PT3138655T - Estação ótica para troca de elementos óticos - Google Patents

Estação ótica para troca de elementos óticos

Info

Publication number
PT3138655T
PT3138655T PT15002577T PT15002577T PT3138655T PT 3138655 T PT3138655 T PT 3138655T PT 15002577 T PT15002577 T PT 15002577T PT 15002577 T PT15002577 T PT 15002577T PT 3138655 T PT3138655 T PT 3138655T
Authority
PT
Portugal
Prior art keywords
optical
exchanging
station
elements
optical elements
Prior art date
Application number
PT15002577T
Other languages
English (en)
Inventor
Vianen Job
Arie Van Ooik Gerrit
Van Der Does Marius
Petrus Francis Noijen Ralf
Original Assignee
Asm Tech Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asm Tech Singapore Pte Ltd filed Critical Asm Tech Singapore Pte Ltd
Publication of PT3138655T publication Critical patent/PT3138655T/pt

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10007Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
    • H01S3/10023Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/362Laser etching
    • B23K26/364Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/40Removing material taking account of the properties of the material involved
    • B23K26/402Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10Scanning systems
    • G02B26/101Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/14Mountings, adjusting means, or light-tight connections, for optical elements for lenses adapted to interchange lenses
    • G02B7/16Rotatable turrets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/023Mount members, e.g. sub-mount members
    • H01S5/02325Mechanically integrated components on mount members or optical micro-benches
    • H01S5/02326Arrangements for relative positioning of laser diodes and optical components, e.g. grooves in the mount to fix optical fibres or lenses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/40Semiconductor devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/56Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Laser Beam Processing (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Dicing (AREA)
PT15002577T 2015-09-02 2015-09-02 Estação ótica para troca de elementos óticos PT3138655T (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP15002577.3A EP3138655B1 (en) 2015-09-02 2015-09-02 Optical station for exchanging optical elements

Publications (1)

Publication Number Publication Date
PT3138655T true PT3138655T (pt) 2018-11-15

Family

ID=54106081

Family Applications (1)

Application Number Title Priority Date Filing Date
PT15002577T PT3138655T (pt) 2015-09-02 2015-09-02 Estação ótica para troca de elementos óticos

Country Status (8)

Country Link
US (1) US11322374B2 (pt)
EP (1) EP3138655B1 (pt)
JP (1) JP6240281B2 (pt)
KR (1) KR102245355B1 (pt)
CN (1) CN106486354B (pt)
PT (1) PT3138655T (pt)
SG (1) SG10201606630RA (pt)
TW (1) TWI613025B (pt)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11243114B2 (en) 2018-09-17 2022-02-08 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Method for determining at least one beam propagation parameter of a laser beam

Family Cites Families (26)

* Cited by examiner, † Cited by third party
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JPS51119693U (pt) * 1975-03-25 1976-09-28
US4661680A (en) * 1985-06-28 1987-04-28 Westinghouse Electric Corp. End-of-arm tooling carousel apparatus for use with a robot
JP2918938B2 (ja) * 1989-11-15 1999-07-12 オリンパス光学工業株式会社 顕微鏡用ターレットコンデンサー
JP3463335B2 (ja) * 1994-02-17 2003-11-05 株式会社ニコン 投影露光装置
TW318255B (pt) * 1995-05-30 1997-10-21 Philips Electronics Nv
US6323995B1 (en) * 1998-03-17 2001-11-27 Olympus Optical Co., Ltd. Optical element switching device and optical microscope loaded with the device
DE19944484C1 (de) * 1999-09-16 2001-04-19 Precitec Gmbh Wechselvorrichtung für einen Linsenhalter eines Anschlusskopfs zur Bearbeitung eines Werkstücks mittels eines Laserstrahls
JP4127601B2 (ja) * 2001-03-09 2008-07-30 株式会社東芝 レーザ加工装置
JP3678416B2 (ja) * 2002-03-29 2005-08-03 富士写真フイルム株式会社 撮影装置
US8968279B2 (en) * 2003-03-06 2015-03-03 Amo Manufacturing Usa, Llc Systems and methods for qualifying and calibrating a beam delivery system
JP2005334921A (ja) * 2004-05-26 2005-12-08 Yamazaki Mazak Corp レーザ加工機におけるノズルチェンジマガジン
US7724351B2 (en) * 2006-01-30 2010-05-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and exchangeable optical element
JP5026027B2 (ja) * 2006-08-29 2012-09-12 ヤマザキマザック株式会社 レーザ加工機の自動工具交換装置
EP2078585B1 (de) * 2008-01-12 2015-03-04 Trumpf Maschinen AG Maschinelle Vorrichtung zur Montage und/oder zur Demontage einer Laserdüse sowie Laserbearbeitungsmaschine mit einer derartigen maschinellen Vorrichtung
DE502008000563D1 (de) * 2008-01-12 2010-06-02 Trumpf Maschinen Ag Maschinelle Vorrichtung zur Montage und/oder zur Demontage einer Laserdüse sowie Laserbearbeitungsmaschine mit einer derartigen maschinellen Vorrichtung
US8223428B2 (en) * 2008-07-04 2012-07-17 Olympus Corporation Microscope
PT2414131E (pt) * 2009-03-30 2015-09-04 Boegli Gravures Sa Método e dispositivo para a estruturação de uma superfície de um corpo sólido com um revestimento duro com o auxílio de um laser utilizando máscara e diafragma
DE202009006589U1 (de) * 2009-05-06 2009-08-27 Mauser-Werke Oberndorf Maschinenbau Gmbh Laserstation und Laseranlage
JP5620669B2 (ja) * 2009-10-26 2014-11-05 東芝機械株式会社 レーザダイシング方法およびレーザダイシング装置
JP2012170985A (ja) * 2011-02-22 2012-09-10 Disco Corp レーザ加工装置
US8830583B2 (en) * 2011-02-28 2014-09-09 Hoya Corporation Position controller for removable optical element
EP2589458B1 (de) * 2011-11-07 2014-08-06 Trumpf Maschinen AG Düsenaufnahme, Düsenwechsler und Laserbearbeitungsmaschine
JP5950674B2 (ja) * 2012-04-25 2016-07-13 株式会社ディスコ 光軸確認治具
EP2674238B1 (en) * 2012-06-15 2017-09-27 Agie Charmilles New Technologies SA Laser machine comprising a tool holder with guiding and locking system
LT6046B (lt) * 2012-10-22 2014-06-25 Uab "Lidaris" Justiruojamų optinių laikiklių pakeitimo įrenginys ir sistema, turinti tokių įrenginių
TWM526226U (zh) * 2016-03-18 2016-07-21 Eastern Logic Inc 雷射打標控制器

Also Published As

Publication number Publication date
CN106486354B (zh) 2019-04-12
CN106486354A (zh) 2017-03-08
SG10201606630RA (en) 2017-04-27
TWI613025B (zh) 2018-02-01
EP3138655B1 (en) 2018-08-08
TW201710008A (zh) 2017-03-16
EP3138655A1 (en) 2017-03-08
KR102245355B1 (ko) 2021-04-30
US20170062247A1 (en) 2017-03-02
US11322374B2 (en) 2022-05-03
JP6240281B2 (ja) 2017-11-29
JP2017050538A (ja) 2017-03-09
KR20170027672A (ko) 2017-03-10

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