PT3138655T - Estação ótica para troca de elementos óticos - Google Patents
Estação ótica para troca de elementos óticosInfo
- Publication number
- PT3138655T PT3138655T PT15002577T PT15002577T PT3138655T PT 3138655 T PT3138655 T PT 3138655T PT 15002577 T PT15002577 T PT 15002577T PT 15002577 T PT15002577 T PT 15002577T PT 3138655 T PT3138655 T PT 3138655T
- Authority
- PT
- Portugal
- Prior art keywords
- optical
- exchanging
- station
- elements
- optical elements
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
- H01S3/10023—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/14—Mountings, adjusting means, or light-tight connections, for optical elements for lenses adapted to interchange lenses
- G02B7/16—Rotatable turrets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/023—Mount members, e.g. sub-mount members
- H01S5/02325—Mechanically integrated components on mount members or optical micro-benches
- H01S5/02326—Arrangements for relative positioning of laser diodes and optical components, e.g. grooves in the mount to fix optical fibres or lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Laser Beam Processing (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Dicing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP15002577.3A EP3138655B1 (en) | 2015-09-02 | 2015-09-02 | Optical station for exchanging optical elements |
Publications (1)
Publication Number | Publication Date |
---|---|
PT3138655T true PT3138655T (pt) | 2018-11-15 |
Family
ID=54106081
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PT15002577T PT3138655T (pt) | 2015-09-02 | 2015-09-02 | Estação ótica para troca de elementos óticos |
Country Status (8)
Country | Link |
---|---|
US (1) | US11322374B2 (pt) |
EP (1) | EP3138655B1 (pt) |
JP (1) | JP6240281B2 (pt) |
KR (1) | KR102245355B1 (pt) |
CN (1) | CN106486354B (pt) |
PT (1) | PT3138655T (pt) |
SG (1) | SG10201606630RA (pt) |
TW (1) | TWI613025B (pt) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11243114B2 (en) | 2018-09-17 | 2022-02-08 | Trumpf Lasersystems For Semiconductor Manufacturing Gmbh | Method for determining at least one beam propagation parameter of a laser beam |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51119693U (pt) * | 1975-03-25 | 1976-09-28 | ||
US4661680A (en) * | 1985-06-28 | 1987-04-28 | Westinghouse Electric Corp. | End-of-arm tooling carousel apparatus for use with a robot |
JP2918938B2 (ja) * | 1989-11-15 | 1999-07-12 | オリンパス光学工業株式会社 | 顕微鏡用ターレットコンデンサー |
JP3463335B2 (ja) * | 1994-02-17 | 2003-11-05 | 株式会社ニコン | 投影露光装置 |
TW318255B (pt) * | 1995-05-30 | 1997-10-21 | Philips Electronics Nv | |
US6323995B1 (en) * | 1998-03-17 | 2001-11-27 | Olympus Optical Co., Ltd. | Optical element switching device and optical microscope loaded with the device |
DE19944484C1 (de) * | 1999-09-16 | 2001-04-19 | Precitec Gmbh | Wechselvorrichtung für einen Linsenhalter eines Anschlusskopfs zur Bearbeitung eines Werkstücks mittels eines Laserstrahls |
JP4127601B2 (ja) * | 2001-03-09 | 2008-07-30 | 株式会社東芝 | レーザ加工装置 |
JP3678416B2 (ja) * | 2002-03-29 | 2005-08-03 | 富士写真フイルム株式会社 | 撮影装置 |
US8968279B2 (en) * | 2003-03-06 | 2015-03-03 | Amo Manufacturing Usa, Llc | Systems and methods for qualifying and calibrating a beam delivery system |
JP2005334921A (ja) * | 2004-05-26 | 2005-12-08 | Yamazaki Mazak Corp | レーザ加工機におけるノズルチェンジマガジン |
US7724351B2 (en) * | 2006-01-30 | 2010-05-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and exchangeable optical element |
JP5026027B2 (ja) * | 2006-08-29 | 2012-09-12 | ヤマザキマザック株式会社 | レーザ加工機の自動工具交換装置 |
EP2078585B1 (de) * | 2008-01-12 | 2015-03-04 | Trumpf Maschinen AG | Maschinelle Vorrichtung zur Montage und/oder zur Demontage einer Laserdüse sowie Laserbearbeitungsmaschine mit einer derartigen maschinellen Vorrichtung |
DE502008000563D1 (de) * | 2008-01-12 | 2010-06-02 | Trumpf Maschinen Ag | Maschinelle Vorrichtung zur Montage und/oder zur Demontage einer Laserdüse sowie Laserbearbeitungsmaschine mit einer derartigen maschinellen Vorrichtung |
US8223428B2 (en) * | 2008-07-04 | 2012-07-17 | Olympus Corporation | Microscope |
PT2414131E (pt) * | 2009-03-30 | 2015-09-04 | Boegli Gravures Sa | Método e dispositivo para a estruturação de uma superfície de um corpo sólido com um revestimento duro com o auxílio de um laser utilizando máscara e diafragma |
DE202009006589U1 (de) * | 2009-05-06 | 2009-08-27 | Mauser-Werke Oberndorf Maschinenbau Gmbh | Laserstation und Laseranlage |
JP5620669B2 (ja) * | 2009-10-26 | 2014-11-05 | 東芝機械株式会社 | レーザダイシング方法およびレーザダイシング装置 |
JP2012170985A (ja) * | 2011-02-22 | 2012-09-10 | Disco Corp | レーザ加工装置 |
US8830583B2 (en) * | 2011-02-28 | 2014-09-09 | Hoya Corporation | Position controller for removable optical element |
EP2589458B1 (de) * | 2011-11-07 | 2014-08-06 | Trumpf Maschinen AG | Düsenaufnahme, Düsenwechsler und Laserbearbeitungsmaschine |
JP5950674B2 (ja) * | 2012-04-25 | 2016-07-13 | 株式会社ディスコ | 光軸確認治具 |
EP2674238B1 (en) * | 2012-06-15 | 2017-09-27 | Agie Charmilles New Technologies SA | Laser machine comprising a tool holder with guiding and locking system |
LT6046B (lt) * | 2012-10-22 | 2014-06-25 | Uab "Lidaris" | Justiruojamų optinių laikiklių pakeitimo įrenginys ir sistema, turinti tokių įrenginių |
TWM526226U (zh) * | 2016-03-18 | 2016-07-21 | Eastern Logic Inc | 雷射打標控制器 |
-
2015
- 2015-09-02 EP EP15002577.3A patent/EP3138655B1/en active Active
- 2015-09-02 PT PT15002577T patent/PT3138655T/pt unknown
-
2016
- 2016-08-08 TW TW105125089A patent/TWI613025B/zh active
- 2016-08-11 SG SG10201606630RA patent/SG10201606630RA/en unknown
- 2016-08-25 CN CN201610724427.5A patent/CN106486354B/zh active Active
- 2016-08-26 US US15/248,282 patent/US11322374B2/en active Active
- 2016-08-30 JP JP2016167656A patent/JP6240281B2/ja active Active
- 2016-09-01 KR KR1020160112418A patent/KR102245355B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
CN106486354B (zh) | 2019-04-12 |
CN106486354A (zh) | 2017-03-08 |
SG10201606630RA (en) | 2017-04-27 |
TWI613025B (zh) | 2018-02-01 |
EP3138655B1 (en) | 2018-08-08 |
TW201710008A (zh) | 2017-03-16 |
EP3138655A1 (en) | 2017-03-08 |
KR102245355B1 (ko) | 2021-04-30 |
US20170062247A1 (en) | 2017-03-02 |
US11322374B2 (en) | 2022-05-03 |
JP6240281B2 (ja) | 2017-11-29 |
JP2017050538A (ja) | 2017-03-09 |
KR20170027672A (ko) | 2017-03-10 |
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