SE407221B - Ljusfornetbar polymer innehallande sidostaende 2-pyridongrupper - Google Patents
Ljusfornetbar polymer innehallande sidostaende 2-pyridongrupperInfo
- Publication number
- SE407221B SE407221B SE7415572A SE7415572A SE407221B SE 407221 B SE407221 B SE 407221B SE 7415572 A SE7415572 A SE 7415572A SE 7415572 A SE7415572 A SE 7415572A SE 407221 B SE407221 B SE 407221B
- Authority
- SE
- Sweden
- Prior art keywords
- polymer containing
- light cleaning
- cleaning polymer
- pyridone groups
- pyridone
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19732363513 DE2363513C2 (de) | 1973-12-20 | 1973-12-20 | Lichtvernetzbare Polymerisate und deren Verwendung in lichthärtbaren Kopiermassen |
Publications (2)
Publication Number | Publication Date |
---|---|
SE7415572L SE7415572L (sv) | 1975-06-23 |
SE407221B true SE407221B (sv) | 1979-03-19 |
Family
ID=5901401
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE7415572A SE407221B (sv) | 1973-12-20 | 1974-12-12 | Ljusfornetbar polymer innehallande sidostaende 2-pyridongrupper |
Country Status (6)
Country | Link |
---|---|
BE (1) | BE823538A (sv) |
CA (1) | CA1038537A (sv) |
DE (1) | DE2363513C2 (sv) |
FR (1) | FR2255322B1 (sv) |
GB (1) | GB1489551A (sv) |
SE (1) | SE407221B (sv) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3641024A1 (de) * | 1986-12-01 | 1988-06-16 | Merck Patent Gmbh | Stickstoffhaltige sechsringverbindungen |
US9772552B2 (en) | 2013-03-19 | 2017-09-26 | Eastman Kodak Company | Thiosulfate polymer compositions and articles |
US9005878B2 (en) | 2013-03-19 | 2015-04-14 | Eastman Kodak Company | Forming patterns using thiosulfate polymer compositions |
US8916336B2 (en) | 2013-03-19 | 2014-12-23 | Eastman Kodak Company | Patterning method using thiosulfate polymer and metal nanoparticles |
US9499650B2 (en) | 2013-03-19 | 2016-11-22 | Eastman Kodak Company | Thiosulfate polymers |
US8986924B2 (en) | 2013-03-19 | 2015-03-24 | Eastman Kodak Company | Method of sequestering metals using thiosulfate polymers |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1087416A (en) * | 1964-09-02 | 1967-10-18 | Agfa Gevaert Nv | Photochemical cross-linking of polymers |
-
1973
- 1973-12-20 DE DE19732363513 patent/DE2363513C2/de not_active Expired
-
1974
- 1974-12-12 SE SE7415572A patent/SE407221B/sv not_active IP Right Cessation
- 1974-12-17 FR FR7441492A patent/FR2255322B1/fr not_active Expired
- 1974-12-18 GB GB5472974A patent/GB1489551A/en not_active Expired
- 1974-12-18 BE BE151666A patent/BE823538A/xx not_active IP Right Cessation
- 1974-12-19 CA CA216,423A patent/CA1038537A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2255322A1 (sv) | 1975-07-18 |
CA1038537A (en) | 1978-09-12 |
DE2363513C2 (de) | 1982-12-23 |
DE2363513A1 (de) | 1975-07-10 |
FR2255322B1 (sv) | 1980-04-30 |
GB1489551A (en) | 1977-10-19 |
SE7415572L (sv) | 1975-06-23 |
BE823538A (fr) | 1975-06-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |
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