PL357698A1 - Sposób otrzymywania podłoża z objętościowego monokrystalicznego azotku zawierającego gal - Google Patents

Sposób otrzymywania podłoża z objętościowego monokrystalicznego azotku zawierającego gal

Info

Publication number
PL357698A1
PL357698A1 PL02357698A PL35769802A PL357698A1 PL 357698 A1 PL357698 A1 PL 357698A1 PL 02357698 A PL02357698 A PL 02357698A PL 35769802 A PL35769802 A PL 35769802A PL 357698 A1 PL357698 A1 PL 357698A1
Authority
PL
Poland
Prior art keywords
voluminal
mono
nitride containing
containing gallium
crystalline nitride
Prior art date
Application number
PL02357698A
Other languages
English (en)
Inventor
Robert Dwiliński
Roman Doradziński
Jerzy Garczyński
Leszek P. Sierzputowski
Yasuo Kanbara
Original Assignee
Ammono Sp.Z O.O.
Nichia Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ammono Sp.Z O.O., Nichia Corporation filed Critical Ammono Sp.Z O.O.
Priority to PL02357698A priority Critical patent/PL357698A1/pl
Priority to US10/537,804 priority patent/US7811380B2/en
Priority to KR1020057010667A priority patent/KR101088991B1/ko
Priority to JP2004558481A priority patent/JP4824313B2/ja
Priority to EP03778841.1A priority patent/EP1590509B1/en
Priority to TW092135281A priority patent/TWI334890B/zh
Priority to PCT/JP2003/015904 priority patent/WO2004053206A1/en
Priority to AU2003285767A priority patent/AU2003285767A1/en
Priority to PL379547A priority patent/PL224993B1/pl
Publication of PL357698A1 publication Critical patent/PL357698A1/pl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
PL02357698A 2002-12-11 2002-12-11 Sposób otrzymywania podłoża z objętościowego monokrystalicznego azotku zawierającego gal PL357698A1 (pl)

Priority Applications (9)

Application Number Priority Date Filing Date Title
PL02357698A PL357698A1 (pl) 2002-12-11 2002-12-11 Sposób otrzymywania podłoża z objętościowego monokrystalicznego azotku zawierającego gal
US10/537,804 US7811380B2 (en) 2002-12-11 2003-12-11 Process for obtaining bulk mono-crystalline gallium-containing nitride
KR1020057010667A KR101088991B1 (ko) 2002-12-11 2003-12-11 벌크 단결정 갈륨-함유 질화물의 제조공정
JP2004558481A JP4824313B2 (ja) 2002-12-11 2003-12-11 ガリウム含有窒化物バルク単結晶を得るためのプロセス、得られた結晶から不純物を排除するためのプロセス、及びガリウム含有窒化物バルク単結晶からなる基板を製造するためのプロセス
EP03778841.1A EP1590509B1 (en) 2002-12-11 2003-12-11 Process for obtaining bulk monocrystalline gallium-containing nitride
TW092135281A TWI334890B (en) 2002-12-11 2003-12-11 Process for obtaining bulk mono-crystalline gallium-containing nitride, eliminating impurities from the obtained crystal and manufacturing substrates made of bulk mono-crystalline gallium-containing nitride
PCT/JP2003/015904 WO2004053206A1 (en) 2002-12-11 2003-12-11 Process for obtaining bulk monocrystalline gallium-containing nitride
AU2003285767A AU2003285767A1 (en) 2002-12-11 2003-12-11 Process for obtaining bulk monocrystalline gallium-containing nitride
PL379547A PL224993B1 (pl) 2002-12-11 2003-12-11 Sposób otrzymywania objętościowego monokrystalicznego azotku zawierającego gal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL02357698A PL357698A1 (pl) 2002-12-11 2002-12-11 Sposób otrzymywania podłoża z objętościowego monokrystalicznego azotku zawierającego gal

Publications (1)

Publication Number Publication Date
PL357698A1 true PL357698A1 (pl) 2004-06-14

Family

ID=32733398

Family Applications (1)

Application Number Title Priority Date Filing Date
PL02357698A PL357698A1 (pl) 2002-12-11 2002-12-11 Sposób otrzymywania podłoża z objętościowego monokrystalicznego azotku zawierającego gal

Country Status (1)

Country Link
PL (1) PL357698A1 (pl)

Similar Documents

Publication Publication Date Title
AU2003255613A8 (en) Method for epitaxial growth of a gallium nitride film separated from its substrate
AU2001236076A1 (en) Production method of iii nitride compound semiconductor substrate and semiconductor device
AU2003262077A1 (en) Method for cutting semiconductor substrate
AU2003286625A1 (en) Method of forming semiconductor devices through epitaxy
SG112879A1 (en) Gan single crystal substrate, nitride type semiconductor epitaxial substrate, nitride type semiconductor device, and methods of making the same
AU2001248803A1 (en) Method of manufacturing group-iii nitride compound semiconductor device
EP1684973A4 (en) VICINAL GALLIUM NITRIDE SUBSTRATE FOR HIGH QUALITY HOMOEPITAXIA
AUPS240402A0 (en) Gallium nitride
EP1416529B8 (en) Manufacturing method of semiconductor device
AU2002354485A8 (en) Phosphor single crystal substrate and method for preparing the same, and nitride semiconductor component using the same
TWI370482B (en) Laser lift-off of sapphire from a nitride flip-chip
AU2003238980A1 (en) Process for obtaining of bulk monocrystallline gallium-containing nitride
HUP0401882A3 (en) Substrate for epitaxy
AU2002951838A0 (en) Method of preparation for polycrystalline semiconductor films
AU2003244352A1 (en) Method of producing organic semiconductor device
AU2003287330A1 (en) Method of preparing whole semiconductor wafer for analysis
TWI309074B (en) Method of forming semiconductor device
EP1541721A4 (en) PROCESS FOR PRODUCING A SILICON MONOCRYSTAL
AU2003269502A1 (en) Polycrystalline silicon substrate
GB0328109D0 (en) Method of depositing aluminium nitride
AU2003301120A1 (en) Method for passivating semiconductor devices
EP1199387A4 (en) PROCESS FOR PREPARING SINGLE CRYSTALS FOR SEMICONDUCTORS
EP1569264A4 (en) METHOD FOR PRODUCING A SILICON PITAXIAL WAFER
EP1766667A4 (en) METHOD FOR DRAWING GAN-BASED NITRIDE LAYER MATERIAL
PL357698A1 (pl) Sposób otrzymywania podłoża z objętościowego monokrystalicznego azotku zawierającego gal

Legal Events

Date Code Title Description
REFS Decisions on refusal to grant patents (taken after the publication of the particulars of the applications)