PL3305734T3 - Sposób i urządzenie do przeprowadzania procesu plazmowo-chemicznego osadzania z par lotnych - Google Patents
Sposób i urządzenie do przeprowadzania procesu plazmowo-chemicznego osadzania z par lotnychInfo
- Publication number
- PL3305734T3 PL3305734T3 PL17194525T PL17194525T PL3305734T3 PL 3305734 T3 PL3305734 T3 PL 3305734T3 PL 17194525 T PL17194525 T PL 17194525T PL 17194525 T PL17194525 T PL 17194525T PL 3305734 T3 PL3305734 T3 PL 3305734T3
- Authority
- PL
- Poland
- Prior art keywords
- deposition process
- vapour deposition
- chemical vapour
- plasma chemical
- plasma
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
- C03B37/01823—Plasma deposition burners or heating means
- C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Plasma Technology (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
- Chemical Vapour Deposition (AREA)
- Waveguide Aerials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2017575A NL2017575B1 (en) | 2016-10-04 | 2016-10-04 | A method and an apparatus for performing a plasma chemical vapour deposition process and a method |
| EP17194525.6A EP3305734B1 (en) | 2016-10-04 | 2017-10-03 | A method and an apparatus for performing a plasma chemical vapour deposition process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL3305734T3 true PL3305734T3 (pl) | 2020-06-01 |
Family
ID=58159443
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL17194525T PL3305734T3 (pl) | 2016-10-04 | 2017-10-03 | Sposób i urządzenie do przeprowadzania procesu plazmowo-chemicznego osadzania z par lotnych |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US10767264B2 (pl) |
| EP (1) | EP3305734B1 (pl) |
| JP (1) | JP7075196B2 (pl) |
| CN (1) | CN107893217B (pl) |
| DK (1) | DK3305734T3 (pl) |
| NL (1) | NL2017575B1 (pl) |
| PL (1) | PL3305734T3 (pl) |
| RU (1) | RU2740066C2 (pl) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2028245B1 (en) * | 2021-05-19 | 2022-12-05 | Draka Comteq Bv | A plasma chemical vapor deposition apparatus |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3577207A (en) | 1969-05-07 | 1971-05-04 | Vladimir Pavlovich Kirjushin | Microwave plasmatron |
| DE2444100C3 (de) | 1974-09-14 | 1979-04-12 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren zur Herstellung von innenbeschichteten Glasrohren zum Ziehen von Lichtleitfasern |
| US4125389A (en) | 1977-02-10 | 1978-11-14 | Northern Telecom Limited | Method for manufacturing an optical fibre with plasma activated deposition in a tube |
| DE3632684A1 (de) | 1986-09-26 | 1988-03-31 | Philips Patentverwaltung | Verfahren und vorrichtung zum innenbeschichten von rohren |
| NL8602910A (nl) | 1986-11-17 | 1988-06-16 | Philips Nv | Inrichting voor het aanbrengen van glaslagen op de binnenzijde van een buis. |
| US5134965A (en) | 1989-06-16 | 1992-08-04 | Hitachi, Ltd. | Processing apparatus and method for plasma processing |
| JPH03193880A (ja) | 1989-08-03 | 1991-08-23 | Mikakutou Seimitsu Kogaku Kenkyusho:Kk | 高圧力下でのマイクロ波プラズマｃｖｄによる高速成膜方法及びその装置 |
| JP2886752B2 (ja) * | 1991-11-05 | 1999-04-26 | キヤノン株式会社 | 無端環状導波管を有するマイクロ波導入装置及び該装置を備えたプラズマ処理装置 |
| DE4203369C2 (de) | 1992-02-06 | 1994-08-11 | Ceramoptec Gmbh | Verfahren und Vorrichtung zur Herstellung von Vorformen für Lichtwellenleiter |
| FR2689717B1 (fr) | 1992-04-03 | 1994-05-13 | Commissariat A Energie Atomique | Dispositif d'application de micro-ondes et reacteur a plasma utilisant ce dispositif. |
| DE4235914A1 (de) | 1992-10-23 | 1994-04-28 | Juergen Prof Dr Engemann | Vorrichtung zur Erzeugung von Mikrowellenplasmen |
| US5595793A (en) | 1995-04-24 | 1997-01-21 | Ceram Optec Industries, Inc. | Surface-plasma-wave coating technique for dielectric filaments |
| JP3355926B2 (ja) * | 1995-05-19 | 2002-12-09 | 株式会社日立製作所 | プラズマ処理装置 |
| DE19600223A1 (de) | 1996-01-05 | 1997-07-17 | Ralf Dr Dipl Phys Spitzl | Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen |
| US5707452A (en) | 1996-07-08 | 1998-01-13 | Applied Microwave Plasma Concepts, Inc. | Coaxial microwave applicator for an electron cyclotron resonance plasma source |
| US5874706A (en) | 1996-09-26 | 1999-02-23 | Tokyo Electron Limited | Microwave plasma processing apparatus using a hybrid microwave having two different modes of oscillation or branched microwaves forming a concentric electric field |
| DE19726663A1 (de) | 1997-06-23 | 1999-01-28 | Sung Spitzl Hildegard Dr Ing | Vorrichtung zur Erzeugung von homogenen Mikrowellenplasmen |
| US6715441B2 (en) | 1997-12-31 | 2004-04-06 | Plasma Optical Fibre B.V. | PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| DE69812434T2 (de) | 1997-12-31 | 2004-01-15 | Draka Fibre Technology Bv | Pcvd-vorrichtung und verfahren zur herstellung einer optischen faser, eines vorform-stabes und eines mantelrohres und die damit hergestellte optische faser |
| US6057645A (en) | 1997-12-31 | 2000-05-02 | Eaton Corporation | Plasma discharge device with dynamic tuning by a movable microwave trap |
| DE19847848C1 (de) | 1998-10-16 | 2000-05-11 | R3 T Gmbh Rapid Reactive Radic | Vorrichtung und Erzeugung angeregter/ionisierter Teilchen in einem Plasma |
| JP4598247B2 (ja) * | 2000-08-04 | 2010-12-15 | 東京エレクトロン株式会社 | ラジアルアンテナ及びそれを用いたプラズマ装置 |
| JP3625197B2 (ja) | 2001-01-18 | 2005-03-02 | 東京エレクトロン株式会社 | プラズマ装置およびプラズマ生成方法 |
| US6951798B2 (en) | 2001-06-08 | 2005-10-04 | Wisconsin Alumni Research Foundation | Method of bonding a stack of layers by electromagnetic induction heating |
| BRPI0214684B1 (pt) | 2001-12-04 | 2017-05-09 | Draka Fibre Technolgy B V | dispositivo para aplicar, em uso, radiação de microondas eletromagnética em uma cavidade de plasma, e, aparelho e método para depositar, uma ou mais camadas de vidro sobre o lado interno de um tubo de vidro oco disposto na cavidade de plasma do dispositivo |
| US20030152700A1 (en) | 2002-02-11 | 2003-08-14 | Board Of Trustees Operating Michigan State University | Process for synthesizing uniform nanocrystalline films |
| JP4304053B2 (ja) * | 2003-11-17 | 2009-07-29 | 株式会社アルバック | マイクロ波励起プラズマ処理装置 |
| NL1025155C2 (nl) * | 2003-12-30 | 2005-07-04 | Draka Fibre Technology Bv | Inrichting voor het uitvoeren van PCVD, alsmede werkwijze voor het vervaardigen van een voorvorm. |
| JP4852997B2 (ja) | 2005-11-25 | 2012-01-11 | 東京エレクトロン株式会社 | マイクロ波導入装置及びプラズマ処理装置 |
| JP2007204774A (ja) * | 2006-01-31 | 2007-08-16 | Toppan Printing Co Ltd | プラズマを使用した容器処理装置 |
| EP2007175A4 (en) * | 2006-03-07 | 2014-05-14 | Univ Ryukyus | PLASMA GENERATOR AND METHOD FOR PRODUCING PLASMA THEREFOR |
| NL1032015C2 (nl) | 2006-06-16 | 2008-01-08 | Draka Comteq Bv | Inrichting voor het uitvoeren van een plasma chemische dampdepositie (PCVD) en werkwijze ter vervaardiging van een optische vezel. |
| FR2903622B1 (fr) | 2006-07-17 | 2008-10-03 | Sidel Participations | Dispositif pour le depot d'un revetement sur une face interne d'un recipient |
| NL1032867C2 (nl) | 2006-11-14 | 2008-05-15 | Draka Comteq Bv | Inrichting en een werkwijze voor het uitvoeren van een depositieproces van het type PCVD. |
| NL1033783C2 (nl) | 2007-05-01 | 2008-11-06 | Draka Comteq Bv | Inrichting voor het uitvoeren van een plasma chemische dampdepositie alsmede werkwijze ter vervaardiging van een optische voorvorm. |
| RU2403318C2 (ru) * | 2008-12-03 | 2010-11-10 | Открытое акционерное общество "Научно-исследовательский институт точного машиностроения" | Свч плазменный реактор |
| CN101853768B (zh) | 2010-04-09 | 2012-07-04 | 长飞光纤光缆有限公司 | 一种圆柱型等离子体谐振腔 |
| US20120186747A1 (en) | 2011-01-26 | 2012-07-26 | Obama Shinji | Plasma processing apparatus |
| NL2007809C2 (en) | 2011-11-17 | 2013-05-21 | Draka Comteq Bv | An apparatus for performing a plasma chemical vapour deposition process. |
| NL2007831C2 (en) * | 2011-11-21 | 2013-05-23 | Draka Comteq Bv | Apparatus and method for carrying out a pcvd deposition process. |
| NL2007968C2 (en) * | 2011-12-14 | 2013-06-17 | Draka Comteq Bv | An apparatus for performing a plasma chemical vapour deposition process. |
| RU2595156C2 (ru) * | 2014-12-15 | 2016-08-20 | Федеральное государственное бюджетное научное учреждение "Федеральный исследовательский центр Институт прикладной физики Российской академии наук" (ИПФ РАН) | Плазменный свч реактор для газофазного осаждения алмазных пленок в потоке газа (варианты) |
-
2016
- 2016-10-04 NL NL2017575A patent/NL2017575B1/nl not_active IP Right Cessation
-
2017
- 2017-10-03 EP EP17194525.6A patent/EP3305734B1/en active Active
- 2017-10-03 DK DK17194525.6T patent/DK3305734T3/da active
- 2017-10-03 PL PL17194525T patent/PL3305734T3/pl unknown
- 2017-10-03 US US15/723,712 patent/US10767264B2/en active Active
- 2017-10-03 RU RU2017134373A patent/RU2740066C2/ru active
- 2017-10-04 JP JP2017194237A patent/JP7075196B2/ja active Active
- 2017-10-09 CN CN201710931629.1A patent/CN107893217B/zh active Active
-
2020
- 2020-08-05 US US16/985,738 patent/US20200362459A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2018115387A (ja) | 2018-07-26 |
| JP7075196B2 (ja) | 2022-05-25 |
| US20180023196A1 (en) | 2018-01-25 |
| BR102017021249A2 (pt) | 2018-05-02 |
| EP3305734B1 (en) | 2020-02-19 |
| CN107893217A (zh) | 2018-04-10 |
| US10767264B2 (en) | 2020-09-08 |
| US20200362459A1 (en) | 2020-11-19 |
| RU2740066C2 (ru) | 2020-12-31 |
| DK3305734T3 (da) | 2020-03-09 |
| EP3305734A1 (en) | 2018-04-11 |
| CN107893217B (zh) | 2021-04-27 |
| RU2017134373A (ru) | 2019-04-04 |
| RU2017134373A3 (pl) | 2020-11-24 |
| NL2017575B1 (en) | 2018-04-13 |
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