SE429108B - Forstoftningsapparat - Google Patents

Forstoftningsapparat

Info

Publication number
SE429108B
SE429108B SE7611581A SE7611581A SE429108B SE 429108 B SE429108 B SE 429108B SE 7611581 A SE7611581 A SE 7611581A SE 7611581 A SE7611581 A SE 7611581A SE 429108 B SE429108 B SE 429108B
Authority
SE
Sweden
Prior art keywords
sputtering
Prior art date
Application number
SE7611581A
Other languages
English (en)
Swedish (sv)
Other versions
SE7611581L (sv
Inventor
M R Kuehnle
Original Assignee
Coulter Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/641,481 external-priority patent/US4014779A/en
Application filed by Coulter Systems Corp filed Critical Coulter Systems Corp
Publication of SE7611581L publication Critical patent/SE7611581L/xx
Publication of SE429108B publication Critical patent/SE429108B/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SE7611581A 1975-12-17 1976-10-19 Forstoftningsapparat SE429108B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/641,481 US4014779A (en) 1974-11-01 1975-12-17 Sputtering apparatus

Publications (2)

Publication Number Publication Date
SE7611581L SE7611581L (sv) 1977-06-18
SE429108B true SE429108B (sv) 1983-08-15

Family

ID=24572585

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7611581A SE429108B (sv) 1975-12-17 1976-10-19 Forstoftningsapparat

Country Status (17)

Country Link
JP (1) JPS6035429B2 (enrdf_load_html_response)
AT (1) AT344501B (enrdf_load_html_response)
AU (1) AU511961B2 (enrdf_load_html_response)
BE (1) BE847413A (enrdf_load_html_response)
CA (1) CA1077437A (enrdf_load_html_response)
CH (1) CH617965A5 (enrdf_load_html_response)
DD (1) DD127637A5 (enrdf_load_html_response)
DE (1) DE2647149C2 (enrdf_load_html_response)
DK (1) DK149926C (enrdf_load_html_response)
FR (1) FR2335615A1 (enrdf_load_html_response)
GB (1) GB1503301A (enrdf_load_html_response)
IL (1) IL50722A (enrdf_load_html_response)
IT (1) IT1066543B (enrdf_load_html_response)
LU (1) LU76026A1 (enrdf_load_html_response)
MX (1) MX145314A (enrdf_load_html_response)
NL (1) NL7611563A (enrdf_load_html_response)
SE (1) SE429108B (enrdf_load_html_response)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
FR2527233A1 (fr) * 1982-05-24 1983-11-25 Asu Composants Sa Installation pour le depot d'un revetement sur des substrats
US4417968A (en) * 1983-03-21 1983-11-29 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
FR2548589B1 (fr) * 1983-07-07 1987-02-20 Aerospatiale Procede et dispositif d'impregnation metallique d'un substrat se presentant sous la forme d'une nappe de fibres conductrices du courant electrique
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
EP0157991A1 (fr) * 1984-04-10 1985-10-16 INTERPATENT ANSTALT (INDELEC Abteilung) Dispositif pour effectuer en continu la métallisation sélective de pièces industrielles, notamment en électronique
FR2940321B1 (fr) * 2008-12-19 2011-12-23 Carewave Shielding Technologies Machine de depot sous vide,sur un substrat,de materiaux en couches minces,par pulverisation cathodique.
JP5969953B2 (ja) * 2013-05-31 2016-08-17 株式会社神戸製鋼所 成膜装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL136984C (enrdf_load_html_response) * 1964-06-04
DE2115590A1 (en) * 1971-03-31 1972-10-05 Leybold Heraeus Gmbh & Co Kg Cathode sputtering device - has cathode with projecting rim
US3905887A (en) * 1973-01-12 1975-09-16 Coulter Information Systems Thin film deposition method using segmented plasma
US3829373A (en) * 1973-01-12 1974-08-13 Coulter Information Systems Thin film deposition apparatus using segmented target means

Also Published As

Publication number Publication date
DD127637A5 (enrdf_load_html_response) 1977-10-05
IT1066543B (it) 1985-03-12
DE2647149A1 (de) 1977-06-30
CH617965A5 (en) 1980-06-30
JPS6035429B2 (ja) 1985-08-14
GB1503301A (en) 1978-03-08
BE847413A (nl) 1977-04-19
MX145314A (es) 1982-01-27
DK149926B (da) 1986-10-27
DK149926C (da) 1987-09-28
NL7611563A (nl) 1977-06-21
AU2059876A (en) 1978-06-22
SE7611581L (sv) 1977-06-18
CA1077437A (en) 1980-05-13
FR2335615A1 (fr) 1977-07-15
IL50722A (en) 1979-05-31
JPS5275669A (en) 1977-06-24
ATA776076A (de) 1977-11-15
LU76026A1 (enrdf_load_html_response) 1978-05-16
DK469976A (da) 1977-06-18
IL50722A0 (en) 1976-12-31
AU511961B2 (en) 1980-09-18
DE2647149C2 (de) 1983-08-25
FR2335615B1 (enrdf_load_html_response) 1981-12-04
AT344501B (de) 1978-07-25

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