BR112022015536A2 - Formulação para um agente de pré-textura, formulação para um agente de gravação, e formulação para uma formulação de decapagem fotorresistente - Google Patents

Formulação para um agente de pré-textura, formulação para um agente de gravação, e formulação para uma formulação de decapagem fotorresistente

Info

Publication number
BR112022015536A2
BR112022015536A2 BR112022015536A BR112022015536A BR112022015536A2 BR 112022015536 A2 BR112022015536 A2 BR 112022015536A2 BR 112022015536 A BR112022015536 A BR 112022015536A BR 112022015536 A BR112022015536 A BR 112022015536A BR 112022015536 A2 BR112022015536 A2 BR 112022015536A2
Authority
BR
Brazil
Prior art keywords
formulation
agent
etching
photoresistant
embossing
Prior art date
Application number
BR112022015536A
Other languages
English (en)
Inventor
Asirvatham Edward
Original Assignee
Advansix Resins & Chemicals Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advansix Resins & Chemicals Llc filed Critical Advansix Resins & Chemicals Llc
Publication of BR112022015536A2 publication Critical patent/BR112022015536A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
    • C09K23/54—Silicon compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/38—Cationic compounds
    • C11D1/52—Carboxylic amides, alkylolamides or imides or their condensation products with alkylene oxides
    • C11D1/528—Carboxylic amides (R1-CO-NR2R3), where at least one of the chains R1, R2 or R3 is interrupted by a functional group, e.g. a -NH-, -NR-, -CO-, or -CON- group
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2003—Alcohols; Phenols
    • C11D3/2065—Polyhydric alcohols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/34—Organic compounds containing sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0041—Photosensitive materials providing an etching agent upon exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)
  • Weting (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

FORMULAÇÃO PARA UM AGENTE DE PRÉ-TEXTURA, FORMULAÇÃO PARA UM AGENTE DE GRAVAÇÃO, E FORMULAÇÃO PARA UMA FORMULAÇÃO DE DECAPAGEM FOTORRESISTENTE. Agentes de pré-texturização, agentes de gravação e agentes de decapagem fotorresistentes podem ser formulados para incluir um ou mais tensoativos, de uma ou mais classes de tensoativos, tais como derivados de siloxano de aminoácidos que têm propriedades tensoativas.
BR112022015536A 2020-02-05 2020-12-18 Formulação para um agente de pré-textura, formulação para um agente de gravação, e formulação para uma formulação de decapagem fotorresistente BR112022015536A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202062970356P 2020-02-05 2020-02-05
PCT/US2020/066031 WO2021158301A1 (en) 2020-02-05 2020-12-18 Surfactants for electronics

Publications (1)

Publication Number Publication Date
BR112022015536A2 true BR112022015536A2 (pt) 2022-10-04

Family

ID=74186950

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112022015536A BR112022015536A2 (pt) 2020-02-05 2020-12-18 Formulação para um agente de pré-textura, formulação para um agente de gravação, e formulação para uma formulação de decapagem fotorresistente

Country Status (11)

Country Link
US (2) US11427760B2 (pt)
EP (1) EP4101009B1 (pt)
JP (1) JP2023513523A (pt)
KR (1) KR20220137703A (pt)
CN (1) CN115428169A (pt)
AU (1) AU2020427412B2 (pt)
BR (1) BR112022015536A2 (pt)
CA (1) CA3165634A1 (pt)
DK (1) DK4101009T3 (pt)
MX (1) MX2022009562A (pt)
WO (1) WO2021158301A1 (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220045042A (ko) * 2019-08-22 2022-04-12 어드밴식스 레진즈 앤드 케미컬즈 엘엘씨 표면-활성 특성을 갖는 아미노산의 실록산 유도체
US11905304B2 (en) 2019-12-19 2024-02-20 Advansix Resins & Chemicals Llc Surfactants for agricultural products
AU2020408132B2 (en) 2019-12-19 2024-02-29 Advansix Resins & Chemicals Llc Surfactants for use in personal care and cosmetic products
MY196955A (en) 2019-12-20 2023-05-12 Advansix Resins & Chemicals Llc Surfactants for use in healthcare products
KR20220117910A (ko) 2019-12-20 2022-08-24 어드밴식스 레진즈 앤드 케미컬즈 엘엘씨 클리닝 제품용 계면활성제
MX2022008077A (es) 2019-12-31 2022-07-11 Advansix Resins & Chemicals Llc Tensioactivos para produccion de petroleo y gas.
US11427760B2 (en) * 2020-02-05 2022-08-30 Advansix Resins & Chemicals Llc Surfactants for electronics

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3624120A (en) 1969-12-22 1971-11-30 Procter & Gamble Quaternary ammonium salts of cyclic siloxane polymers
AT330930B (de) 1973-04-13 1976-07-26 Henkel & Cie Gmbh Verfahren zur herstellung von festen, schuttfahigen wasch- oder reinigungsmitteln mit einem gehalt an calcium bindenden substanzen
US4605509A (en) 1973-05-11 1986-08-12 The Procter & Gamble Company Detergent compositions containing sodium aluminosilicate builders
DE2433485A1 (de) 1973-07-16 1975-02-06 Procter & Gamble Zur verwendung in waschmitteln geeignete aluminosilikat-ionenaustauscher
US3929678A (en) 1974-08-01 1975-12-30 Procter & Gamble Detergent composition having enhanced particulate soil removal performance
DE3413571A1 (de) 1984-04-11 1985-10-24 Hoechst Ag, 6230 Frankfurt Verwendung von kristallinen schichtfoermigen natriumsilikaten zur wasserenthaertung und verfahren zur wasserenthaertung
DE3930344A1 (de) 1989-09-12 1991-03-14 Merck Patent Gmbh Silanderivate
US5041590A (en) 1990-01-04 1991-08-20 Dow Corning Corporation Quaternary ammonium functional siloxane surfactants
CN1131224C (zh) 1998-10-30 2003-12-17 默克专利股份有限公司 本犀草素和木犀草素衍生物的制备方法
US6013683A (en) 1998-12-17 2000-01-11 Dow Corning Corporation Single phase silicone and water compositions
US6521580B2 (en) 2000-02-22 2003-02-18 General Electric Company Siloxane dry cleaning composition and process
US20100063310A1 (en) 2004-07-02 2010-03-11 Knepper Jeffrey A Functionalized silicon compounds
US7632796B2 (en) 2005-10-28 2009-12-15 Dynaloy, Llc Dynamic multi-purpose composition for the removal of photoresists and method for its use
WO2007056424A2 (en) 2005-11-07 2007-05-18 Penwest Pharmaceuticals, Co. Controlled-release emulsion compositions
DE102005056620A1 (de) 2005-11-25 2007-06-06 Merck Patent Gmbh Amphiphile Silane
US7622512B2 (en) 2005-12-21 2009-11-24 Bausch & Lomb Incorporated Cationic hydrophilic siloxanyl monomers
GB0611217D0 (en) 2006-06-08 2006-07-19 Dow Corning Amino-acid functional siloxanes,methods of preparation and applications
US20080152540A1 (en) 2006-12-22 2008-06-26 Bausch & Lomb Incorporated Packaging solutions
US20090173912A1 (en) 2007-12-26 2009-07-09 Momentive Performance Materials Inc. Mixtures of hydrolysis resistant organomodified trisiloxane ionic surfactants
JP5760921B2 (ja) 2010-10-14 2015-08-12 信越化学工業株式会社 アミノ酸変性オルガノポリシロキサンの製造方法
US20120295447A1 (en) 2010-11-24 2012-11-22 Air Products And Chemicals, Inc. Compositions and Methods for Texturing of Silicon Wafers
FI127433B (fi) 2011-06-14 2018-05-31 Pibond Oy Menetelmä siloksaanimonomeerien syntetisoimiseksi sekä näiden käyttö
US20130130508A1 (en) 2011-09-02 2013-05-23 Air Products And Chemicals, Inc. Compositions and Methods for Texturing of Silicon Wafers
CN102614808B (zh) 2012-03-08 2013-11-20 齐齐哈尔大学 以低碳链缩水甘油醚为连接基的乙酰胺二聚三硅氧烷表面活性剂的制备方法
US10053619B2 (en) 2013-03-14 2018-08-21 Flotek Chemistry, Llc Siloxane surfactant additives for oil and gas applications
DE102013106906A1 (de) * 2013-07-01 2015-01-08 Evonik Industries Ag Siloxan-Polymere mit zentralem Polysiloxan-Polymerblock mit terminalen organofunktionellen Resten umfassend Harnstoff- und/oder Carbamat-Gruppen sowie Aminosäure-Reste
CN105518834B (zh) 2013-09-19 2018-02-16 摄津制油株式会社 半导体基板用蚀刻液
KR20150108143A (ko) * 2014-03-17 2015-09-25 동우 화인켐 주식회사 결정성 실리콘 웨이퍼의 텍스쳐 에칭액 조성물 및 텍스쳐 에칭방법
CN104826140B (zh) 2015-04-08 2018-07-03 中山大学 一种载药硅脂质超声造影剂的制备方法和应用
US9816026B2 (en) 2015-05-26 2017-11-14 Baker Hughes, LLC Methods of extracting hydrocarbons from subterranean formations
JP2017105753A (ja) 2015-12-04 2017-06-15 信越化学工業株式会社 両末端に異なる官能基を有する直鎖オルガノポリシロキサン、及びその製造方法
US10829718B2 (en) 2016-04-27 2020-11-10 Dow Silicones Corporation Detergent composition comprising a carbinol functional trisiloxane
US10577533B2 (en) 2016-08-28 2020-03-03 Linde Aktiengesellschaft Unconventional enhanced oil recovery
JP6990982B2 (ja) 2017-04-10 2022-01-12 信越化学工業株式会社 ポリシロキサンモノマー及びその製造方法
JP6803304B2 (ja) 2017-08-01 2020-12-23 信越化学工業株式会社 シロキサン化合物及びその製造方法
CN107522726A (zh) 2017-09-13 2017-12-29 常熟理工学院 一种氨基酸改性三硅氧烷表面活性剂及其制备方法
CN107497365A (zh) 2017-09-13 2017-12-22 常熟理工学院 一种Gemini型氨基酸改性有机硅表面活性剂及其制备方法
CN107602862A (zh) 2017-09-13 2018-01-19 常熟理工学院 一种氨基酸改性聚硅氧烷表面活性剂及其制备方法
CN107698615A (zh) 2017-09-13 2018-02-16 常熟理工学院 一种氨基酸改性四硅氧烷表面活性剂及其制备方法
KR20220045042A (ko) 2019-08-22 2022-04-12 어드밴식스 레진즈 앤드 케미컬즈 엘엘씨 표면-활성 특성을 갖는 아미노산의 실록산 유도체
US11905304B2 (en) 2019-12-19 2024-02-20 Advansix Resins & Chemicals Llc Surfactants for agricultural products
US20210187460A1 (en) 2019-12-19 2021-06-24 Advansix Resins & Chemicals Llc Surfactants for inks, paints, and adhesives
AU2020408132B2 (en) 2019-12-19 2024-02-29 Advansix Resins & Chemicals Llc Surfactants for use in personal care and cosmetic products
KR20220117910A (ko) 2019-12-20 2022-08-24 어드밴식스 레진즈 앤드 케미컬즈 엘엘씨 클리닝 제품용 계면활성제
MY196955A (en) 2019-12-20 2023-05-12 Advansix Resins & Chemicals Llc Surfactants for use in healthcare products
MX2022008077A (es) * 2019-12-31 2022-07-11 Advansix Resins & Chemicals Llc Tensioactivos para produccion de petroleo y gas.
US11427760B2 (en) * 2020-02-05 2022-08-30 Advansix Resins & Chemicals Llc Surfactants for electronics

Also Published As

Publication number Publication date
MX2022009562A (es) 2022-09-09
AU2020427412B2 (en) 2024-04-04
WO2021158301A1 (en) 2021-08-12
US20220380669A1 (en) 2022-12-01
KR20220137703A (ko) 2022-10-12
CA3165634A1 (en) 2021-08-12
US20210238479A1 (en) 2021-08-05
DK4101009T3 (da) 2024-06-10
US11427760B2 (en) 2022-08-30
CN115428169A (zh) 2022-12-02
US11999890B2 (en) 2024-06-04
JP2023513523A (ja) 2023-03-31
AU2020427412A1 (en) 2022-09-22
EP4101009A1 (en) 2022-12-14
EP4101009B1 (en) 2024-04-17

Similar Documents

Publication Publication Date Title
BR112022015536A2 (pt) Formulação para um agente de pré-textura, formulação para um agente de gravação, e formulação para uma formulação de decapagem fotorresistente
BR112022017701A2 (pt) Formulação para um agente de pré-texturização, formulação para um agente de gravação, e formulação para uma formulação de decapagem fotorresistente
BR112019007682A2 (pt) produtos de xampu compactos estáveis com baixa viscosidade e agente redutor de viscosidade
CO2019003630A2 (es) Composiciones no proteínicas de toxina clostridial
BR112017022021A2 (pt) aplicação de agente anticaspa solúvel em tensoativo
BR112022011590A2 (pt) Formulação para um fluido fixador de tinta, formulação para uma tinta, e formulação para um adesivo
CL2021001956A1 (es) Formulaciones de inmunoconjugado anti-cd79b estables. (divisional solicitud 202002624)
BR112018069266A2 (pt) composições de cuidado pessoal e métodos para uso de tais composições
BR112023000467A2 (pt) Tensoativos de aminoácidos ramificados para tintas, tintas para pintura e adesivos
BR112018001213A2 (pt) composição de fragrância à base de água, dispositivo de entrega de fragrância, e método para fornecer um perfume de longa duração
ZA202301112B (en) Branched amino acid surfactants for electronics products
BR112016016947A2 (pt) Sistemas e métodos para tratar uma superfície
BR112015027112A2 (pt) uso de uma mistura, e, formulação de ingrediente ativo aquoso
MX2021005418A (es) Una composicion a base de agente tensioactivo antimicrobiano.
CO2022002993A2 (es) Compuestos de pirazol, formulaciones de los mismos y un método para usar los compuestos y/o formulaciones referencia cruzada a una solicitud relacionada
CO2021007006A2 (es) Moduladores de la expresión de irf5
CO2023013397A2 (es) Compuestos de tienopirrol
BR112018074329A2 (pt) composição, formulação seca ou líquida, e, uso de uma composição.
BR112018067322A2 (pt) composições de perfume
BR112018070626A2 (pt) formulação farmacêutica, e, composto ou composição para uso, uso, método ou composição
BR112018069115A2 (pt) composições, composições de revestimento aquosas e métodos para melhorar a estabilidade de congelamento/descongelamento de composições de revestimento aquosas
CL2021001096A1 (es) Métodos para tratar el síndrome mielodisplásico. (divisional de la solicitud no. 202000196)
CL2020000221A1 (es) Composiciones que comprenden aminoácidos para su uso en el tratamiento de enfermedades relacionadas con la disfunción mitocondrial.
AR111880A1 (es) Composición liquida generadora de radicales acetilo
BR112019003298A2 (pt) composição para cuidados pessoais, e, formulação para banho.