SG10201602050WA - Imprint material discharging device - Google Patents

Imprint material discharging device

Info

Publication number
SG10201602050WA
SG10201602050WA SG10201602050WA SG10201602050WA SG10201602050WA SG 10201602050W A SG10201602050W A SG 10201602050WA SG 10201602050W A SG10201602050W A SG 10201602050WA SG 10201602050W A SG10201602050W A SG 10201602050WA SG 10201602050W A SG10201602050W A SG 10201602050WA
Authority
SG
Singapore
Prior art keywords
discharging device
material discharging
imprint material
imprint
discharging
Prior art date
Application number
SG10201602050WA
Other languages
English (en)
Inventor
Arai Tsuyoshi
Mita Yutaka
Takahashi Yuichi
Araki Yoshimasa
Ishibashi Tohru
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of SG10201602050WA publication Critical patent/SG10201602050WA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/17—Ink jet characterised by ink handling
    • B41J2/175—Ink supply systems ; Circuit parts therefor
    • B41J2/17563—Ink filters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
SG10201602050WA 2015-04-03 2016-03-16 Imprint material discharging device SG10201602050WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015076992 2015-04-03
JP2016002753A JP6700794B2 (ja) 2015-04-03 2016-01-08 インプリント材吐出装置

Publications (1)

Publication Number Publication Date
SG10201602050WA true SG10201602050WA (en) 2016-11-29

Family

ID=57358607

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201602050WA SG10201602050WA (en) 2015-04-03 2016-03-16 Imprint material discharging device

Country Status (4)

Country Link
JP (2) JP6700794B2 (ja)
CN (1) CN106042650B (ja)
SG (1) SG10201602050WA (ja)
TW (1) TWI614110B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI680063B (zh) * 2017-09-06 2019-12-21 日商佳能股份有限公司 噴出材料接收單元、噴出材料噴出設備及撓性構件之製造方法
JP6983587B2 (ja) * 2017-09-06 2021-12-17 キヤノン株式会社 吐出材収容ユニットおよび吐出材吐出装置
US10421283B2 (en) 2017-09-06 2019-09-24 Canon Kabushiki Kaisha Ejection material receiving unit, ejection material ejecting apparatus, and manufacturing method of flexible member
JP2019125619A (ja) * 2018-01-12 2019-07-25 キヤノン株式会社 吐出装置およびインプリント装置
US10894420B2 (en) 2018-04-11 2021-01-19 Canon Kabushiki Kaisha Ejection-material injecting method, ejection-material ejection apparatus, and imprinting apparatus
JP7277127B2 (ja) * 2018-04-11 2023-05-18 キヤノン株式会社 吐出材充填方法、吐出材吐出装置、およびインプリント装置
CN110394979B (zh) * 2018-04-25 2021-09-21 中国航发商用航空发动机有限责任公司 光固化成形设备

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JP3706294B2 (ja) * 2000-03-27 2005-10-12 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法
JP2002273113A (ja) * 2001-03-15 2002-09-24 Koganei Corp 濾過器および薬液供給装置並びに薬液供給方法
JP2003251821A (ja) * 2001-10-05 2003-09-09 Canon Inc 液体収納容器、液体供給システム、液体使用装置、インクタンク、インク供給システム、インクジェット記録ヘッド及び記録装置
JP4325623B2 (ja) * 2003-10-22 2009-09-02 株式会社ニコン 露光装置、露光方法、液体供給機構、液体供給方法、デバイスの製造方法
JP4716677B2 (ja) * 2004-06-01 2011-07-06 キヤノンファインテック株式会社 インク供給装置、記録装置、インク供給方法、および記録方法
TWI362059B (en) * 2004-11-25 2012-04-11 Az Electronic Mat Ip Japan Kk Photoresist coating solution supply system and method for supplying photoresist coating solution using thereof, and photoresist coating system using thereof
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
JP4755119B2 (ja) * 2007-02-14 2011-08-24 株式会社リコー 液体吐出ヘッド用液体供給部材、液体吐出装置及び画像形成装置
US8864296B2 (en) * 2008-01-30 2014-10-21 Hewlett-Packard Development Company, L.P. System for priming a fluid dispenser by expanding gas bubbles
JP5209431B2 (ja) * 2008-09-30 2013-06-12 富士フイルム株式会社 インクジェット記録装置
US20100102471A1 (en) * 2008-10-24 2010-04-29 Molecular Imprints, Inc. Fluid transport and dispensing
US20100101493A1 (en) * 2008-10-27 2010-04-29 Molecular Imprints, Inc. Dispense System
JP2010120340A (ja) * 2008-11-21 2010-06-03 Canon Inc 流体排出装置および記録装置
JP5277506B2 (ja) * 2009-02-09 2013-08-28 キヤノンファインテック株式会社 インクジェット記録ヘッド、インク貯留装置
US20110140304A1 (en) * 2009-12-10 2011-06-16 Molecular Imprints, Inc. Imprint lithography template
JP5451450B2 (ja) * 2010-02-24 2014-03-26 キヤノン株式会社 インプリント装置及びそのテンプレート並びに物品の製造方法
JP5335717B2 (ja) * 2010-03-16 2013-11-06 富士フイルム株式会社 レジスト組成物配置装置及びパターン形成体の製造方法
JP2013022491A (ja) * 2011-07-19 2013-02-04 Seiko Epson Corp 描画装置
JP5686779B2 (ja) * 2011-10-14 2015-03-18 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP6159072B2 (ja) * 2011-11-30 2017-07-05 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP5824379B2 (ja) * 2012-02-07 2015-11-25 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
JP5930832B2 (ja) * 2012-04-27 2016-06-08 キヤノン株式会社 光硬化物の製造方法
JP5995567B2 (ja) * 2012-07-12 2016-09-21 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
US9887095B2 (en) * 2013-03-12 2018-02-06 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for an etch process with silicon concentration control
JP2014216471A (ja) * 2013-04-25 2014-11-17 大日本印刷株式会社 インプリント装置及びインプリント方法
JP6362109B2 (ja) * 2013-10-04 2018-07-25 キヤノン株式会社 インプリント装置および部品の製造方法
JP6264888B2 (ja) * 2014-01-07 2018-01-24 セイコーエプソン株式会社 液体噴射装置

Also Published As

Publication number Publication date
JP2016197710A (ja) 2016-11-24
JP2020129671A (ja) 2020-08-27
TW201636225A (zh) 2016-10-16
TWI614110B (zh) 2018-02-11
JP6700794B2 (ja) 2020-05-27
CN106042650A (zh) 2016-10-26
CN106042650B (zh) 2018-01-02
JP6882574B2 (ja) 2021-06-02

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