PL4101009T3 - Środki powierzchniowo czynne dla elektroniki - Google Patents
Środki powierzchniowo czynne dla elektronikiInfo
- Publication number
- PL4101009T3 PL4101009T3 PL20842490.3T PL20842490T PL4101009T3 PL 4101009 T3 PL4101009 T3 PL 4101009T3 PL 20842490 T PL20842490 T PL 20842490T PL 4101009 T3 PL4101009 T3 PL 4101009T3
- Authority
- PL
- Poland
- Prior art keywords
- surfactants
- electronics
- Prior art date
Links
- 239000004094 surface-active agent Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
- C09K23/54—Silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/38—Cationic compounds
- C11D1/52—Carboxylic amides, alkylolamides or imides or their condensation products with alkylene oxides
- C11D1/528—Carboxylic amides (R1-CO-NR2R3), where at least one of the chains R1, R2 or R3 is interrupted by a functional group, e.g. a -NH-, -NR-, -CO-, or -CON- group
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2003—Alcohols; Phenols
- C11D3/2065—Polyhydric alcohols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/34—Organic compounds containing sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0041—Photosensitive materials providing an etching agent upon exposure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/703—Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Detergent Compositions (AREA)
- Weting (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202062970356P | 2020-02-05 | 2020-02-05 | |
| PCT/US2020/066031 WO2021158301A1 (en) | 2020-02-05 | 2020-12-18 | Surfactants for electronics |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL4101009T3 true PL4101009T3 (pl) | 2024-08-19 |
Family
ID=74186950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL20842490.3T PL4101009T3 (pl) | 2020-02-05 | 2020-12-18 | Środki powierzchniowo czynne dla elektroniki |
Country Status (15)
| Country | Link |
|---|---|
| US (2) | US11427760B2 (pl) |
| EP (1) | EP4101009B1 (pl) |
| JP (1) | JP7538235B2 (pl) |
| KR (1) | KR102689854B1 (pl) |
| CN (1) | CN115428169B (pl) |
| AU (1) | AU2020427412B2 (pl) |
| BR (1) | BR112022015536A2 (pl) |
| CA (1) | CA3165634A1 (pl) |
| DK (1) | DK4101009T3 (pl) |
| ES (1) | ES2988486T3 (pl) |
| FI (1) | FI4101009T3 (pl) |
| MX (1) | MX2022009562A (pl) |
| PL (1) | PL4101009T3 (pl) |
| SA (1) | SA522440059B1 (pl) |
| WO (1) | WO2021158301A1 (pl) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MX2022002204A (es) * | 2019-08-22 | 2022-03-11 | Advansix Resins & Chemicals Llc | Derivados de siloxano de aminoacidos que tienen propiedades activas de superficie. |
| US11905304B2 (en) | 2019-12-19 | 2024-02-20 | Advansix Resins & Chemicals Llc | Surfactants for agricultural products |
| WO2021126715A1 (en) | 2019-12-19 | 2021-06-24 | Advansix Resins & Chemicals Llc | Surfactants for inks, paints, and adhesives |
| JP7416952B2 (ja) | 2019-12-19 | 2024-01-17 | アドバンシックス・レジンズ・アンド・ケミカルズ・リミテッド・ライアビリティ・カンパニー | パーソナルケア製品及び化粧製品における使用のための界面活性剤 |
| MY197388A (en) * | 2019-12-20 | 2023-06-15 | Advansix Resins & Chemicals Llc | Surfactants for cleaning products |
| JP7346744B2 (ja) | 2019-12-20 | 2023-09-19 | アドバンシックス・レジンズ・アンド・ケミカルズ・リミテッド・ライアビリティ・カンパニー | ヘルスケア製品における使用のための界面活性剤 |
| KR102701098B1 (ko) | 2019-12-31 | 2024-08-29 | 어드밴식스 레진즈 앤드 케미컬즈 엘엘씨 | 오일 및 가스 생산을 위한 계면활성제 |
| PL4101009T3 (pl) * | 2020-02-05 | 2024-08-19 | Advansix Resins & Chemicals Llc | Środki powierzchniowo czynne dla elektroniki |
| CA3244109A1 (en) | 2022-02-23 | 2023-08-31 | Advansix Resins & Chemicals Llc | SILOXANE DERIVATIVES OF AMINO ACIDS HAVING SURFACE-ACTIVATING PROPERTIES |
| US20250059395A1 (en) * | 2023-08-07 | 2025-02-20 | Advansix Resins & Chemicals Llc | Surfactants for inks, paints, and adhesives |
| WO2025034841A1 (en) * | 2023-08-07 | 2025-02-13 | Advansix Resins & Chemicals Llc | Surfactants for electronics |
| CN117434802B (zh) * | 2023-10-24 | 2025-10-03 | 福建钰融科技有限公司 | 用于tft-lcd的长寿命多制程兼容性水系剥离液、制备和应用 |
Family Cites Families (53)
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|---|---|---|---|---|
| US3624120A (en) | 1969-12-22 | 1971-11-30 | Procter & Gamble | Quaternary ammonium salts of cyclic siloxane polymers |
| AT330930B (de) | 1973-04-13 | 1976-07-26 | Henkel & Cie Gmbh | Verfahren zur herstellung von festen, schuttfahigen wasch- oder reinigungsmitteln mit einem gehalt an calcium bindenden substanzen |
| US4605509A (en) | 1973-05-11 | 1986-08-12 | The Procter & Gamble Company | Detergent compositions containing sodium aluminosilicate builders |
| DE2433485A1 (de) | 1973-07-16 | 1975-02-06 | Procter & Gamble | Zur verwendung in waschmitteln geeignete aluminosilikat-ionenaustauscher |
| US3929678A (en) | 1974-08-01 | 1975-12-30 | Procter & Gamble | Detergent composition having enhanced particulate soil removal performance |
| DE3413571A1 (de) | 1984-04-11 | 1985-10-24 | Hoechst Ag, 6230 Frankfurt | Verwendung von kristallinen schichtfoermigen natriumsilikaten zur wasserenthaertung und verfahren zur wasserenthaertung |
| DE3930344A1 (de) | 1989-09-12 | 1991-03-14 | Merck Patent Gmbh | Silanderivate |
| US5041590A (en) | 1990-01-04 | 1991-08-20 | Dow Corning Corporation | Quaternary ammonium functional siloxane surfactants |
| JP3772456B2 (ja) * | 1997-04-23 | 2006-05-10 | 三菱電機株式会社 | 太陽電池及びその製造方法、半導体製造装置 |
| ES2221453T3 (es) | 1998-10-30 | 2004-12-16 | Merck Patent Gmbh | Procedimiento para la preparacion de luteolina y derivados de luteolina. |
| US6013683A (en) | 1998-12-17 | 2000-01-11 | Dow Corning Corporation | Single phase silicone and water compositions |
| US6521580B2 (en) | 2000-02-22 | 2003-02-18 | General Electric Company | Siloxane dry cleaning composition and process |
| US20090257968A1 (en) * | 2004-03-25 | 2009-10-15 | Richard Walton | Gels containing anionic surfactants and coupling agents |
| EP1773849A4 (en) | 2004-07-02 | 2009-12-02 | Honeywell Int Inc | FUNCTIONALIZED SILICON CONNECTIONS |
| US7632796B2 (en) * | 2005-10-28 | 2009-12-15 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
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| DE102005056620A1 (de) | 2005-11-25 | 2007-06-06 | Merck Patent Gmbh | Amphiphile Silane |
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| GB0611217D0 (en) | 2006-06-08 | 2006-07-19 | Dow Corning | Amino-acid functional siloxanes,methods of preparation and applications |
| US20080152540A1 (en) | 2006-12-22 | 2008-06-26 | Bausch & Lomb Incorporated | Packaging solutions |
| US20090173912A1 (en) | 2007-12-26 | 2009-07-09 | Momentive Performance Materials Inc. | Mixtures of hydrolysis resistant organomodified trisiloxane ionic surfactants |
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| JP5760921B2 (ja) | 2010-10-14 | 2015-08-12 | 信越化学工業株式会社 | アミノ酸変性オルガノポリシロキサンの製造方法 |
| US20120295447A1 (en) | 2010-11-24 | 2012-11-22 | Air Products And Chemicals, Inc. | Compositions and Methods for Texturing of Silicon Wafers |
| FI127433B (fi) | 2011-06-14 | 2018-05-31 | Pibond Oy | Menetelmä siloksaanimonomeerien syntetisoimiseksi sekä näiden käyttö |
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| CN102614808B (zh) | 2012-03-08 | 2013-11-20 | 齐齐哈尔大学 | 以低碳链缩水甘油醚为连接基的乙酰胺二聚三硅氧烷表面活性剂的制备方法 |
| FR3001144B1 (fr) * | 2013-01-18 | 2015-07-17 | Oreal | Composition cosmetique solide souple comprenant des tensioactifs anioniques et des agents conditionneurs polymeriques, et procede de traitement cosmetique |
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| KR20150108143A (ko) * | 2014-03-17 | 2015-09-25 | 동우 화인켐 주식회사 | 결정성 실리콘 웨이퍼의 텍스쳐 에칭액 조성물 및 텍스쳐 에칭방법 |
| CN104826140B (zh) | 2015-04-08 | 2018-07-03 | 中山大学 | 一种载药硅脂质超声造影剂的制备方法和应用 |
| US9816026B2 (en) | 2015-05-26 | 2017-11-14 | Baker Hughes, LLC | Methods of extracting hydrocarbons from subterranean formations |
| JP2017105753A (ja) | 2015-12-04 | 2017-06-15 | 信越化学工業株式会社 | 両末端に異なる官能基を有する直鎖オルガノポリシロキサン、及びその製造方法 |
| US10829718B2 (en) | 2016-04-27 | 2020-11-10 | Dow Silicones Corporation | Detergent composition comprising a carbinol functional trisiloxane |
| US10577533B2 (en) | 2016-08-28 | 2020-03-03 | Linde Aktiengesellschaft | Unconventional enhanced oil recovery |
| JP6990982B2 (ja) | 2017-04-10 | 2022-01-12 | 信越化学工業株式会社 | ポリシロキサンモノマー及びその製造方法 |
| JP6803304B2 (ja) | 2017-08-01 | 2020-12-23 | 信越化学工業株式会社 | シロキサン化合物及びその製造方法 |
| CN107698615A (zh) | 2017-09-13 | 2018-02-16 | 常熟理工学院 | 一种氨基酸改性四硅氧烷表面活性剂及其制备方法 |
| CN107497365A (zh) | 2017-09-13 | 2017-12-22 | 常熟理工学院 | 一种Gemini型氨基酸改性有机硅表面活性剂及其制备方法 |
| CN107522726A (zh) | 2017-09-13 | 2017-12-29 | 常熟理工学院 | 一种氨基酸改性三硅氧烷表面活性剂及其制备方法 |
| CN107602862A (zh) | 2017-09-13 | 2018-01-19 | 常熟理工学院 | 一种氨基酸改性聚硅氧烷表面活性剂及其制备方法 |
| MX2022002204A (es) | 2019-08-22 | 2022-03-11 | Advansix Resins & Chemicals Llc | Derivados de siloxano de aminoacidos que tienen propiedades activas de superficie. |
| US11905304B2 (en) | 2019-12-19 | 2024-02-20 | Advansix Resins & Chemicals Llc | Surfactants for agricultural products |
| WO2021126715A1 (en) | 2019-12-19 | 2021-06-24 | Advansix Resins & Chemicals Llc | Surfactants for inks, paints, and adhesives |
| JP7416952B2 (ja) | 2019-12-19 | 2024-01-17 | アドバンシックス・レジンズ・アンド・ケミカルズ・リミテッド・ライアビリティ・カンパニー | パーソナルケア製品及び化粧製品における使用のための界面活性剤 |
| MY197388A (en) | 2019-12-20 | 2023-06-15 | Advansix Resins & Chemicals Llc | Surfactants for cleaning products |
| JP7346744B2 (ja) | 2019-12-20 | 2023-09-19 | アドバンシックス・レジンズ・アンド・ケミカルズ・リミテッド・ライアビリティ・カンパニー | ヘルスケア製品における使用のための界面活性剤 |
| US11965127B2 (en) | 2019-12-30 | 2024-04-23 | Dow Silicones Corporation | Cationic silicone surfactants and method of preparing same |
| KR102701098B1 (ko) * | 2019-12-31 | 2024-08-29 | 어드밴식스 레진즈 앤드 케미컬즈 엘엘씨 | 오일 및 가스 생산을 위한 계면활성제 |
| PL4101009T3 (pl) * | 2020-02-05 | 2024-08-19 | Advansix Resins & Chemicals Llc | Środki powierzchniowo czynne dla elektroniki |
-
2020
- 2020-12-18 PL PL20842490.3T patent/PL4101009T3/pl unknown
- 2020-12-18 CA CA3165634A patent/CA3165634A1/en active Pending
- 2020-12-18 US US17/127,048 patent/US11427760B2/en active Active
- 2020-12-18 FI FIEP20842490.3T patent/FI4101009T3/fi active
- 2020-12-18 ES ES20842490T patent/ES2988486T3/es active Active
- 2020-12-18 KR KR1020227030448A patent/KR102689854B1/ko active Active
- 2020-12-18 JP JP2022547839A patent/JP7538235B2/ja active Active
- 2020-12-18 WO PCT/US2020/066031 patent/WO2021158301A1/en not_active Ceased
- 2020-12-18 CN CN202080099375.1A patent/CN115428169B/zh active Active
- 2020-12-18 MX MX2022009562A patent/MX2022009562A/es unknown
- 2020-12-18 EP EP20842490.3A patent/EP4101009B1/en active Active
- 2020-12-18 DK DK20842490.3T patent/DK4101009T3/da active
- 2020-12-18 BR BR112022015536A patent/BR112022015536A2/pt unknown
- 2020-12-18 AU AU2020427412A patent/AU2020427412B2/en active Active
-
2022
- 2022-07-22 US US17/871,208 patent/US11999890B2/en active Active
- 2022-08-04 SA SA522440059A patent/SA522440059B1/ar unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CA3165634A1 (en) | 2021-08-12 |
| US11427760B2 (en) | 2022-08-30 |
| MX2022009562A (es) | 2022-09-09 |
| ES2988486T3 (es) | 2024-11-20 |
| BR112022015536A2 (pt) | 2022-10-04 |
| WO2021158301A1 (en) | 2021-08-12 |
| KR102689854B1 (ko) | 2024-07-29 |
| EP4101009B1 (en) | 2024-04-17 |
| NZ791953A (en) | 2025-05-02 |
| JP7538235B2 (ja) | 2024-08-21 |
| CN115428169B (zh) | 2025-05-30 |
| KR20220137703A (ko) | 2022-10-12 |
| AU2020427412A1 (en) | 2022-09-22 |
| JP2023513523A (ja) | 2023-03-31 |
| US20210238479A1 (en) | 2021-08-05 |
| US11999890B2 (en) | 2024-06-04 |
| FI4101009T3 (fi) | 2024-07-17 |
| SA522440059B1 (ar) | 2025-01-28 |
| US20220380669A1 (en) | 2022-12-01 |
| CN115428169A (zh) | 2022-12-02 |
| EP4101009A1 (en) | 2022-12-14 |
| AU2020427412B2 (en) | 2024-04-04 |
| DK4101009T3 (da) | 2024-06-10 |
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