RU2020104449A - Способ плазменной полимеризации в мягких условиях для механически устойчивого супергидрофобного наноструктурированного покрытия - Google Patents
Способ плазменной полимеризации в мягких условиях для механически устойчивого супергидрофобного наноструктурированного покрытия Download PDFInfo
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- 238000000034 method Methods 0.000 title claims 16
- 230000003075 superhydrophobic effect Effects 0.000 title claims 6
- 239000002103 nanocoating Substances 0.000 title 1
- 238000006116 polymerization reaction Methods 0.000 title 1
- 239000007858 starting material Substances 0.000 claims 14
- 239000000178 monomer Substances 0.000 claims 13
- 239000011248 coating agent Substances 0.000 claims 9
- 238000000576 coating method Methods 0.000 claims 9
- 239000000758 substrate Substances 0.000 claims 7
- -1 fluoroalkyl acrylate Chemical compound 0.000 claims 6
- 239000007789 gas Substances 0.000 claims 6
- 239000002243 precursor Substances 0.000 claims 6
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 2
- ZYMKZMDQUPCXRP-UHFFFAOYSA-N fluoro prop-2-enoate Chemical compound FOC(=O)C=C ZYMKZMDQUPCXRP-UHFFFAOYSA-N 0.000 claims 2
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 239000002086 nanomaterial Substances 0.000 claims 2
- 239000002994 raw material Substances 0.000 claims 2
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 claims 1
- QUKRIOLKOHUUBM-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl prop-2-enoate Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCOC(=O)C=C QUKRIOLKOHUUBM-UHFFFAOYSA-N 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000000443 aerosol Substances 0.000 claims 1
- 239000003570 air Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims 1
- 229910021529 ammonia Inorganic materials 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 230000004888 barrier function Effects 0.000 claims 1
- 239000001569 carbon dioxide Substances 0.000 claims 1
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 1
- 230000003247 decreasing effect Effects 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 229910001873 dinitrogen Inorganic materials 0.000 claims 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims 1
- 239000010408 film Substances 0.000 claims 1
- 239000011888 foil Substances 0.000 claims 1
- 239000001307 helium Substances 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- 239000004745 nonwoven fabric Substances 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
- 125000003107 substituted aryl group Chemical group 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 239000002759 woven fabric Substances 0.000 claims 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
- B05D5/083—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface involving the use of fluoropolymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/34—Applying different liquids or other fluent materials simultaneously
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
- C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45512—Premixing before introduction in the reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45574—Nozzles for more than one gas
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2506/00—Halogenated polymers
- B05D2506/10—Fluorinated polymers
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Claims (19)
1. Способ осаждения супергидрофобного покрытия на подложке, включающий следующие стадии:
получение первого исходного вещества, содержащего фторакрилатные мономеры, фторалкилакрилатные мономеры, фторметакрилатные мономеры, фторалкилметакрилатные мономеры, фторсилановые мономеры, или их комбинации или производные;
получение второго исходного вещества, содержащего циклосилоксаны;
совместное впрыскивание вышеупомянутых первого и второго исходных веществ в область обработки; и
создание плазменного разряда при атмосферном давлении или пониженном давлении в вышеупомянутой области обработки для осаждения на вышеупомянутой подложке супергидрофобного покрытия, произведенного из вышеупомянутых совместно впрыскиваемых первого и второго исходных веществ, причем плазменный разряд имеет плотность мощности, составляющую по меньшей мере 0,05 Вт⋅см-2 и не более чем 100 Вт⋅см-2.
2. Способ по п. 1, в котором второе исходное вещество содержит циклополидизамещенный силоксан, представленный формулой [-(R1R2)SiO-]z, где каждая группа из R1 и R2 представляет собой, независимо от другой группы, алкильную группу, содержащую от 1 до 30 атомов углерода, арильную группу, содержащую от 6 до 60 атомов углерода, или замещенную алкильную группу или замещенную арильную группу, содержащую от приблизительно 1 до приблизительно 30 атомов углерода, и где z представляет собой целое число от 3 до 10.
3. Способ по п. 1, в котором подложка представляет собой лист, такой как фольга, пластинка, пленка, тканый материал или нетканый материал.
4. Способ по п. 1, в котором супергидрофобное покрытие имеет угол смачивания водой, составляющий по меньшей мере 150°.
5. Способ по п. 1, в котором плазменный разряд представляет собой диэлектрический барьерный разряд, в котором переменное напряжение приложено к области обработки, причем вышеупомянутое переменное напряжение предпочтительно имеет амплитуду, составляющую по меньшей мере 1 кВ и не более чем 20 кВ, и частоту, составляющую по меньшей мере 500 Гц и не более чем 100 кГц.
6. Способ по п. 1, в котором совместное впрыскивание вышеупомянутых первого и второго исходных веществ в вышеупомянутую область обработки включает стадии введения первого исходного вещества и второго исходного вещества в плазмообразующий газ и введения вышеупомянутого плазмообразующего газа, содержащего вышеупомянутые первое и второе исходные вещества, в вышеупомянутую область обработки, причем вышеупомянутый плазмообразующий газ предпочтительно содержит гелий, аргон, газообразный азот, воздух, кислород, аммиак, метан, ацетилен, диоксид углерода, газообразный водород или их смесь.
7. Способ по п. 6, в котором первое и второе исходные вещества вводят в вышеупомянутый плазмообразующий газ в форме аэрозоля.
8. Способ по п. 6, в котором каждое из первого и второго исходных веществ атомизируют со скоростью, составляющей по меньшей мере 0,1 стандартного литра в минуту и не более чем 5 стандартных литров в минуту.
9. Способ по п. 6, в котором вышеупомянутый плазмообразующий газ имеет скорость потока газа, составляющую по меньшей мере 1 стандартный литр в минуту и не более чем 100 стандартных литров в минуту.
10. Способ по п. 1, в котором первое исходное вещество содержит фторалкилакрилатный мономер, предпочтительно 1Н,1Н,2Н,2Н-перфтордецилакрилатный мономер.
11. Способ по п. 2, в котором второе исходное вещество содержит 2,4,6,8-тетраметил-2,4,6,8-тетравинилциклотетрасилоксановые мономеры.
12. Способ по п. 1, причем вышеупомянутый способ включает стадию совместного впрыскивания вышеупомянутого первого и второго исходных веществ в вышеупомянутую область обработки при практически постоянной скорости потока каждого из вышеупомянутого первого и вышеупомянутого второго исходных веществ с получением практически однородного покрытия.
13. Способ по п. 1, причем вышеупомянутый способ включает стадию совместного впрыскивания вышеупомянутых первого и второго исходных веществ в вышеупомянутую область обработки при уменьшении скорости потока вышеупомянутого второго исходного вещества и увеличении скорости потока вышеупомянутого первого исходного вещества с получением покрытия, имеющего градиент состава.
14. Супергидрофорбное покрытие подложки, содержащее чередующиеся многослойные наноструктуры; причем покрытие подложки образуется посредством сополимеризации первого исходного вещества и второго исходного вещества; вышеупомянутое первое исходное вещество содержит фторакрилатные мономеры, фторалкилакрилатные мономеры, фторметакрилатные мономеры, фторалкилметакрилатные мономеры, фторсилановые мономеры, или их комбинации или производные; вышеупомянутое второе исходное вещество содержит циклосилоксаны.
15. Супергидрофобное покрытие подложки по п. 14, причем вышеупомянутые чередующиеся многослойные наноструктуры вышеупомянутого покрытия подложки являются практически случайно ориентированными и практически гомогенно диспергированными.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP17187416.7A EP3446793B1 (en) | 2017-08-23 | 2017-08-23 | Soft plasma polymerization process for a mechanically durable superhydrophobic nanostructured coating |
| EP17187416.7 | 2017-08-23 | ||
| PCT/EP2018/072762 WO2019038378A1 (en) | 2017-08-23 | 2018-08-23 | FLEXIBLE PLASMA POLYMERIZATION PROCESS FOR MECHANICALLY SUSTAINABLE SUPERHYDROPHOBIC NANOSTRUCTURED COATING |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| RU2020104449A true RU2020104449A (ru) | 2021-09-23 |
| RU2020104449A3 RU2020104449A3 (ru) | 2022-02-28 |
| RU2791710C2 RU2791710C2 (ru) | 2023-03-13 |
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| RU2020104449A3 (ru) | 2022-02-28 |
| AU2018321035A1 (en) | 2020-03-05 |
| CA3072686A1 (en) | 2019-02-28 |
| EP4289520A2 (en) | 2023-12-13 |
| JP7458976B2 (ja) | 2024-04-01 |
| CN110997163A (zh) | 2020-04-10 |
| EP3446793A1 (en) | 2019-02-27 |
| JP2020531698A (ja) | 2020-11-05 |
| WO2019038378A1 (en) | 2019-02-28 |
| US11845105B2 (en) | 2023-12-19 |
| US20210086226A1 (en) | 2021-03-25 |
| EP4289520A3 (en) | 2024-03-13 |
| EP3446793C0 (en) | 2023-10-04 |
| KR20200043994A (ko) | 2020-04-28 |
| EP3446793B1 (en) | 2023-10-04 |
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