PL377149A1 - Układ dla n odbiorników energii elektrycznej, z których m odbiorników zasilanych jest w energię jednocześnie - Google Patents
Układ dla n odbiorników energii elektrycznej, z których m odbiorników zasilanych jest w energię jednocześnieInfo
- Publication number
- PL377149A1 PL377149A1 PL37714903A PL37714903A PL377149A1 PL 377149 A1 PL377149 A1 PL 377149A1 PL 37714903 A PL37714903 A PL 37714903A PL 37714903 A PL37714903 A PL 37714903A PL 377149 A1 PL377149 A1 PL 377149A1
- Authority
- PL
- Poland
- Prior art keywords
- consumers
- energy
- assembly
- simultaneously supplied
- electric energy
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J1/00—Circuit arrangements for dc mains or dc distribution networks
- H02J1/10—Parallel operation of dc sources
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
- H02J4/00—Circuit arrangements for mains or distribution networks not specified as ac or dc
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Supply And Distribution Of Alternating Current (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2003141717 DE10341717A1 (de) | 2003-09-10 | 2003-09-10 | Anordnung für n Verbraucher elektrischer Energie, von denen m Verbraucher gleichzeitig mit Energie versorgt werden |
Publications (1)
Publication Number | Publication Date |
---|---|
PL377149A1 true PL377149A1 (pl) | 2006-01-23 |
Family
ID=34223521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL37714903A PL377149A1 (pl) | 2003-09-10 | 2003-11-10 | Układ dla n odbiorników energii elektrycznej, z których m odbiorników zasilanych jest w energię jednocześnie |
Country Status (10)
Country | Link |
---|---|
US (1) | US7479712B2 (pl) |
EP (1) | EP1550195A1 (pl) |
JP (1) | JP2006514527A (pl) |
KR (1) | KR100679618B1 (pl) |
CN (1) | CN100349350C (pl) |
AU (1) | AU2003286122A1 (pl) |
DE (1) | DE10341717A1 (pl) |
PL (1) | PL377149A1 (pl) |
TW (1) | TWI265665B (pl) |
WO (1) | WO2005027299A1 (pl) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8706650B2 (en) * | 2009-01-14 | 2014-04-22 | Integral Analytics, Inc. | Optimization of microgrid energy use and distribution |
US8364609B2 (en) * | 2009-01-14 | 2013-01-29 | Integral Analytics, Inc. | Optimization of microgrid energy use and distribution |
EP2417666B1 (en) * | 2009-04-10 | 2019-06-12 | The Regents Of The University Of Michigan | Dynamically reconfigurable framework for a large-scale battery system |
US9118213B2 (en) | 2010-11-24 | 2015-08-25 | Kohler Co. | Portal for harvesting energy from distributed electrical power sources |
JP5731941B2 (ja) * | 2011-09-30 | 2015-06-10 | 株式会社東芝 | 充放電指示装置、充放電指示方法、及び充放電指示プログラム |
JP5701730B2 (ja) | 2011-09-30 | 2015-04-15 | 株式会社東芝 | 充放電判定装置、充放電判定方法、及び充放電判定プログラム |
US10510575B2 (en) * | 2017-09-20 | 2019-12-17 | Applied Materials, Inc. | Substrate support with multiple embedded electrodes |
US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
US11476145B2 (en) | 2018-11-20 | 2022-10-18 | Applied Materials, Inc. | Automatic ESC bias compensation when using pulsed DC bias |
CN118315254A (zh) | 2019-01-22 | 2024-07-09 | 应用材料公司 | 用于控制脉冲电压波形的反馈回路 |
US11508554B2 (en) | 2019-01-24 | 2022-11-22 | Applied Materials, Inc. | High voltage filter assembly |
US11462388B2 (en) | 2020-07-31 | 2022-10-04 | Applied Materials, Inc. | Plasma processing assembly using pulsed-voltage and radio-frequency power |
US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US11798790B2 (en) | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
US20220399185A1 (en) | 2021-06-09 | 2022-12-15 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US11776788B2 (en) | 2021-06-28 | 2023-10-03 | Applied Materials, Inc. | Pulsed voltage boost for substrate processing |
US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
US12106938B2 (en) | 2021-09-14 | 2024-10-01 | Applied Materials, Inc. | Distortion current mitigation in a radio frequency plasma processing chamber |
US11694876B2 (en) | 2021-12-08 | 2023-07-04 | Applied Materials, Inc. | Apparatus and method for delivering a plurality of waveform signals during plasma processing |
US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US12111341B2 (en) | 2022-10-05 | 2024-10-08 | Applied Materials, Inc. | In-situ electric field detection method and apparatus |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2811942C2 (de) | 1977-03-23 | 1986-09-18 | Vide et Traitement S.A., Neuilly-en-Thelle | Ofen zur ionischen Nitrierbehandlung von metallischen Werkstücken |
JPS583976A (ja) | 1981-06-29 | 1983-01-10 | Hitachi Ltd | スパツタリングによる成膜方法及びその装置 |
JPS62158863A (ja) | 1985-12-30 | 1987-07-14 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 被膜形成装置 |
JP2613201B2 (ja) | 1987-01-23 | 1997-05-21 | 株式会社日立製作所 | スパツタリング方法 |
US4788449A (en) * | 1987-04-24 | 1988-11-29 | The Foxboro Company | Redundant power distribution |
DE4305748A1 (de) * | 1993-02-25 | 1994-09-01 | Leybold Ag | Vorrichtung zum Beschichten und/oder Ätzen von Substraten in einer Vakuumkammer |
US5444333A (en) * | 1993-05-26 | 1995-08-22 | Lights Of America, Inc. | Electronic ballast circuit for a fluorescent light |
ATE167007T1 (de) | 1994-09-21 | 1998-06-15 | Inventio Ag | Verfahren und einrichtung zur variablen zuteilung von in betrieb stehenden umrichtern auf mindestens eine last |
AUPN422295A0 (en) * | 1995-07-18 | 1995-08-10 | Bytecraft Research Pty. Ltd. | Control system |
JPH0956064A (ja) | 1995-08-21 | 1997-02-25 | Matsushita Electric Ind Co Ltd | 電源制御装置 |
US5584974A (en) * | 1995-10-20 | 1996-12-17 | Eni | Arc control and switching element protection for pulsed dc cathode sputtering power supply |
DE19540255A1 (de) | 1995-10-28 | 1997-04-30 | Leybold Ag | Vorrichtung zum Beschichten eines Substrats |
JPH09204240A (ja) | 1996-01-24 | 1997-08-05 | Fujitsu Ltd | 電力供給装置 |
US5914585A (en) * | 1996-02-20 | 1999-06-22 | Norand Corporation | Power sharing in computing systems with a plurality of electronic devices |
DE19610012B4 (de) * | 1996-03-14 | 2005-02-10 | Unaxis Deutschland Holding Gmbh | Verfahren zur Stabilisierung eines Arbeitspunkts beim reaktiven Zerstäuben in einer Sauerstoff enthaltenden Atmosphäre |
DE19651811B4 (de) * | 1996-12-13 | 2006-08-31 | Unaxis Deutschland Holding Gmbh | Vorrichtung zum Belegen eines Substrats mit dünnen Schichten |
DE19848636C2 (de) * | 1998-10-22 | 2001-07-26 | Fraunhofer Ges Forschung | Verfahren zur Überwachung einer Wechselspannungs-Entladung an einer Doppelelektrode |
US6625736B1 (en) * | 1999-07-29 | 2003-09-23 | International Business Machines Corporation | System for automatically determining a number of power supplies are required by managing changes of the power requirements in a power consuming system |
DE19937859C2 (de) | 1999-08-13 | 2003-06-18 | Huettinger Elektronik Gmbh | Elektrische Versorgungseinheit für Plasmaanlagen |
US6448672B1 (en) * | 2000-02-29 | 2002-09-10 | 3Com Corporation | Intelligent power supply control for electronic systems requiring multiple voltages |
JP2002004033A (ja) | 2000-06-19 | 2002-01-09 | Sony Corp | 成膜装置および成膜方法 |
US6524455B1 (en) * | 2000-10-04 | 2003-02-25 | Eni Technology, Inc. | Sputtering apparatus using passive arc control system and method |
JP4614578B2 (ja) | 2001-06-01 | 2011-01-19 | キヤノンアネルバ株式会社 | スパッタ成膜応用のためのプラズマ処理装置 |
EP1263108A1 (en) | 2001-06-01 | 2002-12-04 | Roke Manor Research Limited | Community energy comsumption management |
KR101102116B1 (ko) | 2001-10-11 | 2012-01-02 | 디노보 리서치, 엘엘씨 | 디지탈 전지 |
US7112896B2 (en) * | 2002-03-07 | 2006-09-26 | Sun Microsystems, Inc. | Power system with load matrix |
-
2003
- 2003-09-10 DE DE2003141717 patent/DE10341717A1/de not_active Ceased
- 2003-10-27 US US10/694,530 patent/US7479712B2/en not_active Expired - Fee Related
- 2003-11-10 EP EP03776843A patent/EP1550195A1/de not_active Withdrawn
- 2003-11-10 AU AU2003286122A patent/AU2003286122A1/en not_active Abandoned
- 2003-11-10 CN CNB2003801029401A patent/CN100349350C/zh not_active Expired - Fee Related
- 2003-11-10 JP JP2005508828A patent/JP2006514527A/ja active Pending
- 2003-11-10 KR KR1020057006165A patent/KR100679618B1/ko not_active IP Right Cessation
- 2003-11-10 WO PCT/DE2003/003714 patent/WO2005027299A1/de active Application Filing
- 2003-11-10 PL PL37714903A patent/PL377149A1/pl unknown
-
2004
- 2004-02-02 TW TW93102283A patent/TWI265665B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN100349350C (zh) | 2007-11-14 |
TWI265665B (en) | 2006-11-01 |
TW200511684A (en) | 2005-03-16 |
WO2005027299A1 (de) | 2005-03-24 |
KR20050067176A (ko) | 2005-06-30 |
KR100679618B1 (ko) | 2007-02-06 |
DE10341717A1 (de) | 2005-05-25 |
AU2003286122A1 (en) | 2005-04-06 |
JP2006514527A (ja) | 2006-04-27 |
US7479712B2 (en) | 2009-01-20 |
US20050052803A1 (en) | 2005-03-10 |
CN1711666A (zh) | 2005-12-21 |
EP1550195A1 (de) | 2005-07-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
DISC | Decisions on discontinuance of the proceedings (taken after the publication of the particulars of the applications) |