PL3186263T3 - Fotoinicjator zmodyfikowany związkiem krzemoorganicznym i jego fotoutwardzalna kompozycja kleju - Google Patents

Fotoinicjator zmodyfikowany związkiem krzemoorganicznym i jego fotoutwardzalna kompozycja kleju

Info

Publication number
PL3186263T3
PL3186263T3 PL14900930T PL14900930T PL3186263T3 PL 3186263 T3 PL3186263 T3 PL 3186263T3 PL 14900930 T PL14900930 T PL 14900930T PL 14900930 T PL14900930 T PL 14900930T PL 3186263 T3 PL3186263 T3 PL 3186263T3
Authority
PL
Poland
Prior art keywords
photo
adhesive composition
curable adhesive
organosilicon modified
modified photoinitiator
Prior art date
Application number
PL14900930T
Other languages
English (en)
Inventor
Hao Wu
Zhiming Pasing Li
Jinyou Li
Zhixiang Lu
Zheng Lu
Yong Zhang
Xingang Zhang
Original Assignee
Henkel Ag & Co. Kgaa
Henkel IP & Holding GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Henkel Ag & Co. Kgaa, Henkel IP & Holding GmbH filed Critical Henkel Ag & Co. Kgaa
Publication of PL3186263T3 publication Critical patent/PL3186263T3/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39—Photocatalytic properties
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/62—Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
    • C08F120/68—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/28—Treatment by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/14—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00—Additional features of adhesives in the form of films or foils
    • C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/414—Additional features of adhesives in the form of films or foils characterized by the presence of essential components presence of a copolymer
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00—Presence of (meth)acrylic polymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Silicon Polymers (AREA)
PL14900930T 2014-08-29 2014-08-29 Fotoinicjator zmodyfikowany związkiem krzemoorganicznym i jego fotoutwardzalna kompozycja kleju PL3186263T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/CN2014/085538 WO2016029439A1 (en) 2014-08-29 2014-08-29 Organosilicon modified photoinitiator and photo-curable adhesive composition thereof
EP14900930.0A EP3186263B1 (en) 2014-08-29 2014-08-29 Organosilicon modified photoinitiator and photo-curable adhesive composition thereof

Publications (1)

Publication Number Publication Date
PL3186263T3 true PL3186263T3 (pl) 2020-10-05

Family

ID=55398651

Family Applications (1)

Application Number Title Priority Date Filing Date
PL14900930T PL3186263T3 (pl) 2014-08-29 2014-08-29 Fotoinicjator zmodyfikowany związkiem krzemoorganicznym i jego fotoutwardzalna kompozycja kleju

Country Status (9)

Country Link
US (1) US10189867B2 (pl)
EP (1) EP3186263B1 (pl)
JP (1) JP6596075B2 (pl)
KR (1) KR102336227B1 (pl)
CN (1) CN107406468B8 (pl)
ES (1) ES2805524T3 (pl)
PL (1) PL3186263T3 (pl)
TW (1) TWI656128B (pl)
WO (1) WO2016029439A1 (pl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2804199T3 (es) * 2016-01-11 2021-02-04 Henkel IP & Holding GmbH Compuestos compatibles con silicona
CN111324010B (zh) * 2018-12-17 2024-07-05 固安鼎材科技有限公司 一种感光树脂组合物及其用途、一种彩色滤光片
CN111324012B (zh) * 2018-12-17 2024-08-13 固安鼎材科技有限公司 一种改性光引发剂及其制备方法和用途

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4273907A (en) 1979-07-18 1981-06-16 Shin-Etsu Chemical Co., Ltd. Benzoin-bonded organopolysiloxanes and method for the preparation thereof
DE3107087A1 (de) 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen"
JPS57207622A (en) 1981-06-18 1982-12-20 Toray Silicone Co Ltd Photopolymerization sensitizer and its preparation
US4477326A (en) * 1983-06-20 1984-10-16 Loctite Corporation Polyphotoinitiators and compositions thereof
US4534838A (en) * 1984-04-16 1985-08-13 Loctite Corporation Siloxane polyphotoinitiators of the substituted acetophenone type
US4536265A (en) 1984-04-19 1985-08-20 Loctite Corporation Siloxane polyphotoinitiators of the substituted acetophenone type
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
US4666953A (en) * 1985-03-28 1987-05-19 Loctite Corporation Silicone polyphotoinitiators
JPS62179506A (ja) * 1986-01-27 1987-08-06 ロクタイト．コ−ポレ−シヨン ポリ光重合開始剤とその調製方法および該開始剤の性質を利用した硬化性組成物
JP2716509B2 (ja) * 1989-03-01 1998-02-18 三菱化学株式会社 ジチオカーバメート基含有ポリシロキサン
DE4120418A1 (de) * 1991-06-20 1992-12-24 Wacker Chemie Gmbh Haertbare organo(poly)siloxanmassen
US5663269A (en) 1992-03-31 1997-09-02 Loctite Corporation Organosiloxane fluids prepared using organo-lithium reagents
DE4435487A1 (de) * 1994-10-04 1996-04-11 Hoechst Ag Mit Silikonen kompatible Photoinitiatoren und diese enthaltende lichtempfindliche Gemische
JPH09183770A (ja) 1995-10-31 1997-07-15 Nippon Bayeragrochem Kk １−アジン−テトラゾリノン類及び除草剤
FR2750429B1 (fr) * 1996-06-27 1998-08-07 Essilor Int Materiau a base de silicone reticule comportant un photoamorceur fixe, son procede de preparation, produit polymerique hydrophile obtenu a partir de ce materiau et son procede de preparation, et nouveaux photoamorceurs
DE69817194D1 (de) 1997-09-11 2003-09-18 Arch Spec Chem Inc Eine negativ arbeitende fotoresistzusammensetzung auf basis von polyimid-vorläufern
US6376568B1 (en) * 1999-07-29 2002-04-23 Ciba Specialty Chemicals Corporation Surface-active photoinitiators
JP4339694B2 (ja) * 2002-03-06 2009-10-07 チバ ホールディング インコーポレーテッド 有機ケイ素基を含有する光開始剤を調製するための酵素的方法
NZ537094A (en) 2002-07-19 2006-09-29 Ciba Sc Holding Ag Compositions containing difunctional photoinitiators and aminoacrylates
WO2006107824A2 (en) * 2005-04-01 2006-10-12 Monsanto Technology Llc Control of n-(phosphonomethyl) iminodiacetic acid conversion in manufacture of glyphosate
JP4941657B2 (ja) * 2007-04-06 2012-05-30 信越化学工業株式会社 有機ケイ素化合物及びその製造方法並びに光重合性組成物及び無機材料
JP2011123219A (ja) 2009-12-09 2011-06-23 Asahi Kasei E-Materials Corp 感光性ポリアミド樹脂組成物、硬化レリーフパターンの形成方法及び半導体装置
JP6279603B2 (ja) 2012-12-05 2018-02-14 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェンＨｅｎｋｅｌ ＡＧ ＆ Ｃｏ． ＫＧａＡ シリコーン相溶性光開始剤

Also Published As

Publication number Publication date
EP3186263A4 (en) 2018-04-25
US20170166594A1 (en) 2017-06-15
EP3186263A1 (en) 2017-07-05
JP6596075B2 (ja) 2019-10-23
JP2017532298A (ja) 2017-11-02
CN107406468A (zh) 2017-11-28
CN107406468B (zh) 2020-11-06
ES2805524T3 (es) 2021-02-12
KR102336227B1 (ko) 2021-12-07
EP3186263B1 (en) 2020-04-22
US10189867B2 (en) 2019-01-29
TWI656128B (zh) 2019-04-11
TW201623317A (zh) 2016-07-01
WO2016029439A1 (en) 2016-03-03
KR20170047275A (ko) 2017-05-04
CN107406468B8 (zh) 2021-07-20

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