PL3879558T3 - Generator plazmy, urządzenie do obróbki plazmy i sposób impulsowego dostarczania energii elektrycznej - Google Patents

Generator plazmy, urządzenie do obróbki plazmy i sposób impulsowego dostarczania energii elektrycznej

Info

Publication number
PL3879558T3
PL3879558T3 PL21171624.6T PL21171624T PL3879558T3 PL 3879558 T3 PL3879558 T3 PL 3879558T3 PL 21171624 T PL21171624 T PL 21171624T PL 3879558 T3 PL3879558 T3 PL 3879558T3
Authority
PL
Poland
Prior art keywords
processing device
electrical energy
plasma
plasma processing
plasma generator
Prior art date
Application number
PL21171624.6T
Other languages
English (en)
Inventor
Sebastian Hubertus SCHULZ
Thomas Pernau
Florian NACHBAUER
Felix WALK
Original Assignee
centrotherm international AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by centrotherm international AG filed Critical centrotherm international AG
Publication of PL3879558T3 publication Critical patent/PL3879558T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32944—Arc detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32889—Connection or combination with other apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32899—Multiple chambers, e.g. cluster tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
PL21171624.6T 2017-03-31 2018-03-29 Generator plazmy, urządzenie do obróbki plazmy i sposób impulsowego dostarczania energii elektrycznej PL3879558T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102017205582 2017-03-31
DE102018204585.2A DE102018204585A1 (de) 2017-03-31 2018-03-26 Plasmagenerator, Plasma-Behandlungsvorrichtung und Verfahren zum gepulsten Bereitstellen von elektrischer Leistung

Publications (1)

Publication Number Publication Date
PL3879558T3 true PL3879558T3 (pl) 2024-03-25

Family

ID=63524659

Family Applications (2)

Application Number Title Priority Date Filing Date
PL18715016T PL3602601T3 (pl) 2017-03-31 2018-03-29 Generator plazmy, urządzenie do obróbki plazmy i sposób impulsowego dostarczania energii elektrycznej
PL21171624.6T PL3879558T3 (pl) 2017-03-31 2018-03-29 Generator plazmy, urządzenie do obróbki plazmy i sposób impulsowego dostarczania energii elektrycznej

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PL18715016T PL3602601T3 (pl) 2017-03-31 2018-03-29 Generator plazmy, urządzenie do obróbki plazmy i sposób impulsowego dostarczania energii elektrycznej

Country Status (9)

Country Link
US (3) US11355316B2 (pl)
EP (2) EP3879558B1 (pl)
KR (2) KR102838071B1 (pl)
CN (2) CN114709126B (pl)
DE (1) DE102018204585A1 (pl)
MY (1) MY202814A (pl)
PL (2) PL3602601T3 (pl)
TW (1) TWI762613B (pl)
WO (1) WO2018178289A1 (pl)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018204585A1 (de) * 2017-03-31 2018-10-04 centrotherm international AG Plasmagenerator, Plasma-Behandlungsvorrichtung und Verfahren zum gepulsten Bereitstellen von elektrischer Leistung
DE102018216969A1 (de) * 2018-10-03 2020-04-09 centrotherm international AG Plasma-Behandlungsvorrichtung und Verfahren zum Ausgeben von Pulsen elektischer Leistung an wenigstens eine Prozesskammer
DE102018132700A1 (de) 2018-12-18 2020-06-18 Krones Ag Vorrichtung und Verfahren zum Beschichten und insbesondere Plasmabeschichten von Behältnissen
CN114424447A (zh) * 2019-07-29 2022-04-29 先进工程解决方案全球控股私人有限公司 用于多个负载的脉冲驱动的具有通道偏移的多路复用功率发生器输出
DE102022131435A1 (de) 2022-11-28 2024-05-29 TRUMPF Hüttinger GmbH + Co. KG Vorrichtung zur Erzeugung einer Plasmaflamme, Plasmaerzeugungseinrichtung, Hochtemperaturprozessanlage und entsprechendes Betriebsverfahren
CN116095936B (zh) * 2023-02-13 2025-12-02 南京工业大学 维持不同等离子体放电阶段脉冲功率调控装置和方法

Family Cites Families (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3500118A (en) * 1967-07-17 1970-03-10 Gen Electric Electrodeless gaseous electric discharge devices utilizing ferrite cores
US3657591A (en) * 1970-06-26 1972-04-18 Gen Electric High intensity far u.v. radiation source
US3987334A (en) * 1975-01-20 1976-10-19 General Electric Company Integrally ballasted electrodeless fluorescent lamp
US3987335A (en) * 1975-01-20 1976-10-19 General Electric Company Electrodeless fluorescent lamp bulb RF power energized through magnetic core located partially within gas discharge space
US4017764A (en) * 1975-01-20 1977-04-12 General Electric Company Electrodeless fluorescent lamp having a radio frequency gas discharge excited by a closed loop magnetic core
US4048541A (en) * 1976-06-14 1977-09-13 Solitron Devices, Inc. Crystal controlled oscillator circuit for illuminating electrodeless fluorescent lamp
US4180763A (en) * 1978-01-25 1979-12-25 General Electric Company High intensity discharge lamp geometries
US4431898A (en) * 1981-09-01 1984-02-14 The Perkin-Elmer Corporation Inductively coupled discharge for plasma etching and resist stripping
JP2787503B2 (ja) * 1990-02-26 1998-08-20 住友重機械工業株式会社 プラズマ処理装置
JPH08153148A (ja) * 1994-11-29 1996-06-11 Nippon Telegr & Teleph Corp <Ntt> アナログニューラルネットワーク学習回路
US6071572A (en) * 1996-10-15 2000-06-06 Applied Materials, Inc. Forming tin thin films using remote activated specie generation
US7569790B2 (en) * 1997-06-26 2009-08-04 Mks Instruments, Inc. Method and apparatus for processing metal bearing gases
US6150628A (en) * 1997-06-26 2000-11-21 Applied Science And Technology, Inc. Toroidal low-field reactive gas source
US6418874B1 (en) * 2000-05-25 2002-07-16 Applied Materials, Inc. Toroidal plasma source for plasma processing
US7223676B2 (en) * 2002-06-05 2007-05-29 Applied Materials, Inc. Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer
US6893907B2 (en) * 2002-06-05 2005-05-17 Applied Materials, Inc. Fabrication of silicon-on-insulator structure using plasma immersion ion implantation
US7137354B2 (en) * 2000-08-11 2006-11-21 Applied Materials, Inc. Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage
US6855906B2 (en) * 2001-10-16 2005-02-15 Adam Alexander Brailove Induction plasma reactor
SE0302045D0 (sv) * 2003-07-10 2003-07-10 Chemfilt R & D Ab Work piece processing by pulsed electric discharges in solid-gas plasmas
SE532505C2 (sv) * 2007-12-12 2010-02-09 Plasmatrix Materials Ab Förfarande för plasmaaktiverad kemisk ångdeponering och plasmasönderdelningsenhet
WO2009118920A1 (ja) * 2008-03-26 2009-10-01 株式会社京三製作所 真空装置用異常放電抑制装置
US9287086B2 (en) * 2010-04-26 2016-03-15 Advanced Energy Industries, Inc. System, method and apparatus for controlling ion energy distribution
US8771538B2 (en) * 2009-11-18 2014-07-08 Applied Materials, Inc. Plasma source design
US8742665B2 (en) * 2009-11-18 2014-06-03 Applied Materials, Inc. Plasma source design
US8880227B2 (en) * 2010-05-27 2014-11-04 Applied Materials, Inc. Component temperature control by coolant flow control and heater duty cycle control
DE102010031568B4 (de) * 2010-07-20 2014-12-11 TRUMPF Hüttinger GmbH + Co. KG Arclöschanordnung und Verfahren zum Löschen von Arcs
US20130059448A1 (en) * 2011-09-07 2013-03-07 Lam Research Corporation Pulsed Plasma Chamber in Dual Chamber Configuration
US9065426B2 (en) * 2011-11-03 2015-06-23 Advanced Energy Industries, Inc. High frequency solid state switching for impedance matching
DE102011009693A1 (de) * 2011-01-28 2012-08-02 Centrotherm Thermal Solutions Gmbh & Co. Kg Kühlmodul und Vorrichtung zum thermischen Behandeln von Substraten
US8884525B2 (en) * 2011-03-22 2014-11-11 Advanced Energy Industries, Inc. Remote plasma source generating a disc-shaped plasma
US8952765B2 (en) * 2012-03-23 2015-02-10 Mks Instruments, Inc. System and methods of bimodal automatic power and frequency tuning of RF generators
US9210790B2 (en) * 2012-08-28 2015-12-08 Advanced Energy Industries, Inc. Systems and methods for calibrating a switched mode ion energy distribution system
EP2974558A4 (en) * 2013-03-15 2016-08-10 Plasmability Llc RINGFUL PLASMA PROCESSING DEVICE
US9336995B2 (en) * 2013-04-26 2016-05-10 Mks Instruments, Inc. Multiple radio frequency power supply control of frequency and phase
US9341610B1 (en) * 2013-08-29 2016-05-17 The Boeing Company Electrical arc trigger systems, methods, and apparatuses
US9514917B1 (en) * 2013-08-29 2016-12-06 The Boeing Company Controlled-energy electrical arc systems, methods, and apparatuses
MY182756A (en) * 2014-10-13 2021-02-05 Tri Alpha Energy Inc Systems and methods for merging and compressing compact tori
KR20160049628A (ko) * 2014-10-28 2016-05-10 최도현 듀얼 플라즈마 발생기, 플라즈마 처리 시스템 및 방법
KR102091673B1 (ko) * 2015-02-06 2020-03-23 주식회사 원익아이피에스 플라즈마 전력 공급 장치
TWI670749B (zh) * 2015-03-13 2019-09-01 美商應用材料股份有限公司 耦接至工藝腔室的電漿源
DE102015004419A1 (de) 2015-04-02 2016-10-06 Centrotherm Photovoltaics Ag Waferboot und Plasma-Behandlungsvorrichtung für Wafer
CN107810542A (zh) * 2015-05-21 2018-03-16 普拉斯玛比利提有限责任公司 具有成形工件夹具的环形等离子体处理装置
US9721758B2 (en) * 2015-07-13 2017-08-01 Mks Instruments, Inc. Unified RF power delivery single input, multiple output control for continuous and pulse mode operation
US10395895B2 (en) * 2015-08-27 2019-08-27 Mks Instruments, Inc. Feedback control by RF waveform tailoring for ion energy distribution
WO2017050772A1 (de) * 2015-09-23 2017-03-30 Centrotherm Photovoltaics Ag Verfahren und vorrichtung zum passivieren von defekten in halbleitersubstraten
SG11201808023TA (en) * 2016-03-23 2018-10-30 Beijing Naura Microelectronics Equipment Co Ltd Impedance matching system, impedance matching method and semiconductor processing apparatus
US10187032B2 (en) * 2016-06-17 2019-01-22 Lam Research Corporation Combiner and distributor for adjusting impedances or power across multiple plasma processing stations
KR102162949B1 (ko) * 2016-07-14 2020-10-07 도쿄엘렉트론가부시키가이샤 다중 구역 전극 어레이에서의 rf 전력 분배 방법
WO2018093941A1 (en) * 2016-11-15 2018-05-24 Tae Technologies, Inc. Systems and methods for improved sustainment of a high performance frc and high harmonic fast wave electron heating in a high performance frc
DE102018204585A1 (de) * 2017-03-31 2018-10-04 centrotherm international AG Plasmagenerator, Plasma-Behandlungsvorrichtung und Verfahren zum gepulsten Bereitstellen von elektrischer Leistung
DE102017206612A1 (de) * 2017-04-19 2018-10-25 Centrotherm Photovoltaics Ag Verfahren und Vorrichtung zum Ausbilden einer Schicht auf einem Halbleitersubstrat sowie Halbleitersubstrat
EP3396698A1 (en) * 2017-04-27 2018-10-31 TRUMPF Hüttinger GmbH + Co. KG Power converter unit, plasma processing equipment and method of controlling several plasma processes
US10991550B2 (en) * 2018-09-04 2021-04-27 Lam Research Corporation Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station system
WO2022146649A1 (en) * 2020-12-28 2022-07-07 Mattson Technology, Inc. Directly driven hybrid icp-ccp plasma source
TWI829156B (zh) * 2021-05-25 2024-01-11 大陸商北京屹唐半導體科技股份有限公司 電漿源陣列、電漿處理設備、電漿處理系統以及用於在電漿處理設備中加工工件的方法

Also Published As

Publication number Publication date
KR102838071B1 (ko) 2025-07-23
KR20190130019A (ko) 2019-11-20
MY202814A (en) 2024-05-23
CN114709126B (zh) 2025-04-11
DE102018204585A1 (de) 2018-10-04
CN110494949B (zh) 2022-04-29
EP3602601B1 (de) 2021-05-05
EP3879558A1 (de) 2021-09-15
US12087544B2 (en) 2024-09-10
EP3879558C0 (de) 2023-11-22
US20210111001A1 (en) 2021-04-15
US20240429026A1 (en) 2024-12-26
TWI762613B (zh) 2022-05-01
CN114709126A (zh) 2022-07-05
US11355316B2 (en) 2022-06-07
EP3602601A1 (de) 2020-02-05
KR20230142821A (ko) 2023-10-11
WO2018178289A1 (de) 2018-10-04
KR102588542B1 (ko) 2023-10-11
PL3602601T3 (pl) 2021-10-25
TW201904358A (zh) 2019-01-16
CN110494949A (zh) 2019-11-22
US20220254609A1 (en) 2022-08-11
EP3879558B1 (de) 2023-11-22

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