PL398452A1 - Sposób wytwarzania warstwy weglowej zawierajacej krzem na implantach medycznych - Google Patents
Sposób wytwarzania warstwy weglowej zawierajacej krzem na implantach medycznychInfo
- Publication number
- PL398452A1 PL398452A1 PL398452A PL39845212A PL398452A1 PL 398452 A1 PL398452 A1 PL 398452A1 PL 398452 A PL398452 A PL 398452A PL 39845212 A PL39845212 A PL 39845212A PL 398452 A1 PL398452 A1 PL 398452A1
- Authority
- PL
- Poland
- Prior art keywords
- carbon layer
- silicon
- producing
- containing carbon
- medical implants
- Prior art date
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052799 carbon Inorganic materials 0.000 title abstract 2
- 239000007943 implant Substances 0.000 title abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract 2
- 150000003961 organosilicon compounds Chemical class 0.000 abstract 2
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract 1
- 239000001569 carbon dioxide Substances 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 150000004756 silanes Chemical class 0.000 abstract 1
- -1 siloxanes Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Sposób polega na tym, ze w trakcie osadzania warstwy weglowej na implancie utrzymuje sie temperature w granicach 200 - 550°C, przy potencjale autopolaryzacji od - 600 V do - 1200 V i jednoczesnie wprowadza sie do komory gaz weglonosny, korzystnie metan oraz pary zwiazków krzemoorganicznych, korzystnie pochodne alifatyczne silanów lub siloksanów, w takich ilosciach aby stosunek zawartosci zwiazku krzemoorganicznego do metanu zawieral sie w zakresie od 1:25 do 1:1, cisnienie w komorze reaktora wynosilo od 30 Pa do 60 Pa, a czas procesu wynosil 3 - 6 minut.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PL398452A PL223008B1 (pl) | 2012-03-15 | 2012-03-15 | Sposób wytwarzania warstwy węglowej zawierającej krzem na implantach medycznych |
| DE201210215855 DE102012215855A1 (de) | 2012-03-15 | 2012-09-06 | Verfahren zur Bildung einer siliziumhaltigen Kohlenstoffschicht auf medizinischen Implantaten |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PL398452A PL223008B1 (pl) | 2012-03-15 | 2012-03-15 | Sposób wytwarzania warstwy węglowej zawierającej krzem na implantach medycznych |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| PL398452A1 true PL398452A1 (pl) | 2013-09-16 |
| PL223008B1 PL223008B1 (pl) | 2016-09-30 |
Family
ID=49044036
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL398452A PL223008B1 (pl) | 2012-03-15 | 2012-03-15 | Sposób wytwarzania warstwy węglowej zawierającej krzem na implantach medycznych |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE102012215855A1 (pl) |
| PL (1) | PL223008B1 (pl) |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3082979B2 (ja) | 1991-11-15 | 2000-09-04 | トヨタ自動車株式会社 | a−DLC−Si膜の形成方法 |
| US5593719A (en) | 1994-03-29 | 1997-01-14 | Southwest Research Institute | Treatments to reduce frictional wear between components made of ultra-high molecular weight polyethylene and metal alloys |
| US5725573A (en) | 1994-03-29 | 1998-03-10 | Southwest Research Institute | Medical implants made of metal alloys bearing cohesive diamond like carbon coatings |
| JP4331292B2 (ja) | 1998-10-30 | 2009-09-16 | 株式会社リケン | 低摩耗性と優れた密着性を有する複合ダイヤモンドライクカーボン皮膜 |
| KR100392476B1 (ko) | 2000-09-26 | 2003-07-22 | 김현이 | 디엘시가 코팅되는 생체이식용 복합체 및 그 제조방법 |
| PL199898B1 (pl) | 2001-12-28 | 2008-11-28 | Jozef Borowski | Sposób wytwarzania warstw nanokrystalicznego diamentu na powierzchni wyrobów metalowych, zwłaszcza na powierzchni gwoździ śródszpikowych |
| JP4122387B2 (ja) | 2002-03-15 | 2008-07-23 | 山口県 | 複合硬質皮膜、その製造方法及び成膜装置 |
| PL207771B1 (pl) | 2005-04-12 | 2011-01-31 | Politechnika Łódzka Inst Inżynierii Materiałowej | Sposób wytwarzania kompozytowych powłok NCD/Ca-P na podłożach metalicznych stosowanych w medycynie i weterynarii |
| PL207772B1 (pl) | 2005-05-06 | 2011-01-31 | Politechnika Łódzka Inst Inżynierii Materiałowej | Sposób wytwarzania kompozytowych powłok NCD/Ca-P na podłożach metalicznych stosowanych w medycynie i weterynarii wytwarzanymi metodą plazmową |
| JP4291342B2 (ja) | 2006-07-31 | 2009-07-08 | 株式会社東海理化電機製作所 | 摺動部材の表面処理方法、摺動部材、メカニカルキー及び携帯機 |
| PL212780B1 (pl) | 2008-02-21 | 2012-11-30 | Borowski Jozef Przed Prod Uslugowo Handlowe Medgal | Sposób wytwarzania cienkiej warstwy kompozytowej na powierzchni wyrobów medycznych, zwłaszcza implantów, instrumentariów medycznych |
| US20090246243A1 (en) | 2008-03-25 | 2009-10-01 | La Corporation De I'ecole Polytechnique | Carbonaceous Protective Multifunctional Coatings |
-
2012
- 2012-03-15 PL PL398452A patent/PL223008B1/pl unknown
- 2012-09-06 DE DE201210215855 patent/DE102012215855A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE102012215855A1 (de) | 2013-09-19 |
| PL223008B1 (pl) | 2016-09-30 |
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