SG10201503679UA - Self-aligned barrier and capping layers for interconnects - Google Patents

Self-aligned barrier and capping layers for interconnects

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Publication number
SG10201503679UA
SG10201503679UA SG10201503679UA SG10201503679UA SG10201503679UA SG 10201503679U A SG10201503679U A SG 10201503679UA SG 10201503679U A SG10201503679U A SG 10201503679UA SG 10201503679U A SG10201503679U A SG 10201503679UA SG 10201503679U A SG10201503679U A SG 10201503679UA
Authority
SG
Singapore
Prior art keywords
interconnects
self
capping layers
aligned barrier
barrier
Prior art date
Application number
SG10201503679UA
Inventor
Roy Gerald Gordon
Harish Bhandari
Yeung Au
Youbo Lin
Original Assignee
Harvard College
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Harvard College filed Critical Harvard College
Publication of SG10201503679UA publication Critical patent/SG10201503679UA/en

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    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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