SE319460B - - Google Patents

Info

Publication number
SE319460B
SE319460B SE1159/66A SE115966A SE319460B SE 319460 B SE319460 B SE 319460B SE 1159/66 A SE1159/66 A SE 1159/66A SE 115966 A SE115966 A SE 115966A SE 319460 B SE319460 B SE 319460B
Authority
SE
Sweden
Application number
SE1159/66A
Inventor
A Walther
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of SE319460B publication Critical patent/SE319460B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/14Feed and outlet means for the gases; Modifying the flow of the reactive gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
SE1159/66A 1965-01-29 1966-01-28 SE319460B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES95244A DE1297086B (de) 1965-01-29 1965-01-29 Verfahren zum Herstellen einer Schicht von einkristallinem Halbleitermaterial

Publications (1)

Publication Number Publication Date
SE319460B true SE319460B (de) 1970-01-19

Family

ID=7519237

Family Applications (1)

Application Number Title Priority Date Filing Date
SE1159/66A SE319460B (de) 1965-01-29 1966-01-28

Country Status (7)

Country Link
US (1) US3472684A (de)
AT (1) AT256940B (de)
CH (1) CH457374A (de)
DE (1) DE1297086B (de)
GB (1) GB1124330A (de)
NL (1) NL6517274A (de)
SE (1) SE319460B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3635683A (en) * 1968-06-05 1972-01-18 Texas Instruments Inc Method of crystal growth by vapor deposition
US3696779A (en) * 1969-12-29 1972-10-10 Kokusai Electric Co Ltd Vapor growth device
DE2033444C3 (de) * 1970-07-06 1979-02-15 Siemens Ag Vorrichtung zum Eindiffundieren von Dotierstoffen in Scheiben aus Halbleitermaterial
US4062318A (en) * 1976-11-19 1977-12-13 Rca Corporation Apparatus for chemical vapor deposition
FR2573325B1 (fr) * 1984-11-16 1993-08-20 Sony Corp Appareil et procede pour faire des depots de vapeur sur des plaquettes
US4649859A (en) * 1985-02-19 1987-03-17 The United States Of America As Represented By The United States Department Of Energy Reactor design for uniform chemical vapor deposition-grown films without substrate rotation
US5414927A (en) * 1993-03-30 1995-05-16 Union Oil Co Furnace elements made from graphite sheets
DE69810969T2 (de) * 1998-02-24 2003-08-07 Aixtron Ag Anordnung für die obere wandung eines reaktors für epitaxisches wachstum
KR100319891B1 (ko) * 1999-06-29 2002-01-10 윤종용 웨이퍼용 열처리 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2631948A (en) * 1949-05-23 1953-03-17 Ohio Commw Eng Co Method and apparatus for gas plating
US2887088A (en) * 1954-08-16 1959-05-19 Ohio Commw Eng Co Apparatus for gaseous metal plating fibers
NL238464A (de) * 1958-05-29
NL256255A (de) * 1959-11-02
NL271345A (de) * 1960-11-30
NL270518A (de) * 1960-11-30
US3233578A (en) * 1962-04-23 1966-02-08 Capita Emil Robert Apparatus for vapor plating
US3301213A (en) * 1962-10-23 1967-01-31 Ibm Epitaxial reactor apparatus
US3381114A (en) * 1963-12-28 1968-04-30 Nippon Electric Co Device for manufacturing epitaxial crystals

Also Published As

Publication number Publication date
CH457374A (de) 1968-06-15
GB1124330A (en) 1968-08-21
DE1297086B (de) 1969-06-12
US3472684A (en) 1969-10-14
AT256940B (de) 1967-09-11
NL6517274A (de) 1966-08-01

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