PL2971260T3 - Elektrolityczne wytwarzanie jonów manganu (iii) w mocnym kwasie siarkowym - Google Patents
Elektrolityczne wytwarzanie jonów manganu (iii) w mocnym kwasie siarkowymInfo
- Publication number
- PL2971260T3 PL2971260T3 PL14779082T PL14779082T PL2971260T3 PL 2971260 T3 PL2971260 T3 PL 2971260T3 PL 14779082 T PL14779082 T PL 14779082T PL 14779082 T PL14779082 T PL 14779082T PL 2971260 T3 PL2971260 T3 PL 2971260T3
- Authority
- PL
- Poland
- Prior art keywords
- manganese
- ions
- iii
- sulfuric acid
- strong sulfuric
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/21—Manganese oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
- C23C18/24—Roughening, e.g. by etching using acid aqueous solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/042—Electrodes formed of a single material
- C25B11/043—Carbon, e.g. diamond or graphene
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/02—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/795,382 US9534306B2 (en) | 2012-01-23 | 2013-03-12 | Electrolytic generation of manganese (III) ions in strong sulfuric acid |
PCT/US2014/021618 WO2014164272A1 (en) | 2013-03-12 | 2014-03-07 | Electrolytic generation of manganese (iii) ions in strong sulfuric acid |
EP14779082.8A EP2971260B1 (en) | 2013-03-12 | 2014-03-07 | Electrolytic generation of manganese (iii) ions in strong sulfuric acid |
Publications (1)
Publication Number | Publication Date |
---|---|
PL2971260T3 true PL2971260T3 (pl) | 2020-03-31 |
Family
ID=51658840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL14779082T PL2971260T3 (pl) | 2013-03-12 | 2014-03-07 | Elektrolityczne wytwarzanie jonów manganu (iii) w mocnym kwasie siarkowym |
Country Status (18)
Country | Link |
---|---|
EP (1) | EP2971260B1 (pl) |
JP (1) | JP6167222B2 (pl) |
KR (1) | KR101749947B1 (pl) |
CN (1) | CN105209667B (pl) |
AU (1) | AU2014249521B2 (pl) |
BR (1) | BR112015021067B1 (pl) |
CA (2) | CA2955467C (pl) |
DK (1) | DK2971260T3 (pl) |
ES (1) | ES2745071T3 (pl) |
HR (1) | HRP20191626T1 (pl) |
HU (1) | HUE045344T2 (pl) |
LT (1) | LT2971260T (pl) |
MX (1) | MX2015012584A (pl) |
PL (1) | PL2971260T3 (pl) |
PT (1) | PT2971260T (pl) |
SI (1) | SI2971260T1 (pl) |
TW (1) | TWI489007B (pl) |
WO (1) | WO2014164272A1 (pl) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9267077B2 (en) * | 2013-04-16 | 2016-02-23 | Rohm And Haas Electronic Materials Llc | Chrome-free methods of etching organic polymers with mixed acid solutions |
ES2685409T3 (es) * | 2013-10-22 | 2018-10-08 | Okuno Chemical Industries Co., Ltd. | Composición para el tratamiento por grabado químico de un material de resina |
CN105483715B (zh) * | 2015-12-09 | 2018-01-30 | 哈尔滨工业大学 | 镁金属表面微‑纳米复合多级孔材料的模板‑3d刻蚀制备方法 |
CN106830204B (zh) * | 2017-03-13 | 2020-04-28 | 重庆大学 | 一种电化学阴极激发高锰酸盐降解水中污染物的方法及装置 |
EP3652360A1 (en) * | 2017-07-10 | 2020-05-20 | SRG Global, Inc. | Hexavalent chromium free etch manganese recovery system |
CN109256180B (zh) * | 2018-07-03 | 2022-02-11 | 南昌立德生物技术有限公司 | 一种计算机辅助先导药物优化设计的敏感性分析算法 |
JP7336126B2 (ja) * | 2019-03-11 | 2023-08-31 | 国立研究開発法人産業技術総合研究所 | 高価数マンガンの製造方法、及び製造装置 |
EP3825441A1 (en) * | 2019-11-21 | 2021-05-26 | COVENTYA S.p.A. | An electrolytic treatment device for preparing plastic parts to be metallized and a method for etching plastic parts |
US11842958B2 (en) * | 2022-03-18 | 2023-12-12 | Chun-Ming Lin | Conductive structure including copper-phosphorous alloy and a method of manufacturing conductive structure |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3065155A (en) | 1960-09-02 | 1962-11-20 | Manganese Chemicals Corp | Electrolytic manganese dioxide process |
US3793171A (en) * | 1970-09-04 | 1974-02-19 | Carrier Corp | Process for removing pollutants from gas streams |
JPS51764A (ja) * | 1974-06-25 | 1976-01-06 | Mitsui Mining & Smelting Co | Mudenkaidometsukihaisuino shorihoho |
US3941677A (en) * | 1974-06-27 | 1976-03-02 | Carrier Corporation | Electrolytic regeneration cell |
AU4083878A (en) * | 1977-11-02 | 1980-04-24 | Diamond Shamrock Techn | Dislodging electrolytic manganese dioxide |
US4279705A (en) * | 1980-02-19 | 1981-07-21 | Kerr-Mcgee Corporation | Process for oxidizing a metal of variable valence by constant current electrolysis |
JPS6013087A (ja) * | 1983-07-05 | 1985-01-23 | Kawasaki Kasei Chem Ltd | 硫酸第一セリウムの電解法 |
JPS6447890A (en) * | 1987-08-13 | 1989-02-22 | Kenzo Yamaguchi | Electrolytic synthesis method |
US5213665A (en) * | 1988-02-29 | 1993-05-25 | Nippon Shokubai Kagaku Kogyo, Co., Ltd. | Process for producing 1-aminoanthraquinones |
US4911802A (en) * | 1988-03-09 | 1990-03-27 | Macdermid, Incorporated | Conversion of manganate to permanganate |
US4936970A (en) * | 1988-11-14 | 1990-06-26 | Ebonex Technologies, Inc. | Redox reactions in an electrochemical cell including an electrode comprising Magneli phase titanium oxide |
US5318803A (en) * | 1990-11-13 | 1994-06-07 | International Business Machines Corporation | Conditioning of a substrate for electroless plating thereon |
JPH05112872A (ja) * | 1991-10-21 | 1993-05-07 | Okuno Seiyaku Kogyo Kk | ポリイミド系樹脂の無電解めつき方法及びプリエツチング用組成物 |
US5246553A (en) * | 1992-03-05 | 1993-09-21 | Hydro-Quebec | Tetravalent titanium electrolyte and trivalent titanium reducing agent obtained thereby |
JP3806181B2 (ja) * | 1996-05-31 | 2006-08-09 | 株式会社大和化成研究所 | ナフタレンアルデヒド類の製造方法 |
GB9714275D0 (en) * | 1997-07-08 | 1997-09-10 | Ciba Geigy Ag | Oxidation process |
US6616828B2 (en) * | 2001-08-06 | 2003-09-09 | Micron Technology, Inc. | Recovery method for platinum plating bath |
JP2008521246A (ja) * | 2004-11-19 | 2008-06-19 | ハネウエル・インターナシヨナル・インコーポレーテツド | 半導体用途のための選択的除去化学薬品、この製造方法およびこの使用 |
EP2149622A4 (en) * | 2007-05-22 | 2010-07-28 | Okuno Chem Ind Co | PRE-TREATMENT METHOD FOR ELECTRICALLY PLATING A RESIN FORM BODY, METHOD FOR PLATING A RESIN MOLD BODY AND PRE-TREATMENT AGENT |
PL2025708T3 (pl) * | 2007-08-10 | 2010-03-31 | Enthone | Roztwór trawiący do powierzchni tworzyw sztucznych nie zawierający chromu |
KR101118448B1 (ko) * | 2010-03-12 | 2012-03-06 | 스미토모덴키고교가부시키가이샤 | 레독스 흐름 전지 |
US10260000B2 (en) * | 2012-01-23 | 2019-04-16 | Macdermid Acumen, Inc. | Etching of plastic using acidic solutions containing trivalent manganese |
US8603352B1 (en) * | 2012-10-25 | 2013-12-10 | Rohm and Haas Electroncis Materials LLC | Chrome-free methods of etching organic polymers |
CN104838044B (zh) * | 2012-11-15 | 2017-12-05 | 麦克德米德尖端有限公司 | 在强硫酸中电解产生锰(iii)离子 |
-
2014
- 2014-03-07 CN CN201480014056.0A patent/CN105209667B/zh active Active
- 2014-03-07 KR KR1020157028235A patent/KR101749947B1/ko active IP Right Grant
- 2014-03-07 SI SI201431343T patent/SI2971260T1/sl unknown
- 2014-03-07 HU HUE14779082A patent/HUE045344T2/hu unknown
- 2014-03-07 CA CA2955467A patent/CA2955467C/en active Active
- 2014-03-07 EP EP14779082.8A patent/EP2971260B1/en active Active
- 2014-03-07 AU AU2014249521A patent/AU2014249521B2/en active Active
- 2014-03-07 DK DK14779082.8T patent/DK2971260T3/da active
- 2014-03-07 ES ES14779082T patent/ES2745071T3/es active Active
- 2014-03-07 LT LTEP14779082.8T patent/LT2971260T/lt unknown
- 2014-03-07 JP JP2016500796A patent/JP6167222B2/ja active Active
- 2014-03-07 MX MX2015012584A patent/MX2015012584A/es unknown
- 2014-03-07 WO PCT/US2014/021618 patent/WO2014164272A1/en active Application Filing
- 2014-03-07 PT PT14779082T patent/PT2971260T/pt unknown
- 2014-03-07 BR BR112015021067-8A patent/BR112015021067B1/pt active IP Right Grant
- 2014-03-07 CA CA2901589A patent/CA2901589C/en active Active
- 2014-03-07 PL PL14779082T patent/PL2971260T3/pl unknown
- 2014-03-11 TW TW103108294A patent/TWI489007B/zh active
-
2019
- 2019-09-10 HR HRP20191626 patent/HRP20191626T1/hr unknown
Also Published As
Publication number | Publication date |
---|---|
CA2955467A1 (en) | 2014-10-09 |
DK2971260T3 (da) | 2019-09-23 |
ES2745071T3 (es) | 2020-02-27 |
BR112015021067B1 (pt) | 2021-06-08 |
EP2971260A4 (en) | 2017-04-19 |
TW201500593A (zh) | 2015-01-01 |
HRP20191626T1 (hr) | 2019-12-13 |
CA2901589C (en) | 2019-01-22 |
AU2014249521B2 (en) | 2018-03-01 |
EP2971260B1 (en) | 2019-06-19 |
KR101749947B1 (ko) | 2017-06-22 |
CA2955467C (en) | 2021-03-16 |
KR20150126935A (ko) | 2015-11-13 |
CN105209667B (zh) | 2017-12-05 |
TWI489007B (zh) | 2015-06-21 |
CN105209667A (zh) | 2015-12-30 |
JP6167222B2 (ja) | 2017-07-19 |
WO2014164272A1 (en) | 2014-10-09 |
SI2971260T1 (sl) | 2019-12-31 |
JP2016512574A (ja) | 2016-04-28 |
PT2971260T (pt) | 2019-09-27 |
AU2014249521A1 (en) | 2015-08-27 |
BR112015021067A2 (pt) | 2017-07-18 |
MX2015012584A (es) | 2016-01-14 |
CA2901589A1 (en) | 2014-10-09 |
LT2971260T (lt) | 2019-09-25 |
EP2971260A1 (en) | 2016-01-20 |
HUE045344T2 (hu) | 2019-12-30 |
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