SG10201707099UA - Optical system and method for inspecting a transparent plate - Google Patents

Optical system and method for inspecting a transparent plate

Info

Publication number
SG10201707099UA
SG10201707099UA SG10201707099UA SG10201707099UA SG10201707099UA SG 10201707099U A SG10201707099U A SG 10201707099UA SG 10201707099U A SG10201707099U A SG 10201707099UA SG 10201707099U A SG10201707099U A SG 10201707099UA SG 10201707099U A SG10201707099U A SG 10201707099UA
Authority
SG
Singapore
Prior art keywords
transparent plate
inspecting
optical system
reflected light
face
Prior art date
Application number
SG10201707099UA
Other languages
English (en)
Inventor
Chen Ming-Sheng
Original Assignee
Stek Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stek Co Ltd filed Critical Stek Co Ltd
Publication of SG10201707099UA publication Critical patent/SG10201707099UA/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958Inspecting transparent materials or objects, e.g. windscreens
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N2021/0106General arrangement of respective parts
    • G01N2021/0112Apparatus in one mechanical, optical or electronic block
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
    • G01N2021/8874Taking dimensions of defect into account

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Image Input (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
SG10201707099UA 2017-02-17 2017-08-31 Optical system and method for inspecting a transparent plate SG10201707099UA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW106105196A TWI689721B (zh) 2017-02-17 2017-02-17 基於利用光學技術掃描透明板材表面污染之方法及其系統

Publications (1)

Publication Number Publication Date
SG10201707099UA true SG10201707099UA (en) 2018-09-27

Family

ID=61915166

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201707099UA SG10201707099UA (en) 2017-02-17 2017-08-31 Optical system and method for inspecting a transparent plate

Country Status (5)

Country Link
US (1) US10345248B2 (zh)
KR (1) KR20180095466A (zh)
CN (2) CN207263657U (zh)
SG (1) SG10201707099UA (zh)
TW (1) TWI689721B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI673491B (zh) * 2017-02-17 2019-10-01 特銓股份有限公司 光箱結構及應用彼光學檢測設備
TWI689721B (zh) * 2017-02-17 2020-04-01 特銓股份有限公司 基於利用光學技術掃描透明板材表面污染之方法及其系統
JP7282775B2 (ja) * 2018-07-18 2023-05-29 株式会社小糸製作所 センサシステムの検査装置および検査方法
CN109470715B (zh) * 2018-09-10 2023-01-31 深圳市共进电子股份有限公司 一种计算视觉检测方法、设备及计算机可读存储介质
KR102139719B1 (ko) * 2019-09-09 2020-08-12 주식회사 투에이치앤엠 디스플레이 패널의 uv 노광에 대한 영향 평가장치
CN117028893B (zh) * 2023-08-30 2024-07-05 深圳璟都科技有限公司 星空投影灯及星空投影灯的投光方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2512878B2 (ja) * 1987-01-29 1996-07-03 株式会社ニコン 異物検査装置
JPH0431748A (ja) * 1990-05-29 1992-02-03 Asahi Glass Co Ltd 透明板状体の欠点検査方法
JPH10160683A (ja) * 1996-11-29 1998-06-19 Matsushita Electric Ind Co Ltd 異物検査方法とその装置
US6166808A (en) * 1996-12-24 2000-12-26 U.S. Philips Corporation Optical height meter, surface-inspection device provided with such a height meter, and lithographic apparatus provided with the inspection device
WO1998028608A1 (en) * 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Optical inspection device and lithographic apparatus provided with such a device
JP2000009452A (ja) * 1998-06-22 2000-01-14 Hitachi Tobu Semiconductor Ltd 表面の凹凸検査方法および装置
JP2002162360A (ja) * 2000-11-22 2002-06-07 Seiko Epson Corp 液晶パネルの評価方法及び評価装置
JP4157037B2 (ja) * 2001-09-21 2008-09-24 オリンパス株式会社 欠陥検査装置
JP2005181070A (ja) * 2003-12-18 2005-07-07 Nippon Sheet Glass Co Ltd 透明板状体の欠点検出方法及び欠点検出装置
JP4416544B2 (ja) * 2004-03-12 2010-02-17 株式会社ミツトヨ 光学式変位測定装置
JP4496257B2 (ja) * 2008-03-12 2010-07-07 株式会社ヒューテック 欠陥検査装置
CN103438376B (zh) * 2013-08-30 2015-07-08 友达光电(上海)有限公司 测试灯箱
US9115987B2 (en) * 2013-12-04 2015-08-25 Nanometrics Incorporated Optical metrology with multiple angles of incidence and/or azimuth angles
TWI689721B (zh) * 2017-02-17 2020-04-01 特銓股份有限公司 基於利用光學技術掃描透明板材表面污染之方法及其系統

Also Published As

Publication number Publication date
US20180238813A1 (en) 2018-08-23
US10345248B2 (en) 2019-07-09
CN108459025A (zh) 2018-08-28
TWI689721B (zh) 2020-04-01
KR20180095466A (ko) 2018-08-27
CN207263657U (zh) 2018-04-20
TW201831887A (zh) 2018-09-01

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