CN113977090B - Supporting table for processing display panel - Google Patents
Supporting table for processing display panel Download PDFInfo
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- CN113977090B CN113977090B CN202111321932.2A CN202111321932A CN113977090B CN 113977090 B CN113977090 B CN 113977090B CN 202111321932 A CN202111321932 A CN 202111321932A CN 113977090 B CN113977090 B CN 113977090B
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- substrate
- display panel
- support
- base layer
- supporting table
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- 239000000758 substrate Substances 0.000 claims abstract description 78
- 238000000034 method Methods 0.000 claims abstract description 20
- 230000008569 process Effects 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000001179 sorption measurement Methods 0.000 claims description 5
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 abstract description 15
- 230000003749 cleanliness Effects 0.000 abstract description 6
- 238000010586 diagram Methods 0.000 description 7
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000004590 computer program Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
Abstract
The embodiment of the disclosure provides a supporting table for processing a display panel, comprising: a base layer, and a plurality of support structures disposed on the base layer; the support body structure is arranged on a corresponding first basal layer area of the first substrate area, and is used for being supported on a substrate of the display panel in the process of processing the display panel, wherein the first substrate area is other substrate areas which are not divided into the display panel areas on the substrate. According to the supporting table for implementing the force, the substrate of the display panel can be turned 180 degrees by the existing processing mode, the downward processing of the cathode area which cannot be placed downwards originally is realized, the particles generated in the processing process can be received by the supporting table, fall on the supporting table, stay in the space enclosed by the supporting table and the substrate, cannot move in the whole vacuum chamber, the cleanliness of the vacuum chamber is guaranteed, and the yield and reliability of products are improved.
Description
Technical Field
The disclosure relates to the field of display, and in particular relates to a supporting table for processing a display panel.
Background
In the display of an OLED, the cathode component is typically Mg/Ag, which is good in conductivity but relatively low in transmittance, which is clearly detrimental to the off-screen fingerprint or off-screen camera, especially the off-screen camera technology, and therefore requires Pattern processing of the cathode.
In the scheme adopted at present, a laser mode is generally utilized to burn off the cathode region to be removed, the mode can improve the transmittance of a screen to the greatest extent, and the Pattern treatment of the high PPI (pixel density) cathode can be realized.
However, in the related art, the back side laser is used to remove the Cathode in a Face-up manner, and as shown in fig. 1, a back side laser is used, that is, a glass substrate (Galss layer) is supported by a support table, and a Cathode layer (Cathode/CPL layer) is disposed on the upper side of the glass substrate and laser processing is performed from the glass substrate side. The processing process is simple, but particles are generated in the laser processing process, so that the cleanliness of the vacuum chamber is seriously affected, the particles are attached to the product, the product yield is reduced, and the reliability of the product is reduced.
Disclosure of Invention
In view of this, the embodiment of the disclosure provides a supporting table for processing a display panel, which is used for solving the following problems in the prior art: in the process of processing the cathode by laser, particles can be generated, the cleanliness of the vacuum chamber is seriously affected, the particles are attached to the product, the yield of the product is reduced, and the reliability of the product is reduced.
In one aspect, an embodiment of the present disclosure provides a supporting table for processing a display panel, including: a base layer, and a plurality of support structures disposed on the base layer; the support body structure is arranged on a corresponding first basal layer area of the first substrate area and is used for being supported on a substrate of the display panel in the process of processing the display panel, wherein the first substrate area is other substrate areas which are not divided into display panel areas on the substrate.
In some embodiments, an end of the support structure in contact with the substrate is disposed in a groove structure or a planar structure relative to the substrate.
In some embodiments, other first base layer regions of the base layer on which the support structure is not disposed are disposed in a groove structure relative to the substrate.
In some embodiments, a second base layer region on the base layer corresponding to the display panel region is disposed in a groove structure relative to the substrate.
In some embodiments, the groove structure is provided with one or more through holes.
In some embodiments, the electrostatic adsorbing layer is disposed on the other first substrate layer region on which the support structure is not disposed and/or the second substrate layer region corresponding to the display panel region.
In some embodiments, at least one support structure is disposed in each of the gap regions between adjacent display panel regions.
In some embodiments, the cross-sectional shape of the support structure includes at least one of: round, triangular, square.
In some embodiments, the base layer and the support structure are both the same material as the substrate.
In some embodiments, the material of the base layer and the support structure is silicon dioxide.
In another aspect, embodiments of the present disclosure provide a method of
In some embodiments of the present invention, in some embodiments,
in another aspect, an embodiment of the present disclosure proposes a storage medium storing a computer program that, when executed by a processor, implements a method provided by any embodiment of the present disclosure.
In another aspect, an embodiment of the present disclosure provides an electronic device, including at least a memory, and a processor, where the memory stores a computer program, and the processor implements a method provided by any embodiment of the present disclosure when executing the computer program on the memory.
According to the supporting table for implementing the force, the substrate of the display panel can be turned 180 degrees by the existing processing mode, the downward processing of the cathode area which cannot be placed downwards originally is realized, the particles generated in the processing process can be received by the supporting table, fall on the supporting table, stay in the space enclosed by the supporting table and the substrate, cannot move in the whole vacuum chamber, the cleanliness of the vacuum chamber is guaranteed, and the yield and reliability of products are improved.
Drawings
In order to more clearly illustrate the embodiments of the present disclosure or the technical solutions in the prior art, the drawings that are required to be used in the embodiments or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments described in the present disclosure, and other drawings may be obtained according to these drawings without inventive effort to a person of ordinary skill in the art.
FIG. 1 is a schematic diagram of a related art process using a Face-up mode;
FIG. 2 is a schematic diagram of a substrate of a display panel according to the related art;
FIG. 3 is a schematic cross-sectional view of a supporting table for processing a display panel according to an embodiment of the disclosure;
fig. 4 is a schematic view of a projection of a support structure on a substrate of a display panel according to an embodiment of the disclosure;
FIG. 5 is a schematic diagram of a supporting platform and a substrate of a display panel according to an embodiment of the disclosure;
FIG. 6 is a schematic diagram of a supporting table with a groove structure and a substrate of a display panel according to an embodiment of the disclosure;
FIG. 7 is a schematic diagram of a related art cathode region evaporation process;
fig. 8 is a schematic perspective view of a support table for processing a display panel according to an embodiment of the present disclosure.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present disclosure more apparent, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present disclosure. It will be apparent that the described embodiments are some, but not all, of the embodiments of the present disclosure. All other embodiments, which can be made by one of ordinary skill in the art without the need for inventive faculty, are within the scope of the present disclosure, based on the described embodiments of the present disclosure.
Unless defined otherwise, technical or scientific terms used in this disclosure should be given the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. The terms "first," "second," and the like, as used in this disclosure, do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that elements or items preceding the word are included in the element or item listed after the word and equivalents thereof, but does not exclude other elements or items. The terms "connected" or "connected," and the like, are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", etc. are used merely to indicate relative positional relationships, which may also be changed when the absolute position of the object to be described is changed.
In order to keep the following description of the embodiments of the present disclosure clear and concise, the present disclosure omits detailed description of known functions and known components.
In order to avoid the pollution of the vacuum chamber caused by the particles generated during the processing as much as possible, the embodiment of the disclosure is intended to process in a Face-down mode (i.e. the substrate of fig. 1 is turned 180 degrees over) opposite to the Face-up mode, but because of the gravity of the substrate of the display panel (i.e. the whole panel shown in fig. 2, i.e. the 6G Half in the industry, each small area is the processing area corresponding to the display panel), the substrate plate sags seriously, so that a special processing support table is required to support the substrate plate to avoid the sagging problem as much as possible, and the price of the support table is also required to be capable of meeting the requirement of mass production.
The embodiment of the disclosure provides a supporting table for processing a display panel, the schematic cross-sectional structure of which is shown in fig. 3, comprising:
a base layer 1, and a plurality of support structures 2 disposed on the base layer; the support body structure is arranged on a corresponding first basal layer area of the first substrate area, and is used for being supported on a substrate of the display panel in the process of processing the display panel, wherein the first substrate area is other substrate areas which are not divided into the display panel areas on the substrate.
The other substrate region may be an edge region of the substrate which is not divided into the display panel regions, a gap region between the display panel regions of the substrate, or both the edge region and the gap region. When the support structure is specifically arranged, the support structure can be arranged in the edge area and the gap area, so that better support performance is achieved.
In a preferred embodiment, at least one support structure may be provided in the gap area between adjacent display panel areas, for example as shown in fig. 4, which is a schematic view of a projection of the support structure onto the substrate of the display panel, where solid circles represent projections of the support structure, and as can be seen in fig. 4, each display panel has one support structure in the gap area in the longitudinal direction of its adjacent display panel.
Fig. 5 shows a schematic diagram of the supporting table and the substrate of the display panel in cooperation, and it can be seen from the figure that the processing mode of the display panel is changed from the existing Face-up mode to the Face-down mode, that is, the whole substrate of fig. 1 is turned 180 degrees, at this time, when the laser processing is performed from the substrate side to the supporting table side according to the mode of fig. 1, the supporting table can catch particles generated in the processing process, the particles fall on the supporting table, stay in a space enclosed by the supporting table and the substrate, and do not move in the whole vacuum chamber, so that the cleanliness of the vacuum chamber is ensured.
According to the supporting table for implementing the force, the substrate of the display panel can be turned 180 degrees by the existing processing mode, the downward processing of the cathode area which cannot be placed downwards originally is realized, the particles generated in the processing process can be received by the supporting table, fall on the supporting table, stay in the space enclosed by the supporting table and the substrate, cannot move in the whole vacuum chamber, the cleanliness of the vacuum chamber is guaranteed, and the yield and reliability of products are improved.
In particular, in order to ensure that the stress is small when the substrate is in contact with the support structure, the end of the support structure in contact with the substrate may be configured differently from fig. 1, i.e. in a groove structure or a planar structure with respect to the substrate.
In a preferred embodiment, the other first base layer areas of the base layer on which the support structure is not provided may also be provided with a groove structure in relation to the substrate, thereby increasing the space and surface area inside the support table for facilitating the adsorption of particles.
In order to further increase the space and surface area inside the support table, a second base layer region corresponding to the display panel region on the base layer may also be provided in a groove structure with respect to the substrate, and fig. 6 shows a schematic diagram of the support table with the groove structure used in cooperation with the substrate of the display panel.
One or more through holes may also be provided in the groove structure, since the processing is always in a vacuum-pumped state in the vacuum chamber, so that particles deposited on the groove structure may be pumped out of the through holes.
In order to further firmly adsorb the particles, an electrostatic adsorption layer may be further disposed on other first substrate layer regions where no support structure is disposed on the substrate layer and/or on a second substrate layer region corresponding to the display panel region, where the electrostatic adsorption layer may be a conductive film layer, a conductive adhesive, or the like, so as to further adsorb the particles by static electricity.
The cross-sectional shape of the support structure may be circular in fig. 4, but of course, may be triangular, square, etc. other shapes, which are not illustrated herein, and may be set by those skilled in the art according to actual needs.
As shown in fig. 7, which is a schematic view of the evaporation process of the cathode region, it can be seen from the figure that the substrate is at the uppermost side during the evaporation of the cathode region, so that, in order to simplify the processing process, the materials of the base layer and the support structure may be the same as those of the substrate (in particular, in the case of implementation, the materials of the base layer and the support structure may be the same or different, and in order to be consistent with the substrate, the materials are the same here, for example, silicon dioxide, the substrate is a glass substrate, the support table is a glass support table, and further laser processing from the support table side to the substrate side can be realized, so that the processing process is simplified, the cost of the support table is also ensured to be low, and large-scale industrial production is facilitated.
As shown in fig. 8, which is a schematic perspective view of the support table, the embodiment of the disclosure is based on a laser cathode patterning manner, so as to provide a new design scheme (i.e. the support table) of a low-cost support Mask, wherein the raised support structure matches the gaps between the edges of the 6G Half and the Cell (each display panel); the material of the supporting table is common Glass (SiO 2 ) The material has the effect of high transmittance and has no influence on the laser removal of the cathode; the cost is low, and the large-scale commercial production is easy; the sagging of the 6G Half Glass can be effectively avoided; and is also beneficial to the control of Particle.
Furthermore, although exemplary embodiments have been described herein, the scope thereof includes any and all embodiments having equivalent elements, modifications, omissions, combinations (e.g., of the various embodiments across schemes), adaptations or alterations based on the present disclosure. Elements in the claims are to be construed broadly based on the language employed in the claims and are not limited to examples described in the present specification or during the practice of the present application, which examples are to be construed as non-exclusive. It is intended, therefore, that the specification and examples be considered as exemplary only, with a true scope and spirit being indicated by the following claims and their full scope of equivalents.
The above description is intended to be illustrative and not restrictive. For example, the above-described examples (or one or more aspects thereof) may be used in combination with each other. For example, other embodiments may be used by those of ordinary skill in the art upon reading the above description. In addition, in the above detailed description, various features may be grouped together to streamline the disclosure. This is not to be interpreted as an intention that the disclosed features not being claimed are essential to any claim. Rather, the disclosed subject matter may include less than all of the features of a particular disclosed embodiment. Thus, the following claims are hereby incorporated into the detailed description as examples or embodiments, with each claim standing on its own as a separate embodiment, and it is contemplated that these embodiments may be combined with one another in various combinations or permutations. The scope of the disclosure should be determined with reference to the appended claims, along with the full scope of equivalents to which such claims are entitled.
While various embodiments of the present disclosure have been described in detail, the present disclosure is not limited to these specific embodiments, and various modifications and embodiments can be made by those skilled in the art on the basis of the concepts of the present disclosure, and these modifications and modifications should be within the scope of the present disclosure as claimed.
Claims (7)
1. A support table for processing a display panel, comprising:
a base layer, and a plurality of support structures disposed on the base layer;
the support body structure is arranged on a corresponding first basal layer area of a first substrate area and is used for being supported on a substrate of the display panel in the process of processing the display panel, wherein the first substrate area is other substrate areas which are not divided into display panel areas on the substrate;
other first base layer areas on the base layer, on which the support structure is not arranged, are arranged in a groove structure relative to the substrate; one or more through holes are formed in the groove structure; an electrostatic adsorption layer is arranged on other first substrate layer areas on the substrate layer, wherein the other first substrate layer areas are not provided with the support body structures, and/or a second substrate layer area corresponding to the display panel area is provided with the electrostatic adsorption layer;
the supporting table is a glass supporting table, laser processing can be achieved from the supporting table to the substrate side, and the supporting body structure is matched with gaps between display panel areas on the substrate.
2. The support table of claim 1, wherein an end of the support structure in contact with the substrate is disposed in a groove structure or a planar structure relative to the substrate.
3. The support table of claim 1, wherein a second base layer region on the base layer corresponding to the display panel region is provided in a groove structure with respect to the substrate.
4. The support table of claim 1, wherein at least one support structure is disposed in each of the gap regions between adjacent display panel regions.
5. The support table of claim 1, wherein the cross-sectional shape of the support body structure comprises at least one of: round, triangular, square.
6. The support table of claim 1, wherein the base layer and the support structure are both the same material as the substrate.
7. The support table of claim 1, wherein the base layer and the support structure are both silicon dioxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111321932.2A CN113977090B (en) | 2021-11-09 | 2021-11-09 | Supporting table for processing display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111321932.2A CN113977090B (en) | 2021-11-09 | 2021-11-09 | Supporting table for processing display panel |
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| Publication Number | Publication Date |
|---|---|
| CN113977090A CN113977090A (en) | 2022-01-28 |
| CN113977090B true CN113977090B (en) | 2024-04-05 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202111321932.2A Active CN113977090B (en) | 2021-11-09 | 2021-11-09 | Supporting table for processing display panel |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102284789A (en) * | 2011-07-27 | 2011-12-21 | 苏州德龙激光有限公司 | Device and method for performing laser etching on organic light emitting diode (OLED) display cathode film material |
| CN102687066A (en) * | 2010-01-12 | 2012-09-19 | 夏普株式会社 | Liquid crystal display device and manufacturing method therefor |
| CN102854628A (en) * | 2012-09-25 | 2013-01-02 | 京东方科技集团股份有限公司 | Display device and manufacturing method thereof |
| CN108711592A (en) * | 2018-05-23 | 2018-10-26 | 京东方科技集团股份有限公司 | A kind of display base plate and preparation method thereof, display device and preparation method thereof |
-
2021
- 2021-11-09 CN CN202111321932.2A patent/CN113977090B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102687066A (en) * | 2010-01-12 | 2012-09-19 | 夏普株式会社 | Liquid crystal display device and manufacturing method therefor |
| CN102284789A (en) * | 2011-07-27 | 2011-12-21 | 苏州德龙激光有限公司 | Device and method for performing laser etching on organic light emitting diode (OLED) display cathode film material |
| CN102854628A (en) * | 2012-09-25 | 2013-01-02 | 京东方科技集团股份有限公司 | Display device and manufacturing method thereof |
| CN108711592A (en) * | 2018-05-23 | 2018-10-26 | 京东方科技集团股份有限公司 | A kind of display base plate and preparation method thereof, display device and preparation method thereof |
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| Publication number | Publication date |
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| CN113977090A (en) | 2022-01-28 |
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