SE314269B - - Google Patents
Info
- Publication number
- SE314269B SE314269B SE728665A SE728665A SE314269B SE 314269 B SE314269 B SE 314269B SE 728665 A SE728665 A SE 728665A SE 728665 A SE728665 A SE 728665A SE 314269 B SE314269 B SE 314269B
- Authority
- SE
- Sweden
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US37253764A | 1964-06-04 | 1964-06-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SE314269B true SE314269B (en:Method) | 1969-09-01 |
Family
ID=23468560
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE728665A SE314269B (en:Method) | 1964-06-04 | 1965-06-03 |
Country Status (9)
| Country | Link |
|---|---|
| AT (1) | AT255226B (en:Method) |
| BE (1) | BE664061A (en:Method) |
| DE (1) | DE1515322C3 (en:Method) |
| ES (1) | ES313735A1 (en:Method) |
| FR (1) | FR1434758A (en:Method) |
| GB (1) | GB1104487A (en:Method) |
| IL (1) | IL23185A (en:Method) |
| NL (2) | NL6506292A (en:Method) |
| SE (1) | SE314269B (en:Method) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3617459A (en) * | 1967-09-15 | 1971-11-02 | Ibm | Rf sputtering method and apparatus for producing insulating films of varied physical properties |
| MX145314A (es) * | 1975-12-17 | 1982-01-27 | Coulter Systems Corp | Mejoras a un aparato chisporroteador para producir pelicula electrofotografica |
-
0
- NL NL136984D patent/NL136984C/xx active
-
1965
- 1965-03-19 IL IL2318565A patent/IL23185A/xx unknown
- 1965-04-05 AT AT307465A patent/AT255226B/de active
- 1965-05-17 BE BE664061D patent/BE664061A/xx unknown
- 1965-05-18 NL NL6506292A patent/NL6506292A/xx unknown
- 1965-05-18 DE DE1965W0039172 patent/DE1515322C3/de not_active Expired
- 1965-05-21 GB GB2157965A patent/GB1104487A/en not_active Expired
- 1965-05-24 FR FR18205A patent/FR1434758A/fr not_active Expired
- 1965-05-26 ES ES0313735A patent/ES313735A1/es not_active Expired
- 1965-06-03 SE SE728665A patent/SE314269B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AT255226B (de) | 1967-06-26 |
| ES313735A1 (es) | 1965-07-16 |
| GB1104487A (en) | 1968-02-28 |
| NL6506292A (en:Method) | 1965-12-06 |
| DE1515322A1 (de) | 1972-03-02 |
| DE1515322B2 (de) | 1973-10-04 |
| NL136984C (en:Method) | |
| BE664061A (en:Method) | 1965-09-16 |
| IL23185A (en) | 1968-08-22 |
| FR1434758A (fr) | 1966-04-08 |
| DE1515322C3 (de) | 1974-05-02 |