SE425007B - Stabil etslosning omfattande svavelsyra och veteperoxid samt anvendning av densamma - Google Patents
Stabil etslosning omfattande svavelsyra och veteperoxid samt anvendning av densammaInfo
- Publication number
- SE425007B SE425007B SE7700015A SE7700015A SE425007B SE 425007 B SE425007 B SE 425007B SE 7700015 A SE7700015 A SE 7700015A SE 7700015 A SE7700015 A SE 7700015A SE 425007 B SE425007 B SE 425007B
- Authority
- SE
- Sweden
- Prior art keywords
- eos
- wheat
- peroxide
- stable
- sulfuric acid
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/18—Acidic compositions for etching copper or alloys thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US64647676A | 1976-01-05 | 1976-01-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
SE7700015L SE7700015L (sv) | 1977-07-06 |
SE425007B true SE425007B (sv) | 1982-08-23 |
Family
ID=24593221
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE7700015A SE425007B (sv) | 1976-01-05 | 1976-12-31 | Stabil etslosning omfattande svavelsyra och veteperoxid samt anvendning av densamma |
Country Status (8)
Country | Link |
---|---|
US (1) | US4130454A (xx) |
JP (1) | JPS52115752A (xx) |
DE (1) | DE2700265C3 (xx) |
FR (1) | FR2337189A1 (xx) |
GB (1) | GB1546524A (xx) |
IT (1) | IT1080302B (xx) |
NL (1) | NL7700022A (xx) |
SE (1) | SE425007B (xx) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1083401B (it) * | 1977-05-27 | 1985-05-21 | Alfachimici Spa | Soluzione acida per l'attacco selettivo del rame |
US4141850A (en) * | 1977-11-08 | 1979-02-27 | Dart Industries Inc. | Dissolution of metals |
US4174253A (en) * | 1977-11-08 | 1979-11-13 | Dart Industries Inc. | Dissolution of metals utilizing a H2 O2 -H2 SO4 solution catalyzed with hydroxy substituted cycloparaffins |
JPS55154580A (en) * | 1979-05-22 | 1980-12-02 | Yamatoya Shokai:Kk | Copper etching bath |
CA1209886A (en) * | 1982-01-11 | 1986-08-19 | Thomas W. Bleeks | Peroxide selective stripping compositions and method |
JPS58197277A (ja) * | 1982-05-08 | 1983-11-16 | Mitsubishi Gas Chem Co Inc | 金属の化学的溶解処理液 |
US4451327A (en) * | 1982-12-17 | 1984-05-29 | Psi Star, Inc. | Process and structure for etching copper |
JPS61591A (ja) * | 1984-06-13 | 1986-01-06 | Fujitsu Ltd | 銅のエツチング方法 |
US4636282A (en) * | 1985-06-20 | 1987-01-13 | Great Lakes Chemical Corporation | Method for etching copper and composition useful therein |
US5100500A (en) * | 1991-02-08 | 1992-03-31 | Aluminum Company Of America | Milling solution and method |
US5248386A (en) * | 1991-02-08 | 1993-09-28 | Aluminum Company Of America | Milling solution and method |
DE4402788A1 (de) * | 1994-01-31 | 1995-08-10 | Emil Krechen Industrievertretu | Verfahren zum Abtragen von Metallen |
JP3400558B2 (ja) * | 1994-08-12 | 2003-04-28 | メック株式会社 | 銅および銅合金のエッチング液 |
GB9425090D0 (en) * | 1994-12-12 | 1995-02-08 | Alpha Metals Ltd | Copper coating |
JP4033611B2 (ja) * | 2000-07-28 | 2008-01-16 | メック株式会社 | 銅または銅合金のマイクロエッチング剤およびそれを用いるマイクロエッチング法 |
KR100379824B1 (ko) * | 2000-12-20 | 2003-04-11 | 엘지.필립스 엘시디 주식회사 | 식각용액 및 식각용액으로 패턴된 구리배선을 가지는전자기기용 어레이기판 |
US6319846B1 (en) * | 2001-01-05 | 2001-11-20 | Taiwan Semiconductor Manufacturing Company, Ltd | Method for removing solder bodies from a semiconductor wafer |
JP2002256460A (ja) * | 2001-02-09 | 2002-09-11 | Nippon Parkerizing Co Ltd | アルミニウムおよびアルミニウム合金に用いるエッチングとデスマッティング用の組成物及びその方法 |
TW591089B (en) * | 2001-08-09 | 2004-06-11 | Cheil Ind Inc | Slurry composition for use in chemical mechanical polishing of metal wiring |
US6953389B2 (en) * | 2001-08-09 | 2005-10-11 | Cheil Industries, Inc. | Metal CMP slurry compositions that favor mechanical removal of oxides with reduced susceptibility to micro-scratching |
DE10302596A1 (de) * | 2002-01-24 | 2003-08-28 | Shipley Company Marlborough | Behandlung von Metalloberflächen mit einer modifizierten Oxidaustauschmasse |
DE10313517B4 (de) * | 2003-03-25 | 2006-03-30 | Atotech Deutschland Gmbh | Lösung zum Ätzen von Kupfer, Verfahren zum Vorbehandeln einer Schicht aus Kupfer sowie Anwendung des Verfahrens |
US20060124026A1 (en) * | 2004-12-10 | 2006-06-15 | 3M Innovative Properties Company | Polishing solutions |
US7435162B2 (en) * | 2005-10-24 | 2008-10-14 | 3M Innovative Properties Company | Polishing fluids and methods for CMP |
MY145938A (en) * | 2007-02-14 | 2012-05-31 | Avantor Performance Mat Inc | Peroxide activated oxometalate based formulations for removal of etch residue |
US20090001339A1 (en) * | 2007-06-29 | 2009-01-01 | Tae Young Lee | Chemical Mechanical Polishing Slurry Composition for Polishing Phase-Change Memory Device and Method for Polishing Phase-Change Memory Device Using the Same |
KR20090002506A (ko) * | 2007-06-29 | 2009-01-09 | 제일모직주식회사 | 상변화 메모리 소자 연마용 cmp 슬러리 조성물 및 이를이용한 연마 방법 |
US8211617B2 (en) | 2009-08-17 | 2012-07-03 | Palo Alto Research Center Incorporated | Solid inks for printed masks |
US8303832B2 (en) * | 2009-08-17 | 2012-11-06 | Palo Alto Research Center Incorporated | Solid inks for masks for printed circuit boards and other electronic devices |
CN112739852A (zh) * | 2020-04-30 | 2021-04-30 | 松下知识产权经营株式会社 | 蚀刻液 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2377593A (en) * | 1942-02-09 | 1945-06-05 | Packard Motor Car Co | Etching ink |
US2441300A (en) * | 1944-08-21 | 1948-05-11 | Packard Motor Car Co | Ink for etching metal |
-
1976
- 1976-12-31 SE SE7700015A patent/SE425007B/xx not_active IP Right Cessation
-
1977
- 1977-01-04 NL NL7700022A patent/NL7700022A/xx not_active Application Discontinuation
- 1977-01-04 FR FR7700089A patent/FR2337189A1/fr active Granted
- 1977-01-05 DE DE2700265A patent/DE2700265C3/de not_active Expired
- 1977-01-05 IT IT19074/77A patent/IT1080302B/it active
- 1977-01-05 GB GB155/77A patent/GB1546524A/en not_active Expired
- 1977-01-05 JP JP29777A patent/JPS52115752A/ja active Granted
- 1977-09-30 US US05/822,002 patent/US4130454A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
FR2337189B1 (xx) | 1979-03-09 |
DE2700265B2 (de) | 1978-06-29 |
NL7700022A (nl) | 1977-07-07 |
IT1080302B (it) | 1985-05-16 |
DE2700265C3 (de) | 1979-02-22 |
GB1546524A (en) | 1979-05-23 |
DE2700265A1 (de) | 1977-07-14 |
US4130454A (en) | 1978-12-19 |
JPS52115752A (en) | 1977-09-28 |
FR2337189A1 (fr) | 1977-07-29 |
JPS5440448B2 (xx) | 1979-12-04 |
SE7700015L (sv) | 1977-07-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |
Ref document number: 7700015-6 Effective date: 19870915 Format of ref document f/p: F |