PL404381A1 - Sposób wytwarzania tlenkowego materiału elektrodowego, tlenkowy materiał elektrodowy i zastosowanie tlenkowego materiału elektrodowego - Google Patents

Sposób wytwarzania tlenkowego materiału elektrodowego, tlenkowy materiał elektrodowy i zastosowanie tlenkowego materiału elektrodowego

Info

Publication number
PL404381A1
PL404381A1 PL404381A PL40438113A PL404381A1 PL 404381 A1 PL404381 A1 PL 404381A1 PL 404381 A PL404381 A PL 404381A PL 40438113 A PL40438113 A PL 40438113A PL 404381 A1 PL404381 A1 PL 404381A1
Authority
PL
Poland
Prior art keywords
electrode material
oxide electrode
metal
layer
current collector
Prior art date
Application number
PL404381A
Other languages
English (en)
Inventor
Bronisław Szubzda
Mariusz Ozimek
Katarzyna Janas
Dominika Gaworska-Koniarek
Original Assignee
Instytut Elektrotechniki
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Instytut Elektrotechniki filed Critical Instytut Elektrotechniki
Priority to PL404381A priority Critical patent/PL404381A1/pl
Priority to EP13460039.4A priority patent/EP2816576A1/en
Publication of PL404381A1 publication Critical patent/PL404381A1/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22—Electrodes
    • H01G11/30—Electrodes characterised by their material
    • H01G11/46—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/84—Processes for the manufacture of hybrid or EDL capacitors, or components thereof
    • H01G11/86—Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40—Capacitors
    • H01L28/60—Electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/13—Energy storage using capacitors

Abstract

Przedmiotem wynalazku jest sposób wytwarzania tlenkowego materiału elektrodowego, tlenkowy materiał elektrodowy i zastosowanie tlenkowego materiału elektrodowego, na elektrody do superkondensatorów typu MeO. Sposób polega na tym, że w komorze roboczej magnetronu umieszcza się co najmniej jeden metalowy kolektor prądowy, ewentualnie metalowy kolektor prądowy pokryty warstwą węgla o rozwiniętej powierzchni, przy czym powierzchnię kolektora prądowego umieszcza się w odległości od 50 mm do 120 mm od targetu wykonanego z rozpylanego metalu, po czym w atmosferze gazu reaktywnego o ciśnieniu od 0,4 Pa do 2,0 Pa i przy mocy wydzielanej na targecie od 0,5 kW do 2,0 kW, nanosi się elektrodę z tlenku metalu (Me)xOn-x, o grubości od 20 nm do 500 nm, przy czym naniesiona warstwa tlenku metalu jest porowata z dużym rozwinięciem powierzchni. Tlenkowy materiał elektrodowy jest porowatą warstwą tlenku metalu (Me)xOn-x, o dużym rozwinięciu powierzchni, o porowatości większej od 40% i grubości warstwy od 20 nm do 500 nm.
PL404381A 2013-06-19 2013-06-19 Sposób wytwarzania tlenkowego materiału elektrodowego, tlenkowy materiał elektrodowy i zastosowanie tlenkowego materiału elektrodowego PL404381A1 (pl)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PL404381A PL404381A1 (pl) 2013-06-19 2013-06-19 Sposób wytwarzania tlenkowego materiału elektrodowego, tlenkowy materiał elektrodowy i zastosowanie tlenkowego materiału elektrodowego
EP13460039.4A EP2816576A1 (en) 2013-06-19 2013-06-27 Method of manufacturing of an electrode oxide material, the electrode oxide material and the applications of the electrode oxide material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL404381A PL404381A1 (pl) 2013-06-19 2013-06-19 Sposób wytwarzania tlenkowego materiału elektrodowego, tlenkowy materiał elektrodowy i zastosowanie tlenkowego materiału elektrodowego

Publications (1)

Publication Number Publication Date
PL404381A1 true PL404381A1 (pl) 2014-12-22

Family

ID=48915969

Family Applications (1)

Application Number Title Priority Date Filing Date
PL404381A PL404381A1 (pl) 2013-06-19 2013-06-19 Sposób wytwarzania tlenkowego materiału elektrodowego, tlenkowy materiał elektrodowy i zastosowanie tlenkowego materiału elektrodowego

Country Status (2)

Country Link
EP (1) EP2816576A1 (pl)
PL (1) PL404381A1 (pl)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2514701B2 (ja) * 1988-12-02 1996-07-10 日本特殊陶業株式会社 酸素センサ
WO2002056325A1 (en) 2001-01-09 2002-07-18 Lih-Ren Shiue Electrochemical capacitor with electrode material for energy storage
TWI254080B (en) * 2002-03-27 2006-05-01 Sumitomo Metal Mining Co Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device
EP1772428A4 (en) 2004-06-11 2008-05-14 Univ Tokyo Agriculture NANOCARBON COMPOSITE STRUCTURE WITH RUTHENIUM OXIDE TAPPED INTO
EP1999809A2 (en) * 2006-03-29 2008-12-10 Max-Planck-Gesellschaft zur Förderung der Wissenschaften Preparation of nanostructured metals and metal compounds and their uses
DE102006041130A1 (de) * 2006-09-01 2008-03-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Elektrode für elektrochemische Farbstoffzelle und Verfahren zum Herstellen derselben
KR20100028356A (ko) 2008-09-04 2010-03-12 한국과학기술연구원 전이금속 산화물/다층벽 탄소나노튜브 나노복합체 및 이의 제조방법
KR101840818B1 (ko) * 2011-06-30 2018-03-22 삼성전자 주식회사 음극활물질, 이를 포함하는 전극, 이를 채용한 리튬전지 및 이의 제조방법

Also Published As

Publication number Publication date
EP2816576A1 (en) 2014-12-24

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