SG10201407823YA - Plasma processing apparatus and component thereof including an optical fiber for determining a temperature thereof - Google Patents
Plasma processing apparatus and component thereof including an optical fiber for determining a temperature thereofInfo
- Publication number
- SG10201407823YA SG10201407823YA SG10201407823YA SG10201407823YA SG10201407823YA SG 10201407823Y A SG10201407823Y A SG 10201407823YA SG 10201407823Y A SG10201407823Y A SG 10201407823YA SG 10201407823Y A SG10201407823Y A SG 10201407823YA SG 10201407823Y A SG10201407823Y A SG 10201407823YA
- Authority
- SG
- Singapore
- Prior art keywords
- determining
- component
- temperature
- optical fiber
- processing apparatus
- Prior art date
Links
- 239000013307 optical fiber Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
- H01J37/32724—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/107,641 US10217615B2 (en) | 2013-12-16 | 2013-12-16 | Plasma processing apparatus and component thereof including an optical fiber for determining a temperature thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201407823YA true SG10201407823YA (en) | 2015-07-30 |
Family
ID=53369398
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201407823YA SG10201407823YA (en) | 2013-12-16 | 2014-11-25 | Plasma processing apparatus and component thereof including an optical fiber for determining a temperature thereof |
SG10201804282PA SG10201804282PA (en) | 2013-12-16 | 2014-11-25 | Plasma processing apparatus and component thereof including an optical fiber for determining a temperature thereof |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201804282PA SG10201804282PA (en) | 2013-12-16 | 2014-11-25 | Plasma processing apparatus and component thereof including an optical fiber for determining a temperature thereof |
Country Status (4)
Country | Link |
---|---|
US (1) | US10217615B2 (en) |
KR (1) | KR102378049B1 (en) |
SG (2) | SG10201407823YA (en) |
TW (1) | TWI649823B (en) |
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-
2013
- 2013-12-16 US US14/107,641 patent/US10217615B2/en active Active
-
2014
- 2014-11-25 SG SG10201407823YA patent/SG10201407823YA/en unknown
- 2014-11-25 SG SG10201804282PA patent/SG10201804282PA/en unknown
- 2014-12-15 TW TW103143610A patent/TWI649823B/en active
- 2014-12-16 KR KR1020140181657A patent/KR102378049B1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
TWI649823B (en) | 2019-02-01 |
KR102378049B1 (en) | 2022-03-23 |
TW201539607A (en) | 2015-10-16 |
SG10201804282PA (en) | 2018-07-30 |
US20150170977A1 (en) | 2015-06-18 |
US10217615B2 (en) | 2019-02-26 |
KR20150070036A (en) | 2015-06-24 |
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