SE402653B - Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering - Google Patents

Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering

Info

Publication number
SE402653B
SE402653B SE7511439A SE7511439A SE402653B SE 402653 B SE402653 B SE 402653B SE 7511439 A SE7511439 A SE 7511439A SE 7511439 A SE7511439 A SE 7511439A SE 402653 B SE402653 B SE 402653B
Authority
SE
Sweden
Prior art keywords
layer
copper
procedure
applying
respect
Prior art date
Application number
SE7511439A
Other languages
English (en)
Swedish (sv)
Other versions
SE7511439L (sv
Inventor
K Klupfel
H Sprengel
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of SE7511439L publication Critical patent/SE7511439L/
Publication of SE402653B publication Critical patent/SE402653B/xx

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Wiring (AREA)
SE7511439A 1974-10-14 1975-10-13 Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering SE402653B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742448821 DE2448821C2 (de) 1974-10-14 1974-10-14 Verfahren zum Übertragen einer thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial

Publications (2)

Publication Number Publication Date
SE7511439L SE7511439L (sv) 1976-04-15
SE402653B true SE402653B (sv) 1978-07-10

Family

ID=5928227

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7511439A SE402653B (sv) 1974-10-14 1975-10-13 Forfarande for anbringande av ett fotopolymeriserbart kopieringsskikt pa en skiktberare av koppar resp en kopparlegering

Country Status (9)

Country Link
JP (1) JPS588496B2 (enrdf_load_stackoverflow)
BE (1) BE834453A (enrdf_load_stackoverflow)
CA (1) CA1075955A (enrdf_load_stackoverflow)
CH (1) CH599575A5 (enrdf_load_stackoverflow)
DE (1) DE2448821C2 (enrdf_load_stackoverflow)
FR (1) FR2288336A1 (enrdf_load_stackoverflow)
GB (1) GB1530288A (enrdf_load_stackoverflow)
IT (1) IT1048315B (enrdf_load_stackoverflow)
SE (1) SE402653B (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2849894A1 (de) 1978-11-17 1980-05-29 Hoechst Ag Verfahren zum reinigen von kupfer enthaltenden metalloberflaechen
JPS59122898U (ja) * 1983-02-07 1984-08-18 松下電器産業株式会社 衣類乾燥機
DE3909003A1 (de) * 1989-03-18 1990-09-27 Basf Ag Photopolymerisierbares schichtuebertragungsmaterial
US5320933A (en) * 1990-03-30 1994-06-14 Morton International, Inc. Photoimageable composition having improved adhesion promoter
DE4234423C2 (de) * 1992-10-13 1996-10-10 Inst Mikrotechnik Mainz Gmbh Mit einem Resist beschichtete Metall- oder Halbleitersubstrate und Verfahren zur Erzielung einer stabilen Resist-Substrat-Haftung

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA943803A (en) * 1970-04-02 1974-03-19 E. I. Du Pont De Nemours And Company Photopolymerizable compositions and process of applying same
NL7107486A (enrdf_load_stackoverflow) * 1970-06-11 1971-12-14
US3645772A (en) * 1970-06-30 1972-02-29 Du Pont Process for improving bonding of a photoresist to copper
CA980163A (en) * 1970-12-23 1975-12-23 Jack R. Celeste Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds
US3820993A (en) * 1971-05-07 1974-06-28 Horizons Research Inc Light sensitive reproduction and electron beam sensitive material

Also Published As

Publication number Publication date
GB1530288A (en) 1978-10-25
IT1048315B (it) 1980-11-20
FR2288336B1 (enrdf_load_stackoverflow) 1979-04-27
JPS5164919A (en) 1976-06-04
DE2448821C2 (de) 1986-01-30
FR2288336A1 (fr) 1976-05-14
BE834453A (fr) 1976-04-13
SE7511439L (sv) 1976-04-15
CH599575A5 (enrdf_load_stackoverflow) 1978-05-31
CA1075955A (en) 1980-04-22
JPS588496B2 (ja) 1983-02-16
DE2448821A1 (de) 1976-04-22

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