SE357583B - - Google Patents
Info
- Publication number
- SE357583B SE357583B SE09033/70A SE903370A SE357583B SE 357583 B SE357583 B SE 357583B SE 09033/70 A SE09033/70 A SE 09033/70A SE 903370 A SE903370 A SE 903370A SE 357583 B SE357583 B SE 357583B
- Authority
- SE
- Sweden
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/38—Alkaline compositions for etching refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US83757169A | 1969-06-30 | 1969-06-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SE357583B true SE357583B (xx) | 1973-07-02 |
Family
ID=25274834
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE09033/70A SE357583B (xx) | 1969-06-30 | 1970-06-30 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3639185A (xx) |
| JP (1) | JPS4915535B1 (xx) |
| CH (1) | CH536363A (xx) |
| FR (1) | FR2052420A5 (xx) |
| GB (1) | GB1249270A (xx) |
| SE (1) | SE357583B (xx) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112323136A (zh) * | 2020-10-26 | 2021-02-05 | 深圳市裕展精密科技有限公司 | 退镀液以及退镀方法 |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE792433A (fr) * | 1971-12-08 | 1973-03-30 | Energy Conversion Devices Inc | Matiere pour la formation d'images et procede de production d'une imag |
| US4379827A (en) * | 1971-12-08 | 1983-04-12 | Energy Conversion Devices, Inc. | Imaging structure with tellurium metal film and energy sensitive material thereon |
| US3873203A (en) * | 1973-03-19 | 1975-03-25 | Motorola Inc | Durable high resolution silicon template |
| US3944421A (en) * | 1973-10-03 | 1976-03-16 | Horizons Incorporated, A Division Of Horizons Research Incorporated | Process for simultaneous development and etch of photoresist and substrate |
| US3961101A (en) * | 1974-09-16 | 1976-06-01 | Rca Corporation | Process for improved development of electron-beam-sensitive resist films |
| US3961100A (en) * | 1974-09-16 | 1976-06-01 | Rca Corporation | Method for developing electron beam sensitive resist films |
| DE2447225C2 (de) * | 1974-10-03 | 1983-12-22 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zum Ablösen von positiven Photolack |
| US4049453A (en) * | 1975-04-14 | 1977-09-20 | Printing Developments, Inc. | Composite developer-etch composition for chromium-plated lithographic printing plates |
| US4211834A (en) * | 1977-12-30 | 1980-07-08 | International Business Machines Corporation | Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask |
| JPS56122130A (en) * | 1980-02-28 | 1981-09-25 | Sharp Corp | Method for forming pattern of thin film transistor |
| US4472494A (en) * | 1980-09-15 | 1984-09-18 | Napp Systems (Usa), Inc. | Bilayer photosensitive imaging article |
| US4364995A (en) * | 1981-02-04 | 1982-12-21 | Minnesota Mining And Manufacturing Company | Metal/metal oxide coatings |
| US4564589A (en) * | 1984-02-06 | 1986-01-14 | Advanced Imaging Systems Ltd. | Image-forming composite with film |
| US4544622A (en) * | 1984-07-19 | 1985-10-01 | Minnesota Mining And Manufacturing Company | Negative-acting photoresist imaging system |
| US4670372A (en) * | 1984-10-15 | 1987-06-02 | Petrarch Systems, Inc. | Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant |
| US4707426A (en) * | 1986-02-04 | 1987-11-17 | Sony Corporation | Radiation exposure method of manufacturing a color cathode ray tube having light absorptive areas |
| JPS63199975A (ja) * | 1987-02-12 | 1988-08-18 | Tech Res & Dev Inst Of Japan Def Agency | 安全弁 |
| US4940510A (en) * | 1987-06-01 | 1990-07-10 | Digital Equipment Corporation | Method of etching in the presence of positive photoresist |
| JPH01122189A (ja) * | 1987-11-05 | 1989-05-15 | Kansai Paint Co Ltd | プリント配線板フォトレジスト用電着塗料組成物 |
| JPH0294807A (ja) * | 1988-09-30 | 1990-04-05 | Mitsubishi Mining & Cement Co Ltd | 弾性表面波装置の製法 |
| EP1288265A1 (en) * | 2001-08-28 | 2003-03-05 | Sicpa Holding S.A. | Ink composition comprising optically variable pigments, use of the composition, optically variable pigment and method of treating said pigment |
| KR20070092219A (ko) | 2004-12-06 | 2007-09-12 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 에칭 용액 및 이를 위한 첨가제 |
| KR101632965B1 (ko) * | 2008-12-29 | 2016-06-24 | 삼성디스플레이 주식회사 | 포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2931713A (en) * | 1957-09-27 | 1960-04-05 | Amchem Prod | Method of and material for etching aluminum |
| US3098043A (en) * | 1961-08-17 | 1963-07-16 | Burroughs Corp | Etchant for molybdenum |
-
1969
- 1969-06-30 US US837571A patent/US3639185A/en not_active Expired - Lifetime
-
1970
- 1970-05-22 FR FR7018638A patent/FR2052420A5/fr not_active Expired
- 1970-06-11 JP JP45049961A patent/JPS4915535B1/ja active Pending
- 1970-06-15 GB GB28960/70D patent/GB1249270A/en not_active Expired
- 1970-06-24 CH CH964470A patent/CH536363A/de not_active IP Right Cessation
- 1970-06-30 SE SE09033/70A patent/SE357583B/xx unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112323136A (zh) * | 2020-10-26 | 2021-02-05 | 深圳市裕展精密科技有限公司 | 退镀液以及退镀方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CH536363A (de) | 1973-04-30 |
| DE2030013B2 (de) | 1972-08-17 |
| GB1249270A (en) | 1971-10-13 |
| FR2052420A5 (xx) | 1971-04-09 |
| JPS4915535B1 (xx) | 1974-04-16 |
| US3639185A (en) | 1972-02-01 |
| DE2030013A1 (de) | 1971-01-21 |