SE310971B - - Google Patents

Info

Publication number
SE310971B
SE310971B SE8720/63A SE872063A SE310971B SE 310971 B SE310971 B SE 310971B SE 8720/63 A SE8720/63 A SE 8720/63A SE 872063 A SE872063 A SE 872063A SE 310971 B SE310971 B SE 310971B
Authority
SE
Sweden
Application number
SE8720/63A
Inventor
S Bradshaw
J Wilkes
Original Assignee
Gen Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric Co Ltd filed Critical Gen Electric Co Ltd
Publication of SE310971B publication Critical patent/SE310971B/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105After-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/02Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using non-aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/32Anodisation of semiconducting materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemically Coating (AREA)
  • Formation Of Insulating Films (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
SE8720/63A 1962-08-09 1963-08-08 SE310971B (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB30660/62A GB976559A (en) 1962-08-09 1962-08-09 Improvements in or relating to germanium bodies

Publications (1)

Publication Number Publication Date
SE310971B true SE310971B (en:Method) 1969-05-19

Family

ID=10311112

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8720/63A SE310971B (en:Method) 1962-08-09 1963-08-08

Country Status (9)

Country Link
US (1) US3340163A (en:Method)
AT (1) AT242749B (en:Method)
BE (1) BE635971A (en:Method)
CH (1) CH414020A (en:Method)
DE (1) DE1294137B (en:Method)
DK (1) DK117481B (en:Method)
GB (1) GB976559A (en:Method)
NL (1) NL296350A (en:Method)
SE (1) SE310971B (en:Method)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3431636A (en) * 1964-11-12 1969-03-11 Texas Instruments Inc Method of making diffused semiconductor devices
US3401056A (en) * 1965-09-03 1968-09-10 Gen Electric Co Ltd Formation of coatings on germanium bodies
US3401054A (en) * 1965-09-03 1968-09-10 Gen Electric Co Ltd Formation of coatings on germanium bodies
US3442775A (en) * 1965-10-22 1969-05-06 Philips Corp Formation of coating on germanium bodies
DE1521986A1 (de) * 1965-12-10 1970-05-27 Siemens Ag Verfahren zum Herstellen eines nichtwasserloeslichen UEberzuges aus Germaniumoxyd an der Oberflaeche eines Germaniumkristalles
JPS5676538A (en) * 1979-11-28 1981-06-24 Sumitomo Electric Ind Ltd Formation of insulating film on semiconductor substrate
US4766093A (en) * 1984-07-30 1988-08-23 International Business Machines Corp. Chemically formed self-aligned structure and wave guide
CN102234829A (zh) * 2010-04-23 2011-11-09 立督科技股份有限公司 阳极氧化多重染色制程

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1331756A (fr) * 1961-08-14 1963-07-05 Ass Elect Ind Procédés perfectionnés de fabrication de transistors

Also Published As

Publication number Publication date
GB976559A (en) 1964-11-25
DK117481B (da) 1970-05-04
DE1294137B (de) 1969-04-30
CH414020A (fr) 1966-05-31
BE635971A (en:Method)
AT242749B (de) 1965-10-11
NL296350A (en:Method)
US3340163A (en) 1967-09-05

Similar Documents

Publication Publication Date Title
BE630640A (en:Method)
BE621214A (en:Method)
BE624184A (en:Method)
BE612190A (en:Method)
BE613108A (en:Method)
BE614403A (en:Method)
BE615521A (en:Method)
BE615523A (en:Method)
BE616166A (en:Method)
BE617118A (en:Method)
BE617475A (en:Method)
BE618038A (en:Method)
BE618389A (en:Method)
BE619189A (en:Method)
BE620037A (en:Method)
BE620075A (en:Method)
BE620360A (en:Method)
BE620399A (en:Method)
BE620474A (en:Method)
BE620580A (en:Method)
BE620602A (en:Method)
BE620714A (en:Method)
BE620937A (en:Method)
BE621024A (en:Method)
BE627343A (en:Method)