SE330926B - - Google Patents

Info

Publication number
SE330926B
SE330926B SE04849/68A SE484968A SE330926B SE 330926 B SE330926 B SE 330926B SE 04849/68 A SE04849/68 A SE 04849/68A SE 484968 A SE484968 A SE 484968A SE 330926 B SE330926 B SE 330926B
Authority
SE
Sweden
Application number
SE04849/68A
Inventor
D Sharp
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of SE330926B publication Critical patent/SE330926B/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C1/00—Details
    • H01C1/14—Terminals or tapping points specially adapted for resistors; Arrangements of terminals or tapping points on resistors
    • H01C1/142—Terminals or tapping points specially adapted for resistors; Arrangements of terminals or tapping points on resistors the terminals or tapping points being coated on the resistive element
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques
    • H01C17/08—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques by vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/30—Apparatus or processes specially adapted for manufacturing resistors adapted for baking
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
SE04849/68A 1967-04-13 1968-04-10 SE330926B (OSRAM)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US63068867A 1967-04-13 1967-04-13

Publications (1)

Publication Number Publication Date
SE330926B true SE330926B (OSRAM) 1970-12-07

Family

ID=24528189

Family Applications (1)

Application Number Title Priority Date Filing Date
SE04849/68A SE330926B (OSRAM) 1967-04-13 1968-04-10

Country Status (11)

Country Link
US (1) US3544287A (OSRAM)
BE (1) BE713642A (OSRAM)
CH (1) CH479229A (OSRAM)
DE (1) DE1765003B2 (OSRAM)
ES (1) ES352939A1 (OSRAM)
FR (1) FR1561665A (OSRAM)
GB (1) GB1228956A (OSRAM)
IE (1) IE32016B1 (OSRAM)
IL (1) IL29456A (OSRAM)
NL (1) NL139864B (OSRAM)
SE (1) SE330926B (OSRAM)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3786557A (en) * 1972-05-22 1974-01-22 G Bodway Fabrication of thin film resistors
US4035226A (en) * 1975-04-14 1977-07-12 Rca Corporation Method of preparing portions of a semiconductor wafer surface for further processing
JPS5375472A (en) * 1976-12-17 1978-07-04 Hitachi Ltd Method of producing thin film resistive ic
JPS5820160B2 (ja) * 1978-06-17 1983-04-21 日本碍子株式会社 メタライズ層を備えたセラミツクス体
DE2906813C2 (de) * 1979-02-22 1982-06-03 Robert Bosch Gmbh, 7000 Stuttgart Elektronische Dünnschichtschaltung
DE2948253C2 (de) * 1979-11-30 1981-12-17 Robert Bosch Gmbh, 7000 Stuttgart Elektronische Dünnschichtschaltung
DE3204054A1 (de) * 1981-02-23 1982-09-09 Intel Corp., Santa Clara, Calif. Widerstand in integrierter schaltungstechnik und verfahren zu dessen herstellung
US5254202A (en) * 1992-04-07 1993-10-19 International Business Machines Corporation Fabrication of laser ablation masks by wet etching
RU2159476C2 (ru) * 1997-04-15 2000-11-20 Гомельский государственный университет им. Франциска Скорины Состав для получения резистивной пленки
RU2159475C2 (ru) * 1997-04-15 2000-11-20 Гомельский государственный университет им. Франциска Скорины Состав для получения резистивной пленки
WO2019209776A1 (en) 2018-04-27 2019-10-31 Corning Incorporated Microfluidic devices and methods for manufacturing microfluidic devices
WO2021080811A1 (en) * 2019-10-23 2021-04-29 Corning Incorporated Glass articles including flow channels and methods of making the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA655852A (en) * 1963-01-15 Reich Bernard Method of stabilizing the characteristics of semiconductor devices
US3159556A (en) * 1960-12-08 1964-12-01 Bell Telephone Labor Inc Stabilized tantalum film resistors
US3386011A (en) * 1962-10-23 1968-05-28 Philco Ford Corp Thin-film rc circuits on single substrate
US3406043A (en) * 1964-11-09 1968-10-15 Western Electric Co Integrated circuit containing multilayer tantalum compounds

Also Published As

Publication number Publication date
DE1765003A1 (de) 1971-12-30
IE32016L (en) 1968-10-13
NL139864B (nl) 1973-09-17
CH479229A (de) 1969-09-30
US3544287A (en) 1970-12-01
ES352939A1 (es) 1969-09-01
NL6805074A (OSRAM) 1968-10-14
DE1765003B2 (de) 1972-05-18
BE713642A (OSRAM) 1968-08-16
IE32016B1 (en) 1973-03-21
GB1228956A (OSRAM) 1971-04-21
FR1561665A (OSRAM) 1969-03-28
IL29456A (en) 1971-04-28

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