FR2255322B1 - - Google Patents

Info

Publication number
FR2255322B1
FR2255322B1 FR7441492A FR7441492A FR2255322B1 FR 2255322 B1 FR2255322 B1 FR 2255322B1 FR 7441492 A FR7441492 A FR 7441492A FR 7441492 A FR7441492 A FR 7441492A FR 2255322 B1 FR2255322 B1 FR 2255322B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7441492A
Other versions
FR2255322A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of FR2255322A1 publication Critical patent/FR2255322A1/fr
Application granted granted Critical
Publication of FR2255322B1 publication Critical patent/FR2255322B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7441492A 1973-12-20 1974-12-17 Expired FR2255322B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732363513 DE2363513C2 (de) 1973-12-20 1973-12-20 Lichtvernetzbare Polymerisate und deren Verwendung in lichthärtbaren Kopiermassen

Publications (2)

Publication Number Publication Date
FR2255322A1 FR2255322A1 (fr) 1975-07-18
FR2255322B1 true FR2255322B1 (fr) 1980-04-30

Family

ID=5901401

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7441492A Expired FR2255322B1 (fr) 1973-12-20 1974-12-17

Country Status (6)

Country Link
BE (1) BE823538A (fr)
CA (1) CA1038537A (fr)
DE (1) DE2363513C2 (fr)
FR (1) FR2255322B1 (fr)
GB (1) GB1489551A (fr)
SE (1) SE407221B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3641024A1 (de) * 1986-12-01 1988-06-16 Merck Patent Gmbh Stickstoffhaltige sechsringverbindungen
US8916336B2 (en) 2013-03-19 2014-12-23 Eastman Kodak Company Patterning method using thiosulfate polymer and metal nanoparticles
US8986924B2 (en) 2013-03-19 2015-03-24 Eastman Kodak Company Method of sequestering metals using thiosulfate polymers
US9005878B2 (en) 2013-03-19 2015-04-14 Eastman Kodak Company Forming patterns using thiosulfate polymer compositions
US9772552B2 (en) 2013-03-19 2017-09-26 Eastman Kodak Company Thiosulfate polymer compositions and articles
US9499650B2 (en) * 2013-03-19 2016-11-22 Eastman Kodak Company Thiosulfate polymers

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1087416A (en) * 1964-09-02 1967-10-18 Agfa Gevaert Nv Photochemical cross-linking of polymers

Also Published As

Publication number Publication date
BE823538A (fr) 1975-06-18
DE2363513C2 (de) 1982-12-23
CA1038537A (fr) 1978-09-12
DE2363513A1 (de) 1975-07-10
SE407221B (sv) 1979-03-19
FR2255322A1 (fr) 1975-07-18
GB1489551A (en) 1977-10-19
SE7415572L (fr) 1975-06-23

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