GB1489551A - Polymers and compositions containing them - Google Patents
Polymers and compositions containing themInfo
- Publication number
- GB1489551A GB1489551A GB5472974A GB5472974A GB1489551A GB 1489551 A GB1489551 A GB 1489551A GB 5472974 A GB5472974 A GB 5472974A GB 5472974 A GB5472974 A GB 5472974A GB 1489551 A GB1489551 A GB 1489551A
- Authority
- GB
- United Kingdom
- Prior art keywords
- pyridone
- dimethyl
- polymers
- vinyl
- methacryloylamino
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
1489551 Photosensitive polymers HOECHST AG 18 Dec 1974 [20 Dec 1973] 54729/74 Heading C3P [Also in Division G2] Light sensitive polymers contain units having a substituted or unsubstituted 2-pyridone side group attached to the polymer chain via a linking member. They are produced by polymerization of an appropriate monomer or by introducing the side group into a preformed polymer. In examples monomers polymerized are 4,6 - dimethyl - 1 - (21 - methacryloyloxyethyl) pyridone - 2 - methacryloylamino- 4,6 - dimethyl pyridone - 2, 3 - methacryloylamino - 1,4,6 - trimethyl pyridone - 2, and 1 - (2<SP>1</SP> - methacryloyloxyethyl) - pyridone - 2. They are copolymerized with vinyl toluene, hexyl methacrylate, 4-vinyl pyridine, dimethyl methacryloyloxymethyl phosphinic acid, 4,6- dimethyl - 1 - vinyl pyridone - 2, or butyl methacrylate. Styrene-maleic anhydride copolymer is reacted with 4,6 - dimethyl - 1 - (2<SP>1</SP> - hydroxyethyl)- pyridone-2 to introduce side groups. Coatings of the polymers are applied to aluminium from solution, exposed to light through a wedge, developed by immersion in butanone, acetone, methanol, 2N-hydrochloric acid, trichloroethylene, or dimethyl formamide and tinted with fat-soluble black HB or methylene blue. A sensitizer, e.g. Michler's ketone or acetophenone may be included in the coating.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19732363513 DE2363513C2 (en) | 1973-12-20 | 1973-12-20 | Light-crosslinkable polymers and their use in light-curable copying compounds |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1489551A true GB1489551A (en) | 1977-10-19 |
Family
ID=5901401
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5472974A Expired GB1489551A (en) | 1973-12-20 | 1974-12-18 | Polymers and compositions containing them |
Country Status (6)
Country | Link |
---|---|
BE (1) | BE823538A (en) |
CA (1) | CA1038537A (en) |
DE (1) | DE2363513C2 (en) |
FR (1) | FR2255322B1 (en) |
GB (1) | GB1489551A (en) |
SE (1) | SE407221B (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014153331A1 (en) * | 2013-03-19 | 2014-09-25 | Eastman Kodak Company | Thiosulfate polymers |
US8916336B2 (en) | 2013-03-19 | 2014-12-23 | Eastman Kodak Company | Patterning method using thiosulfate polymer and metal nanoparticles |
US8986924B2 (en) | 2013-03-19 | 2015-03-24 | Eastman Kodak Company | Method of sequestering metals using thiosulfate polymers |
US9005878B2 (en) | 2013-03-19 | 2015-04-14 | Eastman Kodak Company | Forming patterns using thiosulfate polymer compositions |
US9772552B2 (en) | 2013-03-19 | 2017-09-26 | Eastman Kodak Company | Thiosulfate polymer compositions and articles |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3641024A1 (en) * | 1986-12-01 | 1988-06-16 | Merck Patent Gmbh | NITROGEN SIX-RING CONNECTIONS |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1087416A (en) * | 1964-09-02 | 1967-10-18 | Agfa Gevaert Nv | Photochemical cross-linking of polymers |
-
1973
- 1973-12-20 DE DE19732363513 patent/DE2363513C2/en not_active Expired
-
1974
- 1974-12-12 SE SE7415572A patent/SE407221B/en not_active IP Right Cessation
- 1974-12-17 FR FR7441492A patent/FR2255322B1/fr not_active Expired
- 1974-12-18 BE BE151666A patent/BE823538A/en not_active IP Right Cessation
- 1974-12-18 GB GB5472974A patent/GB1489551A/en not_active Expired
- 1974-12-19 CA CA216,423A patent/CA1038537A/en not_active Expired
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014153331A1 (en) * | 2013-03-19 | 2014-09-25 | Eastman Kodak Company | Thiosulfate polymers |
US8916336B2 (en) | 2013-03-19 | 2014-12-23 | Eastman Kodak Company | Patterning method using thiosulfate polymer and metal nanoparticles |
US8986924B2 (en) | 2013-03-19 | 2015-03-24 | Eastman Kodak Company | Method of sequestering metals using thiosulfate polymers |
US9005878B2 (en) | 2013-03-19 | 2015-04-14 | Eastman Kodak Company | Forming patterns using thiosulfate polymer compositions |
US9499650B2 (en) | 2013-03-19 | 2016-11-22 | Eastman Kodak Company | Thiosulfate polymers |
US9772552B2 (en) | 2013-03-19 | 2017-09-26 | Eastman Kodak Company | Thiosulfate polymer compositions and articles |
Also Published As
Publication number | Publication date |
---|---|
FR2255322B1 (en) | 1980-04-30 |
CA1038537A (en) | 1978-09-12 |
SE7415572L (en) | 1975-06-23 |
SE407221B (en) | 1979-03-19 |
BE823538A (en) | 1975-06-18 |
DE2363513A1 (en) | 1975-07-10 |
FR2255322A1 (en) | 1975-07-18 |
DE2363513C2 (en) | 1982-12-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1291499A (en) | Impact-resistant thermoplastic polymers | |
SE7504706L (en) | NON-AQUATIC POLYMER DISPERSIONS, PREPARED BY POLYMERIZATION OF WATER-SOLUBLE MONOMERS. | |
KR920006382A (en) | Method for Controlling Particle Size in Preparation of Expandable Styrene Polymer by Suspension Polymerization | |
GB1489551A (en) | Polymers and compositions containing them | |
JPS5566908A (en) | Bead polymer | |
EP0209830A3 (en) | Acrylic modified polymers | |
ES8302034A1 (en) | Polymer composition and object prepared therefrom. | |
FR2489336B1 (en) | PROCESS FOR THE PREPARATION OF WATER-SOLUBLE POLYMERS OR COPOLYMERS WITH HIGH MOLECULAR WEIGHT AND WITH LOW RESIDUAL MONOMER (S) CONTENT FROM OLEFINICALLY UNSATURATED MONOMERS | |
GB1311025A (en) | Process for producing a block copolymers | |
NO855045L (en) | PROCEDURE FOR PREPARING PODE COPOLYMERS. | |
DK0459588T3 (en) | Functionalized star polymers | |
DE3785041D1 (en) | INSTALLATION OF FUNCTIONALIZED GROUPS IN POLYMERISATEN. | |
GB1521770A (en) | Two-step continuous polymerisation method to form acrylonitrile copolymers | |
FI812818L (en) | POLYMERKOMPOSITION | |
NO20001733D0 (en) | Improvement of the thermal oxidative stability of acrylic polymers | |
JPS5468890A (en) | Preparation of solvent-resistant acrylic resin | |
DE69602012T2 (en) | POLYMER FLOW MODIFIER | |
Jiang et al. | Atom transfer radical copolymerization of methyl methacrylate with N‐cyclohexylmaleimide | |
NO971833D0 (en) | Process of polymerization in the presence of a stable free radical as well as a free radical initiator | |
GB1415084A (en) | Manufacture of impact-resistant acrylonitrile-styrene copolymers | |
GB1485185A (en) | Block copolymers | |
JPS6420211A (en) | Production of water-dispersible resin composition | |
EP0297706A3 (en) | Impact resistant acrylic sheet | |
DK543982A (en) | HARDWARE TWO COMPONENT MATERIALS | |
Bevington et al. | The reactions of 2-vinylnaphthalene and 4-vinylbiphenyl with the benzoyloxy radical |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PE20 | Patent expired after termination of 20 years |
Effective date: 19941217 |