IT981798B - Fotomaschera e procedimento per la sua fabbricazione - Google Patents

Fotomaschera e procedimento per la sua fabbricazione

Info

Publication number
IT981798B
IT981798B IT22416/73A IT2241673A IT981798B IT 981798 B IT981798 B IT 981798B IT 22416/73 A IT22416/73 A IT 22416/73A IT 2241673 A IT2241673 A IT 2241673A IT 981798 B IT981798 B IT 981798B
Authority
IT
Italy
Prior art keywords
procedure
manufacturing
photo mask
photo
mask
Prior art date
Application number
IT22416/73A
Other languages
English (en)
Original Assignee
Lehrer W
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lehrer W filed Critical Lehrer W
Application granted granted Critical
Publication of IT981798B publication Critical patent/IT981798B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
IT22416/73A 1972-04-10 1973-03-30 Fotomaschera e procedimento per la sua fabbricazione IT981798B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00242383A US3830686A (en) 1972-04-10 1972-04-10 Photomasks and method of fabrication thereof

Publications (1)

Publication Number Publication Date
IT981798B true IT981798B (it) 1974-10-10

Family

ID=22914574

Family Applications (1)

Application Number Title Priority Date Filing Date
IT22416/73A IT981798B (it) 1972-04-10 1973-03-30 Fotomaschera e procedimento per la sua fabbricazione

Country Status (5)

Country Link
US (1) US3830686A (it)
JP (1) JPS4919772A (it)
DE (1) DE2300970A1 (it)
FR (1) FR2179720B3 (it)
IT (1) IT981798B (it)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3919447A (en) * 1971-12-28 1975-11-11 Ibm Spectral differential coded card
JPS609622B2 (ja) * 1979-10-23 1985-03-12 鹿島建設株式会社 建築物の壁面構造
US4609613A (en) * 1980-12-29 1986-09-02 Permanent Images, Inc. Permanent reproductions and formation method therefor
JPS57120609U (it) * 1981-01-23 1982-07-27
JPS58104214U (ja) * 1982-01-09 1983-07-15 株式会社竹中工務店 等気圧理論を応用したカ−テンウオ−ル縦目地の防水構造
JPS58104216U (ja) * 1982-01-09 1983-07-15 株式会社竹中工務店 等気圧理論を応用したカ−テンウオ−ル縦目地の防水構造
JPS5980004U (ja) * 1982-11-24 1984-05-30 日本軽金属株式会社 補強枠付レンガパネルの雨仕舞装置
US6063670A (en) * 1997-04-30 2000-05-16 Texas Instruments Incorporated Gate fabrication processes for split-gate transistors
US6867143B1 (en) 2000-06-22 2005-03-15 International Business Machines Corporation Method for etching a semiconductor substrate using germanium hard mask
KR101996433B1 (ko) * 2012-11-13 2019-07-05 삼성디스플레이 주식회사 박막 형성 장치 및 그것을 이용한 박막 형성 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3271488A (en) * 1961-11-21 1966-09-06 Itt Method of making masks for vapor deposition of electrodes
US3511683A (en) * 1967-06-20 1970-05-12 Mobil Oil Corp Method of electrolessly depositing metals on particles
US3561963A (en) * 1967-09-11 1971-02-09 Signetics Corp Transparent mask and method for making the same
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
JPS4948269A (it) * 1972-09-14 1974-05-10

Also Published As

Publication number Publication date
FR2179720B3 (it) 1976-01-30
JPS4919772A (it) 1974-02-21
US3830686A (en) 1974-08-20
FR2179720A1 (it) 1973-11-23
DE2300970A1 (de) 1973-10-25

Similar Documents

Publication Publication Date Title
IT985844B (it) Pigmento ceramico e procedimento per la sua fabbricazione
IT980547B (it) Transistore ripolare e procedimento per la sua fabbricazione
BE803700A (nl) Lichtgevoelig fotografisch materiaal
IT1045710B (it) Lente a contatto e procedimento per la sua preparazione
BE798440A (nl) Fotografisch materiaal
IT1001014B (it) Chiave piatta e procedimento per la sua fabricazione
IT977791B (it) Convettore e procedimento per la sua fabbricazione
SE380360B (sv) Fotografisk mask
IT971047B (it) Fotoguida e procedimento per la sua fabbricazione
IT981798B (it) Fotomaschera e procedimento per la sua fabbricazione
IT994603B (it) Apparecchio fotografico
IT985309B (it) Pellicola elettrofotografica e metodo per la sua fabbricazione
TR17380A (tr) Ueruen ve usul
IT976334B (it) Fotomaschera e procedimento per ot tenerla
IT951476B (it) Retino di stampa e procedimento per la sua fabbricazione
GB1416899A (en) Photo mask
FI56095C (fi) Jordbruksmaskin
IT1023906B (it) Custodia per dischi fotografici e procedimento per la sua fabbricazione
SE381129B (sv) Skuggmask for fergtelevisionsbildror
IT1003274B (it) Sviluppatore fisico fotografico stabilizzato e procedimento per la sua applicazione
IT986605B (it) Dispositivo semiconduttore e pro cedimento per la sua fabbricazio ne
IT996789B (it) Calcolatore elettronico e procedi mento per la sua fabbricazione
BE794825A (fr) Materiau photosensible
IT970421B (it) Retino di stampa e procedimento per la sua fabbricazione
IT991184B (it) Struttura in foglio e procedimento per la sua fabbricazione