SG10201707099UA - Optical system and method for inspecting a transparent plate - Google Patents
Optical system and method for inspecting a transparent plateInfo
- Publication number
- SG10201707099UA SG10201707099UA SG10201707099UA SG10201707099UA SG10201707099UA SG 10201707099U A SG10201707099U A SG 10201707099UA SG 10201707099U A SG10201707099U A SG 10201707099UA SG 10201707099U A SG10201707099U A SG 10201707099UA SG 10201707099U A SG10201707099U A SG 10201707099UA
- Authority
- SG
- Singapore
- Prior art keywords
- transparent plate
- inspecting
- optical system
- reflected light
- face
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
- G01N21/8901—Optical details; Scanning details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
- G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
- G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
- G01N2021/8874—Taking dimensions of defect into account
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Signal Processing (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Image Input (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW106105196A TWI689721B (zh) | 2017-02-17 | 2017-02-17 | 基於利用光學技術掃描透明板材表面污染之方法及其系統 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201707099UA true SG10201707099UA (en) | 2018-09-27 |
Family
ID=61915166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201707099UA SG10201707099UA (en) | 2017-02-17 | 2017-08-31 | Optical system and method for inspecting a transparent plate |
Country Status (5)
Country | Link |
---|---|
US (1) | US10345248B2 (zh) |
KR (1) | KR20180095466A (zh) |
CN (2) | CN207263657U (zh) |
SG (1) | SG10201707099UA (zh) |
TW (1) | TWI689721B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI673491B (zh) * | 2017-02-17 | 2019-10-01 | 特銓股份有限公司 | 光箱結構及應用彼光學檢測設備 |
TWI689721B (zh) * | 2017-02-17 | 2020-04-01 | 特銓股份有限公司 | 基於利用光學技術掃描透明板材表面污染之方法及其系統 |
JP7282775B2 (ja) * | 2018-07-18 | 2023-05-29 | 株式会社小糸製作所 | センサシステムの検査装置および検査方法 |
CN109470715B (zh) * | 2018-09-10 | 2023-01-31 | 深圳市共进电子股份有限公司 | 一种计算视觉检测方法、设备及计算机可读存储介质 |
KR102139719B1 (ko) * | 2019-09-09 | 2020-08-12 | 주식회사 투에이치앤엠 | 디스플레이 패널의 uv 노광에 대한 영향 평가장치 |
CN117028893B (zh) * | 2023-08-30 | 2024-07-05 | 深圳璟都科技有限公司 | 星空投影灯及星空投影灯的投光方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2512878B2 (ja) * | 1987-01-29 | 1996-07-03 | 株式会社ニコン | 異物検査装置 |
JPH0431748A (ja) * | 1990-05-29 | 1992-02-03 | Asahi Glass Co Ltd | 透明板状体の欠点検査方法 |
JPH10160683A (ja) * | 1996-11-29 | 1998-06-19 | Matsushita Electric Ind Co Ltd | 異物検査方法とその装置 |
US6166808A (en) * | 1996-12-24 | 2000-12-26 | U.S. Philips Corporation | Optical height meter, surface-inspection device provided with such a height meter, and lithographic apparatus provided with the inspection device |
WO1998028608A1 (en) * | 1996-12-24 | 1998-07-02 | Koninklijke Philips Electronics N.V. | Optical inspection device and lithographic apparatus provided with such a device |
JP2000009452A (ja) * | 1998-06-22 | 2000-01-14 | Hitachi Tobu Semiconductor Ltd | 表面の凹凸検査方法および装置 |
JP2002162360A (ja) * | 2000-11-22 | 2002-06-07 | Seiko Epson Corp | 液晶パネルの評価方法及び評価装置 |
JP4157037B2 (ja) * | 2001-09-21 | 2008-09-24 | オリンパス株式会社 | 欠陥検査装置 |
JP2005181070A (ja) * | 2003-12-18 | 2005-07-07 | Nippon Sheet Glass Co Ltd | 透明板状体の欠点検出方法及び欠点検出装置 |
JP4416544B2 (ja) * | 2004-03-12 | 2010-02-17 | 株式会社ミツトヨ | 光学式変位測定装置 |
JP4496257B2 (ja) * | 2008-03-12 | 2010-07-07 | 株式会社ヒューテック | 欠陥検査装置 |
CN103438376B (zh) * | 2013-08-30 | 2015-07-08 | 友达光电(上海)有限公司 | 测试灯箱 |
US9115987B2 (en) * | 2013-12-04 | 2015-08-25 | Nanometrics Incorporated | Optical metrology with multiple angles of incidence and/or azimuth angles |
TWI689721B (zh) * | 2017-02-17 | 2020-04-01 | 特銓股份有限公司 | 基於利用光學技術掃描透明板材表面污染之方法及其系統 |
-
2017
- 2017-02-17 TW TW106105196A patent/TWI689721B/zh active
- 2017-05-31 CN CN201720622701.8U patent/CN207263657U/zh active Active
- 2017-05-31 CN CN201710401232.1A patent/CN108459025A/zh active Pending
- 2017-08-31 SG SG10201707099UA patent/SG10201707099UA/en unknown
- 2017-09-06 US US15/697,083 patent/US10345248B2/en active Active
-
2018
- 2018-02-14 KR KR1020180018368A patent/KR20180095466A/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US20180238813A1 (en) | 2018-08-23 |
US10345248B2 (en) | 2019-07-09 |
CN108459025A (zh) | 2018-08-28 |
TWI689721B (zh) | 2020-04-01 |
KR20180095466A (ko) | 2018-08-27 |
CN207263657U (zh) | 2018-04-20 |
TW201831887A (zh) | 2018-09-01 |
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