ES343391A1 - Mejoras introducidas en un procedimiento para la obtencion de un material fotosensitivo apto para el almacenamiento. - Google Patents

Mejoras introducidas en un procedimiento para la obtencion de un material fotosensitivo apto para el almacenamiento.

Info

Publication number
ES343391A1
ES343391A1 ES343391A ES343391A ES343391A1 ES 343391 A1 ES343391 A1 ES 343391A1 ES 343391 A ES343391 A ES 343391A ES 343391 A ES343391 A ES 343391A ES 343391 A1 ES343391 A1 ES 343391A1
Authority
ES
Spain
Prior art keywords
acid ester
sulfonic acid
naphthoquinone diazide
diazide sulfonic
naphthoquinone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES343391A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of ES343391A1 publication Critical patent/ES343391A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Plates And Materials Therefor (AREA)
ES343391A 1966-07-27 1967-07-24 Mejoras introducidas en un procedimiento para la obtencion de un material fotosensitivo apto para el almacenamiento. Expired ES343391A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0059885 1966-07-27

Publications (1)

Publication Number Publication Date
ES343391A1 true ES343391A1 (es) 1968-12-01

Family

ID=7229358

Family Applications (1)

Application Number Title Priority Date Filing Date
ES343391A Expired ES343391A1 (es) 1966-07-27 1967-07-24 Mejoras introducidas en un procedimiento para la obtencion de un material fotosensitivo apto para el almacenamiento.

Country Status (10)

Country Link
US (1) US3640992A (es)
AT (2) AT283389B (es)
BE (1) BE701823A (es)
CH (1) CH488679A (es)
DE (1) DE1543721A1 (es)
ES (1) ES343391A1 (es)
FR (1) FR1533554A (es)
GB (1) GB1127996A (es)
NL (1) NL152853B (es)
SE (2) SE354056B (es)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
EP0164083B1 (de) * 1984-06-07 1991-05-02 Hoechst Aktiengesellschaft Positiv arbeitende strahlungsempfindliche Beschichtungslösung
US5217840A (en) * 1985-08-12 1993-06-08 Hoechst Celanese Corporation Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
US4931381A (en) * 1985-08-12 1990-06-05 Hoechst Celanese Corporation Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
US5256522A (en) * 1985-08-12 1993-10-26 Hoechst Celanese Corporation Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
US4737437A (en) * 1986-03-27 1988-04-12 East Shore Chemical Co. Light sensitive diazo compound, composition and method of making the composition
JPS63265242A (ja) * 1987-04-23 1988-11-01 Fuji Photo Film Co Ltd 多色画像形成方法
DE3718416A1 (de) * 1987-06-02 1988-12-15 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung
US4797345A (en) * 1987-07-01 1989-01-10 Olin Hunt Specialty Products, Inc. Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures
DE3729035A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
US4853315A (en) * 1988-01-15 1989-08-01 International Business Machines Corporation O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists
US5273856A (en) * 1990-10-31 1993-12-28 International Business Machines Corporation Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation
US5260162A (en) * 1990-12-17 1993-11-09 Khanna Dinesh N Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers
KR101632965B1 (ko) * 2008-12-29 2016-06-24 삼성디스플레이 주식회사 포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법
CN117142988B (zh) * 2023-08-25 2024-03-01 安徽觅拓材料科技有限公司 一种重氮萘醌磺酸单酯化合物的制备方法和应用

Also Published As

Publication number Publication date
CH488679A (de) 1970-04-15
GB1127996A (en) 1968-09-25
DE1543721A1 (de) 1969-09-11
AT283389B (de) 1970-08-10
SE354056B (es) 1973-02-26
NL6709893A (es) 1967-09-25
FR1533554A (fr) 1968-07-19
US3640992A (en) 1972-02-08
BE701823A (es) 1968-01-25
AT280954B (de) 1970-05-11
NL152853B (nl) 1977-04-15
SE350622B (es) 1972-10-30

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