SE354056B - - Google Patents
Info
- Publication number
- SE354056B SE354056B SE10833/67*A SE1083367A SE354056B SE 354056 B SE354056 B SE 354056B SE 1083367 A SE1083367 A SE 1083367A SE 354056 B SE354056 B SE 354056B
- Authority
- SE
- Sweden
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK0059885 | 1966-07-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
SE354056B true SE354056B (nl) | 1973-02-26 |
Family
ID=7229358
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE10833/67*A SE354056B (nl) | 1966-07-27 | 1967-07-25 | |
SE17788/69A SE350622B (nl) | 1966-07-27 | 1969-12-22 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE17788/69A SE350622B (nl) | 1966-07-27 | 1969-12-22 |
Country Status (10)
Country | Link |
---|---|
US (1) | US3640992A (nl) |
AT (2) | AT283389B (nl) |
BE (1) | BE701823A (nl) |
CH (1) | CH488679A (nl) |
DE (1) | DE1543721A1 (nl) |
ES (1) | ES343391A1 (nl) |
FR (1) | FR1533554A (nl) |
GB (1) | GB1127996A (nl) |
NL (1) | NL152853B (nl) |
SE (2) | SE354056B (nl) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2742631A1 (de) * | 1977-09-22 | 1979-04-05 | Hoechst Ag | Lichtempfindliche kopiermasse |
DE2828037A1 (de) * | 1978-06-26 | 1980-01-10 | Hoechst Ag | Lichtempfindliches gemisch |
EP0164083B1 (de) * | 1984-06-07 | 1991-05-02 | Hoechst Aktiengesellschaft | Positiv arbeitende strahlungsempfindliche Beschichtungslösung |
US5217840A (en) * | 1985-08-12 | 1993-06-08 | Hoechst Celanese Corporation | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom |
US4931381A (en) * | 1985-08-12 | 1990-06-05 | Hoechst Celanese Corporation | Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment |
US5256522A (en) * | 1985-08-12 | 1993-10-26 | Hoechst Celanese Corporation | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing |
US4737437A (en) * | 1986-03-27 | 1988-04-12 | East Shore Chemical Co. | Light sensitive diazo compound, composition and method of making the composition |
JPS63265242A (ja) * | 1987-04-23 | 1988-11-01 | Fuji Photo Film Co Ltd | 多色画像形成方法 |
DE3718416A1 (de) * | 1987-06-02 | 1988-12-15 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung |
US4797345A (en) * | 1987-07-01 | 1989-01-10 | Olin Hunt Specialty Products, Inc. | Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures |
DE3729035A1 (de) * | 1987-08-31 | 1989-03-09 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial |
US4853315A (en) * | 1988-01-15 | 1989-08-01 | International Business Machines Corporation | O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists |
US5273856A (en) * | 1990-10-31 | 1993-12-28 | International Business Machines Corporation | Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation |
US5260162A (en) * | 1990-12-17 | 1993-11-09 | Khanna Dinesh N | Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers |
KR101632965B1 (ko) * | 2008-12-29 | 2016-06-24 | 삼성디스플레이 주식회사 | 포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법 |
CN117142988B (zh) * | 2023-08-25 | 2024-03-01 | 安徽觅拓材料科技有限公司 | 一种重氮萘醌磺酸单酯化合物的制备方法和应用 |
-
1966
- 1966-07-27 DE DE19661543721 patent/DE1543721A1/de active Pending
-
1967
- 1967-06-05 US US643378A patent/US3640992A/en not_active Expired - Lifetime
- 1967-07-17 NL NL676709893A patent/NL152853B/nl not_active IP Right Cessation
- 1967-07-24 AT AT687467A patent/AT283389B/de active
- 1967-07-24 CH CH1048867A patent/CH488679A/de not_active IP Right Cessation
- 1967-07-24 ES ES343391A patent/ES343391A1/es not_active Expired
- 1967-07-24 AT AT687267A patent/AT280954B/de not_active IP Right Cessation
- 1967-07-25 SE SE10833/67*A patent/SE354056B/xx unknown
- 1967-07-25 BE BE701823D patent/BE701823A/xx not_active IP Right Cessation
- 1967-07-25 GB GB34166/67A patent/GB1127996A/en not_active Expired
- 1967-07-27 FR FR115921A patent/FR1533554A/fr not_active Expired
-
1969
- 1969-12-22 SE SE17788/69A patent/SE350622B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
GB1127996A (en) | 1968-09-25 |
NL152853B (nl) | 1977-04-15 |
NL6709893A (nl) | 1967-09-25 |
CH488679A (de) | 1970-04-15 |
AT280954B (de) | 1970-05-11 |
FR1533554A (fr) | 1968-07-19 |
DE1543721A1 (de) | 1969-09-11 |
SE350622B (nl) | 1972-10-30 |
US3640992A (en) | 1972-02-08 |
BE701823A (nl) | 1968-01-25 |
AT283389B (de) | 1970-08-10 |
ES343391A1 (es) | 1968-12-01 |