RU188871U1 - Substrate holder equipment for applying contacts to heterostructural solar cells - Google Patents

Abstract

A single loading of heterostructural solar cells into magnetron systems of the orbital type with low productivity is provided. The technical result is to prevent the deposition of the target material on the edge or the end of the heterostructural solar cell, not pollinating the target material in places close to the insulating edge of the heterostructural solar cell, ensuring a low tool weight. The padding holder contains a generally rectangular holder and mask. The holder and the mask contain holes for guide pins that orient the mask on the holder, and notches for positioning the tooling on the loading robot of the magnetron system, the corners of the holder and the mask are made oblique. The tool holder has holes for vacuuming the air, on the front side of the holder there is a raised upper part and a recessed seat for the heterostructure solar cell, and a recess is made on the back side of the holder. The mask contains an internal inclined wall and a protruding edge adjacent to the internal inclined wall. The vertical wall of the protruding edge is in contact with the inner wall of the raised upper part of the holder.

Description

TECHNICAL FIELD TO WHICH A USEFUL MODEL RELATES.

The utility model relates to devices for applying contacts to heterostructural elements, namely, to snap the substrate holder for magnetron systems with rotating substrate holders used for applying contacts to single heterostructure solar cells based on single crystal, quasi-single crystal and multisilicon.

BACKGROUND

For deposition of front and back contacts on heterostructural solar silicon cells, magnetron sputtering of targets from the necessary material is mainly used. For deposition of frontal transparent conductive contacts, indium tin oxide targets are used, and for the deposition of back contacts, metal targets and / or targets from transparent conductive oxides are used. An essential task is the edge insulation of heterostructural solar cells, as in the case of deposition of a metal film or an indium tin oxide film on the edge or end of a heterostructure solar cell, an electric shunting of the front and back side of the solar cell occurs, which in turn leads to significant losses of solar power. element, or to its full inoperability. The solution to this problem is the use of special masks to avoid sputtering target material on the edges of heterostructural solar cells.

In this case, an urgent task is the possibility of using magnetron systems with the location of targets only over the front or back sides of heterostructural solar cells, including for applying contacts only to individualized heterostructural solar cells. For industrial magnetron systems, special pallets with a large number of end-to-end seats (from 30 to 72) for heterostructural solar silicon cells are used. Targets in the installation chamber are at the top and bottom, with the passage of the pallets between the targets, the edges of the seat play the role of a mask, isolating the edges of heterostructural solar silicon cells from the material sprayed from the lower target. For systems with low productivity, in which the targets are located only at the top, and only a single load is possible, such a construction cannot be used, and an individual equipment is needed for each heterostructure solar cell.

The known holder for the deposition of organic material from the vapor phase (WIPO publication WO 03/004719 Al, С23С 14/04, 16/04, H01L 21/00, 16.01.2003), containing a rectangular frame - a substrate holder and a round mask holder. However, such a holder does not solve the specific problems of magnetron sputtering of contacts, in particular, the deposition of contact material on the edge or end of a heterostucturer element.

The holder of the substrate for coating by magnetron sputtering is known (patent RU 2539487, IPC С23С 14/56 (2006.1), С23С 14/24 (2006.1), 03.05.2012). The holder consists of at least one module having a nozzle-frame, made with the possibility of rotation in a horizontal or vertical plane, with the places in which the substrate is placed and fixed. Then the nozzle-frame set movably in the cage and move along the rails of the cage in the waiting position or the working position. When the nozzle-frame is transferred to the working position, it is informed by a pivoting movement in the horizontal or in the vertical plane to change the arrangement of the substrates relative to the plasma source. In this way, the working medium can be accessed to all the substrate surfaces to be processed. The disadvantage of this solution is the large weight and complexity of the design, as well as the absence of masking.

Structurally, the closest analogue of this utility model is the holder of substrates with a solid base and with landing pads for single substrates (utility model RU 157964, IPC С23С 16/458, C232C 14/50, 20.12.2015). However, this technical solution was developed in accordance with the requirements of plasma chemical deposition, and not magnetron sputtering. In addition, it cannot be used to apply contacts to individualized (single) heterostructural solar cells, as well as when used in orbital-type magnetron systems, underdusting of target materials can form in places close to the insulating edge of heterostructural solar cells.

DISCLOSURE OF THE ESSENCE OF A USEFUL MODEL

The technical problem addressed by the utility model is the provision of a single load of heterostructural solar cells into orbital-type magnetron systems with low productivity.

The technical result of the utility model is to prevent the target material from precipitating on the edge or the end of a heterostructural solar cell, not pollinating the target material in places close to the insulating edge of the hetero-structured solar cell, which ensures uniform sputtering of the contacts, ensuring a low tool weight.

According to the utility model, the technical result is achieved due to the fact that the equipment of the substrate holder for applying contacts to heterostructure solar cells in orbital magnetron systems contains a generally rectangular holder and mask. The holder and the mask contain holes for guide pins that orient the mask on the holder, and notches for positioning the tooling on the loading robot of the magnetron system, with the corners of the holder and the mask oblique. The tool holder has holes for vacuuming the air, the front side of the holder contains a raised upper part and a recessed seat for the heterostructure solar cell, bounded by the inner wall of the raised upper part, and a recess is made on the back side of the holder. The mask contains an internal inclined wall and a protruding edge adjacent to the internal inclined wall. The vertical wall of the protruding edge is made in contact with the inner wall of the raised upper part of the holder.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1. Type of equipment assembly from above.

FIG. 2. Tooling assembly in section AA.

FIG. 3. Tool assembly assembled in section BB.

FIG. 4. Bottom view of the holder.

IMPLEMENTATION OF THE USEFUL MODEL

FIG. 1 shows a top view of the rigging of a substrate holder of a single-load orbital magnetron system in accordance with the present utility model. This rig contains holder 1 and mask 2. In mask 2 and holder 1, holes 3 are made for guide pins (not shown) fastening mask 2 and holder 1, and orienting mask 2 on holder 1. Also in mask 2 and holder 1, notches are made 4 for tooling positioning on the orbital magnetron system loading robot.

In the holder 1, holes 5 are made for vacuum evacuation of air remaining after the loading of the heterostructure solar cell. On the back of the holder there is a recess 6. Recess 6 can be made in the form of several trapezoidal cuts. Such cuts are designed to reduce the total weight of the equipment. Too heavy equipment can lead to malfunctioning of the loading robot.

On the front side of the holder 1 there is a recessed seat 7 for a heterostructure solar cell (not shown). The size of the recess 6 is smaller than the size of the seat 7 (Fig. 2, 3).

The raised upper part 8 of the holder 1 in working condition is in contact with the mask 2 and the pins (not shown).

The mask 2 has a protruding edge 9 and an inner inclined wall 10. The protruding edge 9 is adjacent to the inner inclined wall. In working condition, a heterostructural solar cell is laid on the seat 7, on the heterostructural solar cell a protruding edge 9 is fitted with a mask 2, positioned on the holder with pins. The inner inclined wall 10 of the mask 2 makes it possible to avoid material non-dusting in places close to the insulating edge (provided with mask 2) on the heterostructural solar cell. The inclination of the inner inclined wall 10 is approximately 45 °. The protruding edge 9 has a vertical wall 11 in contact with the inner wall 12 of the raised upper part 8 (Fig. 2, 3).

The holder 1 and the mask 2, generally rectangular in shape, have beveled corners (Fig. 1, 4), designed to reduce the total area occupied by the snap on the rotating table.

The size of the tooling is approximately 175 × 175 × 10 mm. The equipment can be made of anti-corrosion steel, aluminum or aluminum alloys.

Claims (7)

1. Equipment substrate holder for applying contacts to heterostructural solar cells in orbital magnetron systems, containing the holder and mask, characterized in that the rectangular holder and the mask are made with holes for the guide pins, orienting the mask on the holder, and grooves for positioning the snap on the magnetron loading robot systems, with the corners of the said holder and the mask made oblique, while the holder has openings for vacuum air pumping, on the front side rzhatel formed with a raised upper portion and a recessed seat for heterostructure solar cell, bounded by an internal wall of said raised upper portion and on the rear side of the carrier a recess, moreover, the mask contains an inner inclined wall and a protruding edge adjacent to the inner inclined wall, wherein the vertical wall of said protruding edge is made in contact with the inner wall of the raised upper part of the holder. 2. Equipment under item 1, characterized in that the recess on the back side of the holder is made in the form of trapezoidal cutouts. 3. Equipment under item 1, characterized in that the size of the recess on the back side is smaller than the size of the seat on the front side of the holder. 4. Equipment under item 1, characterized in that it is made with the possibility of touching in working condition the raised upper part of the holder with the mask. 5. Equipment under item 1, characterized in that the inclination of the inner inclined wall of the mask is 45 °.

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