SE7415572L - - Google Patents
Info
- Publication number
- SE7415572L SE7415572L SE7415572A SE7415572A SE7415572L SE 7415572 L SE7415572 L SE 7415572L SE 7415572 A SE7415572 A SE 7415572A SE 7415572 A SE7415572 A SE 7415572A SE 7415572 L SE7415572 L SE 7415572L
- Authority
- SE
- Sweden
- Prior art keywords
- pyridone
- dimethyl
- vinyl
- polymers
- methacryloylamino
- Prior art date
Links
- 229920000642 polymer Polymers 0.000 abstract 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 abstract 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 abstract 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 abstract 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 239000000178 monomer Substances 0.000 abstract 2
- UBQKCCHYAOITMY-UHFFFAOYSA-N pyridin-2-ol Chemical class OC1=CC=CC=N1 UBQKCCHYAOITMY-UHFFFAOYSA-N 0.000 abstract 2
- CRIUQWAGLHALJD-UHFFFAOYSA-N 1-ethenyl-4,6-dimethylpyridin-2-one Chemical compound CC=1C=C(C)N(C=C)C(=O)C=1 CRIUQWAGLHALJD-UHFFFAOYSA-N 0.000 abstract 1
- ZBJGVDUERIOCPM-UHFFFAOYSA-N 2-methyl-n-(1,4,6-trimethyl-2-oxopyridin-3-yl)prop-2-enamide Chemical compound CC(=C)C(=O)NC1=C(C)C=C(C)N(C)C1=O ZBJGVDUERIOCPM-UHFFFAOYSA-N 0.000 abstract 1
- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 abstract 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 abstract 1
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 abstract 1
- WFDZIQPFGPSOBU-UHFFFAOYSA-N CC(OC(C(=C)C)=O)(P(O)=O)C Chemical compound CC(OC(C(=C)C)=O)(P(O)=O)C WFDZIQPFGPSOBU-UHFFFAOYSA-N 0.000 abstract 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 abstract 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N hydrochloric acid Substances Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 1
- 229960000907 methylthioninium chloride Drugs 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 abstract 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19732363513 DE2363513C2 (de) | 1973-12-20 | 1973-12-20 | Lichtvernetzbare Polymerisate und deren Verwendung in lichthärtbaren Kopiermassen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| SE7415572L true SE7415572L (enExample) | 1975-06-23 |
| SE407221B SE407221B (sv) | 1979-03-19 |
Family
ID=5901401
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE7415572A SE407221B (sv) | 1973-12-20 | 1974-12-12 | Ljusfornetbar polymer innehallande sidostaende 2-pyridongrupper |
Country Status (6)
| Country | Link |
|---|---|
| BE (1) | BE823538A (enExample) |
| CA (1) | CA1038537A (enExample) |
| DE (1) | DE2363513C2 (enExample) |
| FR (1) | FR2255322B1 (enExample) |
| GB (1) | GB1489551A (enExample) |
| SE (1) | SE407221B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH639954A5 (de) | 1978-01-11 | 1983-12-15 | Lonza Ag | Verfahren zur herstellung von 6-substituierten 4-methyl-2-pyridonen. |
| DE3641024A1 (de) * | 1986-12-01 | 1988-06-16 | Merck Patent Gmbh | Stickstoffhaltige sechsringverbindungen |
| US9772552B2 (en) | 2013-03-19 | 2017-09-26 | Eastman Kodak Company | Thiosulfate polymer compositions and articles |
| US9499650B2 (en) | 2013-03-19 | 2016-11-22 | Eastman Kodak Company | Thiosulfate polymers |
| US9005878B2 (en) | 2013-03-19 | 2015-04-14 | Eastman Kodak Company | Forming patterns using thiosulfate polymer compositions |
| US8986924B2 (en) | 2013-03-19 | 2015-03-24 | Eastman Kodak Company | Method of sequestering metals using thiosulfate polymers |
| US8916336B2 (en) | 2013-03-19 | 2014-12-23 | Eastman Kodak Company | Patterning method using thiosulfate polymer and metal nanoparticles |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1087416A (en) * | 1964-09-02 | 1967-10-18 | Agfa Gevaert Nv | Photochemical cross-linking of polymers |
-
1973
- 1973-12-20 DE DE19732363513 patent/DE2363513C2/de not_active Expired
-
1974
- 1974-12-12 SE SE7415572A patent/SE407221B/xx not_active IP Right Cessation
- 1974-12-17 FR FR7441492A patent/FR2255322B1/fr not_active Expired
- 1974-12-18 BE BE151666A patent/BE823538A/xx not_active IP Right Cessation
- 1974-12-18 GB GB5472974A patent/GB1489551A/en not_active Expired
- 1974-12-19 CA CA216,423A patent/CA1038537A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CA1038537A (en) | 1978-09-12 |
| DE2363513C2 (de) | 1982-12-23 |
| DE2363513A1 (de) | 1975-07-10 |
| SE407221B (sv) | 1979-03-19 |
| BE823538A (fr) | 1975-06-18 |
| FR2255322A1 (enExample) | 1975-07-18 |
| FR2255322B1 (enExample) | 1980-04-30 |
| GB1489551A (en) | 1977-10-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| NUG | Patent has lapsed |
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