SG10201807320WA - Wire saw apparatus - Google Patents

Wire saw apparatus

Info

Publication number
SG10201807320WA
SG10201807320WA SG10201807320WA SG10201807320WA SG10201807320WA SG 10201807320W A SG10201807320W A SG 10201807320WA SG 10201807320W A SG10201807320W A SG 10201807320WA SG 10201807320W A SG10201807320W A SG 10201807320WA SG 10201807320W A SG10201807320W A SG 10201807320WA
Authority
SG
Singapore
Prior art keywords
wire
saw apparatus
workpiece
nozzle
row
Prior art date
Application number
SG10201807320WA
Inventor
Koji Kitagawa
Yuichi Shimizu
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Publication of SG10201807320WA publication Critical patent/SG10201807320WA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • B24B27/0633Grinders for cutting-off using a cutting wire
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/02Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/007Use, recovery or regeneration of abrasive mediums
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • B28D5/042Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with blades or wires mounted in a reciprocating frame
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

Abstract

WIRE SAW APPARATUS The present invention provides a wire saw apparatus including: a wire row formed of a wire which is wound around a plurality of wire guides and reciprocatively travels in an axial direction; a nozzle from which a coolant or slurry is supplied to the wire; and a workpiece feed mechanism which presses a held workpiece against the wire row, the wire saw apparatus being configured to slice the workpiece into a wafer shape by pressing the workpiece held by the workpiece feed mechanism against the wire row and feeding it for slicing while supplying the coolant or the slurry from the nozzle to the wire, the wire saw apparatus being characterized in that the nozzle is arranged above the wire row to be orthogonal to the wire row, and windbreak plates are arranged on both left and right sides of the arranged nozzle seen from an axial direction. Figure 1
SG10201807320WA 2015-05-01 2016-03-03 Wire saw apparatus SG10201807320WA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015094358A JP6304118B2 (en) 2015-05-01 2015-05-01 Wire saw equipment

Publications (1)

Publication Number Publication Date
SG10201807320WA true SG10201807320WA (en) 2018-09-27

Family

ID=57217580

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201707726YA SG11201707726YA (en) 2015-05-01 2016-03-03 Wire saw apparatus
SG10201807320WA SG10201807320WA (en) 2015-05-01 2016-03-03 Wire saw apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG11201707726YA SG11201707726YA (en) 2015-05-01 2016-03-03 Wire saw apparatus

Country Status (8)

Country Link
US (1) US10589446B2 (en)
JP (1) JP6304118B2 (en)
KR (1) KR102568196B1 (en)
CN (1) CN107427986B (en)
DE (1) DE112016001209T5 (en)
SG (2) SG11201707726YA (en)
TW (1) TWI692394B (en)
WO (1) WO2016178297A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110962248A (en) * 2018-09-28 2020-04-07 胜高股份有限公司 Machining liquid supply nozzle for wire saw and method for supplying machining liquid to wire saw
CN110039673A (en) * 2019-04-26 2019-07-23 西安奕斯伟硅片技术有限公司 A kind of cutter device and method
JP7372097B2 (en) * 2019-09-20 2023-10-31 コマツNtc株式会社 How to load and unload wire saws and wire saw workpieces
CN111361030B (en) * 2020-04-24 2021-11-23 西安奕斯伟材料科技有限公司 Multi-wire cutting device and multi-wire cutting method
CN113601741B (en) * 2021-08-09 2023-06-23 西安奕斯伟硅片技术有限公司 Device for supplying mortar to a plurality of cutting lines for cutting silicon rods and silicon rod cutting equipment
CN115816664A (en) * 2022-12-28 2023-03-21 泉州市品河精密科技有限公司 Stone cutting method

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US3325949A (en) * 1964-11-24 1967-06-20 Cincinnati Milling Machine Co Workpiece cooling apparatus for grinding machines
FR1600356A (en) * 1968-01-09 1970-07-20
US5709593A (en) * 1995-10-27 1998-01-20 Applied Materials, Inc. Apparatus and method for distribution of slurry in a chemical mechanical polishing system
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JP2000153460A (en) * 1998-11-16 2000-06-06 Tokyo Seiko Co Ltd Liquid supply device
JP2000218615A (en) * 1999-01-29 2000-08-08 Nippei Toyama Corp Method for fitting and removing wire saw and work
US6468134B1 (en) * 2000-06-30 2002-10-22 Lam Research Corporation Method and apparatus for slurry distribution
JP3967969B2 (en) * 2002-06-27 2007-08-29 京セラ株式会社 Wire saw
JP2004195555A (en) * 2002-12-16 2004-07-15 Komatsu Electronic Metals Co Ltd Slurry nozzle for wire saw
JP4083152B2 (en) 2004-07-29 2008-04-30 日本碍子株式会社 Wire saw equipment
JP5072204B2 (en) * 2005-08-31 2012-11-14 信越半導体株式会社 Method and wire saw apparatus for improving nanotopography of wafer surface
JP5080769B2 (en) * 2006-09-15 2012-11-21 株式会社東京精密 Polishing method and polishing apparatus
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Also Published As

Publication number Publication date
KR20180004111A (en) 2018-01-10
TWI692394B (en) 2020-05-01
WO2016178297A1 (en) 2016-11-10
CN107427986B (en) 2019-07-09
US10589446B2 (en) 2020-03-17
JP2016209947A (en) 2016-12-15
JP6304118B2 (en) 2018-04-04
US20180079108A1 (en) 2018-03-22
SG11201707726YA (en) 2017-10-30
CN107427986A (en) 2017-12-01
TW201639680A (en) 2016-11-16
KR102568196B1 (en) 2023-08-18
DE112016001209T5 (en) 2017-12-07

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