SE350622B - - Google Patents

Info

Publication number
SE350622B
SE350622B SE17788/69A SE1778869A SE350622B SE 350622 B SE350622 B SE 350622B SE 17788/69 A SE17788/69 A SE 17788/69A SE 1778869 A SE1778869 A SE 1778869A SE 350622 B SE350622 B SE 350622B
Authority
SE
Sweden
Application number
SE17788/69A
Inventor
O Sues
F Uhlig
H Schaefer
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of SE350622B publication Critical patent/SE350622B/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Plates And Materials Therefor (AREA)
SE17788/69A 1966-07-27 1969-12-22 SE350622B (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0059885 1966-07-27

Publications (1)

Publication Number Publication Date
SE350622B true SE350622B (xx) 1972-10-30

Family

ID=7229358

Family Applications (2)

Application Number Title Priority Date Filing Date
SE10833/67*A SE354056B (xx) 1966-07-27 1967-07-25
SE17788/69A SE350622B (xx) 1966-07-27 1969-12-22

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SE10833/67*A SE354056B (xx) 1966-07-27 1967-07-25

Country Status (10)

Country Link
US (1) US3640992A (xx)
AT (2) AT280954B (xx)
BE (1) BE701823A (xx)
CH (1) CH488679A (xx)
DE (1) DE1543721A1 (xx)
ES (1) ES343391A1 (xx)
FR (1) FR1533554A (xx)
GB (1) GB1127996A (xx)
NL (1) NL152853B (xx)
SE (2) SE354056B (xx)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
DE3582697D1 (de) * 1984-06-07 1991-06-06 Hoechst Ag Positiv arbeitende strahlungsempfindliche beschichtungsloesung.
US5217840A (en) * 1985-08-12 1993-06-08 Hoechst Celanese Corporation Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
US4931381A (en) * 1985-08-12 1990-06-05 Hoechst Celanese Corporation Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
US5256522A (en) * 1985-08-12 1993-10-26 Hoechst Celanese Corporation Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
US4737437A (en) * 1986-03-27 1988-04-12 East Shore Chemical Co. Light sensitive diazo compound, composition and method of making the composition
JPS63265242A (ja) * 1987-04-23 1988-11-01 Fuji Photo Film Co Ltd 多色画像形成方法
DE3718416A1 (de) * 1987-06-02 1988-12-15 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung
US4797345A (en) * 1987-07-01 1989-01-10 Olin Hunt Specialty Products, Inc. Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures
DE3729035A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
US4853315A (en) * 1988-01-15 1989-08-01 International Business Machines Corporation O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists
US5273856A (en) * 1990-10-31 1993-12-28 International Business Machines Corporation Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation
US5260162A (en) * 1990-12-17 1993-11-09 Khanna Dinesh N Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers
KR101632965B1 (ko) * 2008-12-29 2016-06-24 삼성디스플레이 주식회사 포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법
CN117142988B (zh) * 2023-08-25 2024-03-01 安徽觅拓材料科技有限公司 一种重氮萘醌磺酸单酯化合物的制备方法和应用

Also Published As

Publication number Publication date
FR1533554A (fr) 1968-07-19
US3640992A (en) 1972-02-08
ES343391A1 (es) 1968-12-01
DE1543721A1 (de) 1969-09-11
CH488679A (de) 1970-04-15
BE701823A (xx) 1968-01-25
SE354056B (xx) 1973-02-26
GB1127996A (en) 1968-09-25
NL6709893A (xx) 1967-09-25
NL152853B (nl) 1977-04-15
AT283389B (de) 1970-08-10
AT280954B (de) 1970-05-11

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