening polishing device and flatening polishing method |
US7059948B2 (en) * | 2000-12-22 | 2006-06-13 | Applied Materials | Articles for polishing semiconductor substrates |
US6722964B2 (en) * | 2000-04-04 | 2004-04-20 | Ebara Corporation | Polishing apparatus and method |
JP2003236752A (en) * | 2002-02-18 | 2003-08-26 | Disco Abrasive Syst Ltd | Polisher |
JP4163485B2 (en) * | 2002-10-25 | 2008-10-08 | 不二越機械工業株式会社 | Double-side polishing apparatus and polishing method using the same |
US20040176017A1 (en) * | 2003-02-25 | 2004-09-09 | Aleksander Zelenski | Apparatus and methods for abrading a work piece |
JP2006216895A (en) * | 2005-02-07 | 2006-08-17 | Disco Abrasive Syst Ltd | Semiconductor wafer polishing device |
JP4790322B2 (en) * | 2005-06-10 | 2011-10-12 | 株式会社ディスコ | Processing apparatus and processing method |
JP2007234882A (en) * | 2006-03-01 | 2007-09-13 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus, and substrate handling method |
JP2008044063A (en) * | 2006-08-14 | 2008-02-28 | Nikon Corp | Polishing device |
US8524035B2 (en) * | 2009-11-30 | 2013-09-03 | Corning Incorporated | Method and apparatus for conformable polishing |
JP2016119333A (en) | 2014-12-18 | 2016-06-30 | 株式会社荏原製作所 | Buff processing unit, and substrate processing apparatus |
JP2016159376A (en) * | 2015-02-27 | 2016-09-05 | 株式会社ディスコ | Cutting device |
JP6454599B2 (en) * | 2015-05-14 | 2019-01-16 | 株式会社ディスコ | Polishing equipment |
JP6489973B2 (en) * | 2015-07-30 | 2019-03-27 | 株式会社ディスコ | Grinding equipment |
JP6685707B2 (en) * | 2015-12-01 | 2020-04-22 | 株式会社ディスコ | Polishing equipment |
CN206541804U (en) * | 2016-05-03 | 2017-10-03 | K.C.科技股份有限公司 | Base plate processing system |
JP6792363B2 (en) * | 2016-07-22 | 2020-11-25 | 株式会社ディスコ | Grinding device |
JP6844970B2 (en) * | 2016-08-18 | 2021-03-17 | 株式会社ディスコ | Polishing equipment |
US11135612B2 (en) * | 2019-03-19 | 2021-10-05 | The Boeing Company | Rotating applicators having fluid dispensers |
-
2018
- 2018-04-05 JP JP2018073222A patent/JP7032217B2/en active Active
-
2019
- 2019-03-26 SG SG10201902673Q patent/SG10201902673QA/en unknown
- 2019-03-28 TW TW108110964A patent/TWI783136B/en active
- 2019-04-01 US US16/371,326 patent/US11279000B2/en active Active
- 2019-04-01 CN CN201910256116.4A patent/CN110340800B/en active Active
- 2019-04-04 KR KR1020190039518A patent/KR102678971B1/en active IP Right Grant
- 2019-04-05 DE DE102019204883.8A patent/DE102019204883B4/en active Active
Also Published As
Publication number | Publication date |
---|---|
US11279000B2 (en) | 2022-03-22 |
TWI783136B (en) | 2022-11-11 |
JP2019181603A (en) | 2019-10-24 |
JP7032217B2 (en) | 2022-03-08 |
CN110340800A (en) | 2019-10-18 |
DE102019204883A1 (en) | 2019-10-10 |
TW201944480A (en) | 2019-11-16 |
DE102019204883B4 (en) | 2022-12-29 |
US20190308296A1 (en) | 2019-10-10 |
KR102678971B1 (en) | 2024-06-26 |
KR20190116932A (en) | 2019-10-15 |
CN110340800B (en) | 2022-07-12 |
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