SG10201700825QA - Substrate Treating Apparatus - Google Patents
Substrate Treating ApparatusInfo
- Publication number
- SG10201700825QA SG10201700825QA SG10201700825QA SG10201700825QA SG10201700825QA SG 10201700825Q A SG10201700825Q A SG 10201700825QA SG 10201700825Q A SG10201700825Q A SG 10201700825QA SG 10201700825Q A SG10201700825Q A SG 10201700825QA SG 10201700825Q A SG10201700825Q A SG 10201700825QA
- Authority
- SG
- Singapore
- Prior art keywords
- treating apparatus
- substrate treating
- substrate
- treating
- Prior art date
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160046116A KR20170118397A (en) | 2016-04-15 | 2016-04-15 | Substrate treating apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201700825QA true SG10201700825QA (en) | 2017-11-29 |
Family
ID=60299981
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201700825QA SG10201700825QA (en) | 2016-04-15 | 2017-02-02 | Substrate Treating Apparatus |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20170118397A (en) |
SG (1) | SG10201700825QA (en) |
TW (1) | TWI681491B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102413739B1 (en) | 2017-09-15 | 2022-06-29 | 현대모비스 주식회사 | Pressure sensing apparatus for air bag |
TWI815827B (en) * | 2017-11-07 | 2023-09-21 | 日商東京威力科創股份有限公司 | Substrate processing equipment |
KR102080016B1 (en) * | 2018-09-17 | 2020-02-21 | 주식회사 에이케이테크 | Gaseous nitrogen spray structure to wafer for equipment front end module and equipment front end module comprising the wafer cooling structure for equipment front end module |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11186363A (en) * | 1997-12-24 | 1999-07-09 | Shin Etsu Handotai Co Ltd | Semiconductor manufacturing device |
JP2002057133A (en) * | 2000-08-15 | 2002-02-22 | Tokyo Electron Ltd | Wafer treatment apparatus |
US20040026036A1 (en) * | 2001-02-23 | 2004-02-12 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus and substrate processing method |
KR101074083B1 (en) * | 2009-07-27 | 2011-10-17 | 피에스케이 주식회사 | Roadlock chamber and substrate treating facility including the chamber, and method for treating substrate with the facility |
KR20160038948A (en) * | 2014-09-30 | 2016-04-08 | 주식회사 원익아이피에스 | Gate valve for processing substrate |
-
2016
- 2016-04-15 KR KR1020160046116A patent/KR20170118397A/en not_active Application Discontinuation
-
2017
- 2017-02-02 SG SG10201700825QA patent/SG10201700825QA/en unknown
- 2017-02-20 TW TW106105588A patent/TWI681491B/en active
Also Published As
Publication number | Publication date |
---|---|
TW201802997A (en) | 2018-01-16 |
KR20170118397A (en) | 2017-10-25 |
TWI681491B (en) | 2020-01-01 |
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