BE834453A - Procede pour appliquer une couche reprographique - Google Patents

Procede pour appliquer une couche reprographique

Info

Publication number
BE834453A
BE834453A BE160896A BE160896A BE834453A BE 834453 A BE834453 A BE 834453A BE 160896 A BE160896 A BE 160896A BE 160896 A BE160896 A BE 160896A BE 834453 A BE834453 A BE 834453A
Authority
BE
Belgium
Prior art keywords
reprographic
coat
applying
reprographic coat
Prior art date
Application number
BE160896A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE834453A publication Critical patent/BE834453A/xx

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Wiring (AREA)
BE160896A 1974-10-14 1975-10-13 Procede pour appliquer une couche reprographique BE834453A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742448821 DE2448821C2 (de) 1974-10-14 1974-10-14 Verfahren zum Übertragen einer thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial

Publications (1)

Publication Number Publication Date
BE834453A true BE834453A (fr) 1976-04-13

Family

ID=5928227

Family Applications (1)

Application Number Title Priority Date Filing Date
BE160896A BE834453A (fr) 1974-10-14 1975-10-13 Procede pour appliquer une couche reprographique

Country Status (9)

Country Link
JP (1) JPS588496B2 (enrdf_load_stackoverflow)
BE (1) BE834453A (enrdf_load_stackoverflow)
CA (1) CA1075955A (enrdf_load_stackoverflow)
CH (1) CH599575A5 (enrdf_load_stackoverflow)
DE (1) DE2448821C2 (enrdf_load_stackoverflow)
FR (1) FR2288336A1 (enrdf_load_stackoverflow)
GB (1) GB1530288A (enrdf_load_stackoverflow)
IT (1) IT1048315B (enrdf_load_stackoverflow)
SE (1) SE402653B (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2849894A1 (de) 1978-11-17 1980-05-29 Hoechst Ag Verfahren zum reinigen von kupfer enthaltenden metalloberflaechen
JPS59122898U (ja) * 1983-02-07 1984-08-18 松下電器産業株式会社 衣類乾燥機
DE3909003A1 (de) * 1989-03-18 1990-09-27 Basf Ag Photopolymerisierbares schichtuebertragungsmaterial
US5320933A (en) * 1990-03-30 1994-06-14 Morton International, Inc. Photoimageable composition having improved adhesion promoter
DE4234423C2 (de) * 1992-10-13 1996-10-10 Inst Mikrotechnik Mainz Gmbh Mit einem Resist beschichtete Metall- oder Halbleitersubstrate und Verfahren zur Erzielung einer stabilen Resist-Substrat-Haftung

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA943803A (en) * 1970-04-02 1974-03-19 E. I. Du Pont De Nemours And Company Photopolymerizable compositions and process of applying same
NL7107486A (enrdf_load_stackoverflow) * 1970-06-11 1971-12-14
US3645772A (en) * 1970-06-30 1972-02-29 Du Pont Process for improving bonding of a photoresist to copper
CA980163A (en) * 1970-12-23 1975-12-23 Jack R. Celeste Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds
US3820993A (en) * 1971-05-07 1974-06-28 Horizons Research Inc Light sensitive reproduction and electron beam sensitive material

Also Published As

Publication number Publication date
GB1530288A (en) 1978-10-25
IT1048315B (it) 1980-11-20
FR2288336B1 (enrdf_load_stackoverflow) 1979-04-27
SE402653B (sv) 1978-07-10
JPS5164919A (en) 1976-06-04
DE2448821C2 (de) 1986-01-30
FR2288336A1 (fr) 1976-05-14
SE7511439L (sv) 1976-04-15
CH599575A5 (enrdf_load_stackoverflow) 1978-05-31
CA1075955A (en) 1980-04-22
JPS588496B2 (ja) 1983-02-16
DE2448821A1 (de) 1976-04-22

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: HOECHST A.G.

Effective date: 19941031