GB1489551A - Polymers and compositions containing them - Google Patents

Polymers and compositions containing them

Info

Publication number
GB1489551A
GB1489551A GB5472974A GB5472974A GB1489551A GB 1489551 A GB1489551 A GB 1489551A GB 5472974 A GB5472974 A GB 5472974A GB 5472974 A GB5472974 A GB 5472974A GB 1489551 A GB1489551 A GB 1489551A
Authority
GB
United Kingdom
Prior art keywords
pyridone
dimethyl
polymers
vinyl
methacryloylamino
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5472974A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of GB1489551A publication Critical patent/GB1489551A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/30Introducing nitrogen atoms or nitrogen-containing groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1489551 Photosensitive polymers HOECHST AG 18 Dec 1974 [20 Dec 1973] 54729/74 Heading C3P [Also in Division G2] Light sensitive polymers contain units having a substituted or unsubstituted 2-pyridone side group attached to the polymer chain via a linking member. They are produced by polymerization of an appropriate monomer or by introducing the side group into a preformed polymer. In examples monomers polymerized are 4,6 - dimethyl - 1 - (21 - methacryloyloxyethyl) pyridone - 2 - methacryloylamino- 4,6 - dimethyl pyridone - 2, 3 - methacryloylamino - 1,4,6 - trimethyl pyridone - 2, and 1 - (2<SP>1</SP> - methacryloyloxyethyl) - pyridone - 2. They are copolymerized with vinyl toluene, hexyl methacrylate, 4-vinyl pyridine, dimethyl methacryloyloxymethyl phosphinic acid, 4,6- dimethyl - 1 - vinyl pyridone - 2, or butyl methacrylate. Styrene-maleic anhydride copolymer is reacted with 4,6 - dimethyl - 1 - (2<SP>1</SP> - hydroxyethyl)- pyridone-2 to introduce side groups. Coatings of the polymers are applied to aluminium from solution, exposed to light through a wedge, developed by immersion in butanone, acetone, methanol, 2N-hydrochloric acid, trichloroethylene, or dimethyl formamide and tinted with fat-soluble black HB or methylene blue. A sensitizer, e.g. Michler's ketone or acetophenone may be included in the coating.
GB5472974A 1973-12-20 1974-12-18 Polymers and compositions containing them Expired GB1489551A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732363513 DE2363513C2 (en) 1973-12-20 1973-12-20 Light-crosslinkable polymers and their use in light-curable copying compounds

Publications (1)

Publication Number Publication Date
GB1489551A true GB1489551A (en) 1977-10-19

Family

ID=5901401

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5472974A Expired GB1489551A (en) 1973-12-20 1974-12-18 Polymers and compositions containing them

Country Status (6)

Country Link
BE (1) BE823538A (en)
CA (1) CA1038537A (en)
DE (1) DE2363513C2 (en)
FR (1) FR2255322B1 (en)
GB (1) GB1489551A (en)
SE (1) SE407221B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014153331A1 (en) * 2013-03-19 2014-09-25 Eastman Kodak Company Thiosulfate polymers
US8916336B2 (en) 2013-03-19 2014-12-23 Eastman Kodak Company Patterning method using thiosulfate polymer and metal nanoparticles
US8986924B2 (en) 2013-03-19 2015-03-24 Eastman Kodak Company Method of sequestering metals using thiosulfate polymers
US9005878B2 (en) 2013-03-19 2015-04-14 Eastman Kodak Company Forming patterns using thiosulfate polymer compositions
US9772552B2 (en) 2013-03-19 2017-09-26 Eastman Kodak Company Thiosulfate polymer compositions and articles

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3641024A1 (en) * 1986-12-01 1988-06-16 Merck Patent Gmbh NITROGEN SIX-RING CONNECTIONS

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1087416A (en) * 1964-09-02 1967-10-18 Agfa Gevaert Nv Photochemical cross-linking of polymers

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014153331A1 (en) * 2013-03-19 2014-09-25 Eastman Kodak Company Thiosulfate polymers
US8916336B2 (en) 2013-03-19 2014-12-23 Eastman Kodak Company Patterning method using thiosulfate polymer and metal nanoparticles
US8986924B2 (en) 2013-03-19 2015-03-24 Eastman Kodak Company Method of sequestering metals using thiosulfate polymers
US9005878B2 (en) 2013-03-19 2015-04-14 Eastman Kodak Company Forming patterns using thiosulfate polymer compositions
US9499650B2 (en) 2013-03-19 2016-11-22 Eastman Kodak Company Thiosulfate polymers
US9772552B2 (en) 2013-03-19 2017-09-26 Eastman Kodak Company Thiosulfate polymer compositions and articles

Also Published As

Publication number Publication date
FR2255322B1 (en) 1980-04-30
CA1038537A (en) 1978-09-12
SE7415572L (en) 1975-06-23
SE407221B (en) 1979-03-19
BE823538A (en) 1975-06-18
DE2363513A1 (en) 1975-07-10
FR2255322A1 (en) 1975-07-18
DE2363513C2 (en) 1982-12-23

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19941217