SE384745B - Forfarande och anordning for korrigering av en felaktig fotomask - Google Patents

Forfarande och anordning for korrigering av en felaktig fotomask

Info

Publication number
SE384745B
SE384745B SE7300024A SE7300024A SE384745B SE 384745 B SE384745 B SE 384745B SE 7300024 A SE7300024 A SE 7300024A SE 7300024 A SE7300024 A SE 7300024A SE 384745 B SE384745 B SE 384745B
Authority
SE
Sweden
Prior art keywords
incorrect
correcting
procedure
photo mask
photo
Prior art date
Application number
SE7300024A
Other languages
English (en)
Swedish (sv)
Inventor
M Tarabocchia
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of SE384745B publication Critical patent/SE384745B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
SE7300024A 1972-01-03 1973-01-02 Forfarande och anordning for korrigering av en felaktig fotomask SE384745B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21492172A 1972-01-03 1972-01-03

Publications (1)

Publication Number Publication Date
SE384745B true SE384745B (sv) 1976-05-17

Family

ID=22800919

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7300024A SE384745B (sv) 1972-01-03 1973-01-02 Forfarande och anordning for korrigering av en felaktig fotomask

Country Status (8)

Country Link
US (1) US3748975A (it)
JP (1) JPS5220231B2 (it)
BE (1) BE793605A (it)
CA (1) CA963982A (it)
DE (1) DE2263856C3 (it)
GB (1) GB1412995A (it)
IT (1) IT974681B (it)
SE (1) SE384745B (it)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5096184A (it) * 1973-12-24 1975-07-31
JPS5346597B2 (it) * 1973-12-27 1978-12-14
JPS5333396B2 (it) * 1974-02-06 1978-09-13
JPS51948A (en) * 1974-06-21 1976-01-07 Dainippon Printing Co Ltd Hotomasukuno seizohoho
JPS5267986A (en) * 1975-12-04 1977-06-06 Fujitsu Ltd Pattern correction equipment
JPS5423473A (en) * 1977-07-25 1979-02-22 Cho Lsi Gijutsu Kenkyu Kumiai Photomask and method of inspecting mask pattern using same
JPS54123706U (it) * 1978-02-15 1979-08-29
JPS5527686A (en) * 1978-08-21 1980-02-27 Sony Corp Projection eliminating device
US4200668A (en) * 1978-09-05 1980-04-29 Western Electric Company, Inc. Method of repairing a defective photomask
JPS56128946A (en) * 1980-03-14 1981-10-08 Fujitsu Ltd Photomask correcting method
JPS586127A (ja) * 1981-07-03 1983-01-13 Hitachi Ltd フオトマスク欠陥修正方法とその装置
JPS5757443U (it) * 1981-07-16 1982-04-05
JPS58173835A (ja) * 1982-04-06 1983-10-12 Fuji Xerox Co Ltd レジストパタ−ンの欠陥修正方法
US4515878A (en) * 1982-08-30 1985-05-07 International Business Machines Corporation Printed circuit board modification process
US4548883A (en) * 1983-05-31 1985-10-22 At&T Bell Laboratories Correction of lithographic masks
US4592975A (en) * 1984-06-20 1986-06-03 Gould Inc. Method for repairing a photomask by laser-induced polymer degradation
JPS61191697U (it) * 1985-05-20 1986-11-28
EP0203215B1 (de) * 1985-05-29 1990-02-21 Ibm Deutschland Gmbh Verfahren zur Reparatur von Transmissionsmasken
US4835576A (en) * 1986-10-17 1989-05-30 Toyo Ink Mfg. Co., Ltd. Opaquing method and apparatus thereof
JPS6381596U (it) * 1986-11-17 1988-05-28
US5443931A (en) * 1992-03-31 1995-08-22 Matsushita Electronics Corporation Photo mask and repair method of the same
JPH05281752A (ja) * 1992-03-31 1993-10-29 Seiko Instr Inc 集束イオンビームによる加工方法
US6200737B1 (en) 1995-08-24 2001-03-13 Trustees Of Tufts College Photodeposition method for fabricating a three-dimensional, patterned polymer microstructure
US6165649A (en) * 1997-01-21 2000-12-26 International Business Machines Corporation Methods for repair of photomasks
US5981110A (en) * 1998-02-17 1999-11-09 International Business Machines Corporation Method for repairing photomasks
JP3662850B2 (ja) * 1998-06-24 2005-06-22 イルミナ インコーポレイテッド 微小球を有するアレイセンサーのデコード
US7167615B1 (en) 1999-11-05 2007-01-23 Board Of Regents, The University Of Texas System Resonant waveguide-grating filters and sensors and methods for making and using same
US7035449B2 (en) * 2001-11-16 2006-04-25 Taiwan Semiconductor Manufacturing Co., Ltd Method for applying a defect finder mark to a backend photomask making process
WO2004065000A1 (en) * 2003-01-21 2004-08-05 Illumina Inc. Chemical reaction monitor
US7005219B2 (en) * 2003-05-08 2006-02-28 Taiwan Semiconductor Manufacturing Co., Ltd. Defect repair method employing non-defective pattern overlay and photoexposure
US7097948B2 (en) * 2003-08-29 2006-08-29 Taiwan Semiconductor Manufacturing Co., Ltd. Method for repair of photomasks
FR2863772B1 (fr) * 2003-12-16 2006-05-26 Commissariat Energie Atomique Procede de reparation d'erreurs de motifs realises dans des couches minces
TWI261726B (en) * 2004-04-09 2006-09-11 Allied Integrated Patterning C Acceptable defect positioning and manufacturing method for large-scaled photomask blanks
US7474393B2 (en) * 2004-09-13 2009-01-06 Joel C. Wojciechowski Method and apparatus for determining a vertical intensity profile along an illuminating beam
WO2006031759A2 (en) * 2004-09-13 2006-03-23 Wojciechowski Joel C Method and apparatus for determining a vertical intensity profile through a plane of focus in a confocal microscope
TWI461838B (zh) * 2010-04-16 2014-11-21 Cowindst Co Ltd 用於修復半色調遮罩之方法及系統
CN113671790B (zh) * 2021-08-13 2022-06-14 深圳市龙图光电有限公司 掩模版缺陷无痕去除方法、装置、设备及其存储介质

Also Published As

Publication number Publication date
US3748975A (en) 1973-07-31
JPS5220231B2 (it) 1977-06-02
DE2263856A1 (de) 1973-07-12
JPS4879978A (it) 1973-10-26
DE2263856B2 (de) 1974-09-19
BE793605A (fr) 1973-05-02
IT974681B (it) 1974-07-10
CA963982A (en) 1975-03-04
GB1412995A (en) 1975-11-05
DE2263856C3 (de) 1975-05-07

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