SE536952C2 - Kontinuerlig rulle-till-rulle-anordning - Google Patents
Kontinuerlig rulle-till-rulle-anordning Download PDFInfo
- Publication number
- SE536952C2 SE536952C2 SE1250680A SE1250680A SE536952C2 SE 536952 C2 SE536952 C2 SE 536952C2 SE 1250680 A SE1250680 A SE 1250680A SE 1250680 A SE1250680 A SE 1250680A SE 536952 C2 SE536952 C2 SE 536952C2
- Authority
- SE
- Sweden
- Prior art keywords
- reel
- substrate material
- treatment zone
- guiding
- roll
- Prior art date
Links
- 239000000463 material Substances 0.000 claims abstract description 271
- 239000000758 substrate Substances 0.000 claims abstract description 189
- 238000004804 winding Methods 0.000 claims abstract description 28
- 238000000576 coating method Methods 0.000 claims description 19
- 239000011248 coating agent Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 10
- 239000011888 foil Substances 0.000 claims description 2
- 238000000151 deposition Methods 0.000 description 13
- 230000008021 deposition Effects 0.000 description 11
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 238000005452 bending Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000006748 scratching Methods 0.000 description 3
- 230000002393 scratching effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H18/00—Winding webs
- B65H18/08—Web-winding mechanisms
- B65H18/10—Mechanisms in which power is applied to web-roll spindle
- B65H18/103—Reel-to-reel type web winding and unwinding mechanisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H18/00—Winding webs
- B65H18/08—Web-winding mechanisms
- B65H18/10—Mechanisms in which power is applied to web-roll spindle
- B65H18/106—Mechanisms in which power is applied to web-roll spindle for several juxtaposed strips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H23/00—Registering, tensioning, smoothing or guiding webs
- B65H23/04—Registering, tensioning, smoothing or guiding webs longitudinally
- B65H23/18—Registering, tensioning, smoothing or guiding webs longitudinally by controlling or regulating the web-advancing mechanism, e.g. mechanism acting on the running web
- B65H23/1806—Registering, tensioning, smoothing or guiding webs longitudinally by controlling or regulating the web-advancing mechanism, e.g. mechanism acting on the running web in reel-to-reel type web winding and unwinding mechanism, e.g. mechanism acting on web-roll spindle
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H23/00—Registering, tensioning, smoothing or guiding webs
- B65H23/04—Registering, tensioning, smoothing or guiding webs longitudinally
- B65H23/18—Registering, tensioning, smoothing or guiding webs longitudinally by controlling or regulating the web-advancing mechanism, e.g. mechanism acting on the running web
- B65H23/188—Registering, tensioning, smoothing or guiding webs longitudinally by controlling or regulating the web-advancing mechanism, e.g. mechanism acting on the running web in connection with running-web
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H23/00—Registering, tensioning, smoothing or guiding webs
- B65H23/04—Registering, tensioning, smoothing or guiding webs longitudinally
- B65H23/18—Registering, tensioning, smoothing or guiding webs longitudinally by controlling or regulating the web-advancing mechanism, e.g. mechanism acting on the running web
- B65H23/188—Registering, tensioning, smoothing or guiding webs longitudinally by controlling or regulating the web-advancing mechanism, e.g. mechanism acting on the running web in connection with running-web
- B65H23/1888—Registering, tensioning, smoothing or guiding webs longitudinally by controlling or regulating the web-advancing mechanism, e.g. mechanism acting on the running web in connection with running-web and controlling web tension
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/206—Particular processes or apparatus for continuous treatment of the devices, e.g. roll-to roll processes, multi-chamber deposition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2301/00—Handling processes for sheets or webs
- B65H2301/40—Type of handling process
- B65H2301/41—Winding, unwinding
- B65H2301/412—Roll
- B65H2301/4128—Multiple rolls
- B65H2301/41284—Multiple rolls involving juxtaposed lanes wound around a common axis
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2301/00—Handling processes for sheets or webs
- B65H2301/50—Auxiliary process performed during handling process
- B65H2301/51—Modifying a characteristic of handled material
- B65H2301/511—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
- B65H2301/5114—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating
- B65H2301/51145—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating by vapour deposition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2404/00—Parts for transporting or guiding the handled material
- B65H2404/10—Rollers
- B65H2404/16—Details of driving
- B65H2404/165—Details of driving braking roller
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2701/00—Handled material; Storage means
- B65H2701/10—Handled articles or webs
- B65H2701/19—Specific article or web
- B65H2701/192—Labels
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE1250680A SE536952C2 (sv) | 2012-06-25 | 2012-06-25 | Kontinuerlig rulle-till-rulle-anordning |
US14/408,810 US20150203314A1 (en) | 2012-06-25 | 2013-06-18 | Continuous reel-to-reel arrangement |
JP2015517723A JP6130499B2 (ja) | 2012-06-25 | 2013-06-18 | 連続的なリールツーリール装置 |
CN201380033572.3A CN104395214B (zh) | 2012-06-25 | 2013-06-18 | 连续的卷盘到卷盘的装置 |
PCT/EP2013/062625 WO2014001151A1 (en) | 2012-06-25 | 2013-06-18 | Continuous reel-to-reel arrangement |
EP13731718.6A EP2864229A1 (en) | 2012-06-25 | 2013-06-18 | Continuous reel-to-reel arrangement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE1250680A SE536952C2 (sv) | 2012-06-25 | 2012-06-25 | Kontinuerlig rulle-till-rulle-anordning |
Publications (2)
Publication Number | Publication Date |
---|---|
SE1250680A1 SE1250680A1 (sv) | 2013-12-26 |
SE536952C2 true SE536952C2 (sv) | 2014-11-11 |
Family
ID=49782294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE1250680A SE536952C2 (sv) | 2012-06-25 | 2012-06-25 | Kontinuerlig rulle-till-rulle-anordning |
Country Status (6)
Country | Link |
---|---|
US (1) | US20150203314A1 (zh) |
EP (1) | EP2864229A1 (zh) |
JP (1) | JP6130499B2 (zh) |
CN (1) | CN104395214B (zh) |
SE (1) | SE536952C2 (zh) |
WO (1) | WO2014001151A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105059644A (zh) * | 2015-08-11 | 2015-11-18 | 浙江炜冈机械有限公司 | 柔印贴标联线的转接机械手装置 |
CN108675051B (zh) * | 2018-04-26 | 2023-11-03 | 张维国 | 丝线牵伸装置及牵伸方法 |
TW202031107A (zh) * | 2019-01-22 | 2020-08-16 | 以色列商奧寶科技有限公司 | 卷對卷網材處理系統 |
CN116371826B (zh) * | 2023-04-07 | 2023-10-20 | 深圳市方瑞科技有限公司 | 一种卷对卷真空等离子清洗机及其工作方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2245484B1 (zh) * | 1973-09-28 | 1978-08-11 | Jones & Laughlin Steel Corp | |
US3866565A (en) * | 1973-12-21 | 1975-02-18 | David E U Ridout | Vapor deposition apparatus with rotating drum mask |
JPS5831866A (ja) * | 1981-08-20 | 1983-02-24 | Nippon Tanshi Kk | 線材矯正装置 |
CA1219547A (en) * | 1983-04-04 | 1987-03-24 | Prem Nath | Apparatus for and method of continuously depositing a highly conductive, highly transmissive film |
US4763601A (en) | 1987-09-02 | 1988-08-16 | Nippon Steel Corporation | Continuous composite coating apparatus for coating strip |
DE59406668D1 (de) * | 1993-12-02 | 1998-09-17 | Heraeus Gmbh W C | Verfahren und Vorrichtung zur Herstellung eines Folienverbundes |
DE19824797B4 (de) * | 1998-06-03 | 2004-02-12 | Indag Gesellschaft für Industriebedarf mbH & Co. Betriebs KG | Beutelherstellungsvorrichtung und Verfahren zum Herstellen von Folienbeutel |
PT1004369E (pt) * | 1998-11-26 | 2004-10-29 | Cockerill Rech & Dev | Eclusa de estanquecidade para camara de vacuo |
US6666399B2 (en) * | 2001-06-18 | 2003-12-23 | Xerox Corporation | System for transfer and inversion of a continuous web substrate between printing and other devices |
JP2003306271A (ja) * | 2002-04-12 | 2003-10-28 | Toray Ind Inc | 水平糸道ローラー |
US7028940B2 (en) * | 2002-10-25 | 2006-04-18 | The Procter & Gamble Company | Apparatus for unwinding rolls of web material |
JP4728671B2 (ja) * | 2005-03-11 | 2011-07-20 | 日本メクトロン株式会社 | フレキシブルプリント基板の搬送装置 |
CA2635258C (en) * | 2005-12-30 | 2014-07-22 | Overend Technologies, Llc | Unwind and feed system for elastomeric thread |
SE529426C2 (sv) * | 2006-03-21 | 2007-08-07 | Sandvik Intellectual Property | Apparat och metod för eggbeläggning i kontinuerlig deponeringslinje |
JP2007302928A (ja) * | 2006-05-10 | 2007-11-22 | Sumitomo Electric Ind Ltd | 長尺基材連続処理用の搬送機構、それを用いた処理装置およびそれによって得られる長尺部材 |
US7926758B2 (en) * | 2006-07-31 | 2011-04-19 | Industrial Technology Research Institute | Apparatus and system for roll-to-roll processing |
JP4985209B2 (ja) * | 2007-08-13 | 2012-07-25 | 富士電機株式会社 | 薄膜太陽電池の製造装置 |
JP5182610B2 (ja) * | 2007-10-11 | 2013-04-17 | 富士電機株式会社 | 薄膜太陽電池の製造装置 |
EP2218669B1 (en) * | 2007-11-21 | 2018-12-26 | Toyota Jidosha Kabushiki Kaisha | Web carrier, web carrying method, and web carriage control program |
US20110283934A1 (en) * | 2009-02-03 | 2011-11-24 | Sidrabe Inc. | Highly productive apparatus for vacuum coating roll substrates |
US20110143019A1 (en) * | 2009-12-14 | 2011-06-16 | Amprius, Inc. | Apparatus for Deposition on Two Sides of the Web |
-
2012
- 2012-06-25 SE SE1250680A patent/SE536952C2/sv not_active IP Right Cessation
-
2013
- 2013-06-18 JP JP2015517723A patent/JP6130499B2/ja active Active
- 2013-06-18 WO PCT/EP2013/062625 patent/WO2014001151A1/en active Application Filing
- 2013-06-18 EP EP13731718.6A patent/EP2864229A1/en not_active Withdrawn
- 2013-06-18 US US14/408,810 patent/US20150203314A1/en not_active Abandoned
- 2013-06-18 CN CN201380033572.3A patent/CN104395214B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2015520092A (ja) | 2015-07-16 |
SE1250680A1 (sv) | 2013-12-26 |
EP2864229A1 (en) | 2015-04-29 |
CN104395214A (zh) | 2015-03-04 |
JP6130499B2 (ja) | 2017-05-17 |
WO2014001151A1 (en) | 2014-01-03 |
CN104395214B (zh) | 2017-12-08 |
US20150203314A1 (en) | 2015-07-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |